Number | Date | Country | Kind |
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1095/91-1 | Apr 1991 | CHX |
Number | Name | Date | Kind |
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4420385 | Hartsough | Dec 1983 | |
4931169 | Scherer et al. | Jun 1990 | |
4978437 | Wirz | Dec 1990 | |
5026471 | Latz et al. | Jun 1991 |
Number | Date | Country |
---|---|---|
0328257 | Aug 1989 | EPX |
0416241A2 | Jul 1990 | EPX |
63-111173 | May 1988 | JPX |
Entry |
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Surface and Coatings Technology, vol. 33, 1987, pp. 405-423 "Reactive D. C. High-Rate Sputtering As Production Technology". |
Journal of Vacuum Science and Technology, vol. A6 1988, pp. 1845-1848 "A Quasi-Direct-Current Sputtering Technique For The Deposition of Dielectrics At Enhanced Rates" (May/Jun.). |