Number | Name | Date | Kind |
---|---|---|---|
5468687 | Carl et al. | Nov 1995 | |
5489540 | Liu et al. | Feb 1996 | |
5672521 | Barsan et al. | Sep 1997 | |
5679585 | Gardner et al. | Oct 1997 | |
5861347 | Maiti et al. | Jan 1999 | |
5926741 | Matsuoka et al. | Jul 1999 | |
5972804 | Tobin et al. | Oct 1999 |
Entry |
---|
E. C. Carr et al., Appl. Phys. Lett 66 (12), Mar. 20, 1995, “N Depth Profiles in Thin SiO2 Grown of Processed in N2O: The Role of Atomic Oxygen”. |