Claims
- 1. A photoresist composition comprising a polymer comprising at least one polycyclic olefin derived type of repeat unit having a desired exo mole percent.
- 2. A method of improving the imaging capability of a photoresist composition, comprising providing a polymeric resin comprising polycyclic olefin derived repeat units having a desired exo mole percent.
- 3. A method of controlling the differential dissolution rate of a photoresist composition comprising providing a polymeric resin to the photoresist composition comprising polycyclic olefin derived repeat units having a desired exo mole percent.
CROSS-REFERENCE TO RELATED APPLICATIONS
[0001] This application claims the benefit of priority under 35 U.S.C. § 119 of U.S. Provisional Application Serial No. 60/449,785 filed on Feb. 24, 2003.
Provisional Applications (1)
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Number |
Date |
Country |
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60449785 |
Feb 2003 |
US |