Number | Name | Date | Kind |
---|---|---|---|
3615951 | Franco et al. | Oct 1971 | |
3654108 | Smith | Apr 1972 | |
3725309 | Ames et al. | Apr 1973 | |
3873361 | Franco et al. | Mar 1975 | |
3879840 | Ames et al. | Apr 1975 | |
3881884 | Cook et al. | May 1975 | |
3918149 | Roberts | Nov 1975 | |
3994793 | Harvilchuck et al. | Nov 1976 | |
4004044 | Franco et al. | Jan 1977 |
Number | Date | Country |
---|---|---|
52-36975 | Mar 1977 | JPX |
54-125968 | Sep 1979 | JPX |
55-98827 | Jul 1980 | JPX |
Entry |
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Hatzakis, M. et al., Forming a Sputter Etching Mask, IBM Technical Disclosure Bulletin, 12 (11), Apr. 1970. |
Schaible, P. M. et al., Reactive Ion Etching of Aluminum and Aluminum Alloys in an RF Plasma Containing Halogen Species, in J. Vacuum Sci. & Tech., 15 (2) pp. 334-337, Mar./Apr. 1978. |
Schaible, P. M., et al., Reactive Ion Etching of Aluminum and Aluminum Alloys, IBM Tech. Disc. Bul. 21 (4), Sep. 1978. |