Claims
- 1. A method of forming a resist pattern on a substrate by lithography using deep ultraviolet light, comprising the steps of:
- providing an organic silane compound for forming an antireflection film in the surface of said substrate, the organic silane compound being of the formula ##STR1## where R.sub.1, R.sub.2, R.sub.3 and R.sub.4 individually represent hydrogen or an alkyl group, and R represents a substituent group absorbing deep ultraviolet light;
- coating said substrate with said organic silane compound;
- applying resist onto said substrate coated with said organic silane compound;
- exposing selectively said resist using deep ultraviolet light; and
- developing said resist.
- 2. A method as recited in claim 1, wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.4 individually are hydrogen, methyl or ethyl groups.
- 3. A method as recited in claim 1, wherein said R includes a novolak resin.
- 4. A method as recited in claim 3, wherein 30 to 70% of the hydroxyl groups of said novolak resin are capped with a t-butyloxycarbonyl group.
- 5. A method as recited in claim 1, wherein said substituent group R includes an organic coloring matter.
- 6. A method as recited in claim 5, wherein said organic coloring matter is formed from coumarin.
- 7. A method as recited in claim 5, wherein said organic coloring matter includes curcumin.
- 8. A method as recited in claim 1, wherein said substrate includes a silicon semiconductor substrate.
- 9. A method as recited in claim 1, wherein said deep ultraviolet light includes excimer laser light.
- 10. A method as recited in claim 1, wherein said resist includes a chemical amplification negative resist.
Priority Claims (1)
Number |
Date |
Country |
Kind |
3-199603 |
Aug 1991 |
JPX |
|
Parent Case Info
This application is a division of application Ser. No. 07/814,632, filed Dec. 30, 1991, U.S. Pat. No. 5,380,889.
US Referenced Citations (8)
Foreign Referenced Citations (3)
Number |
Date |
Country |
3036710 |
May 1982 |
DEX |
3627757 |
Feb 1988 |
DEX |
3842896 |
Nov 1989 |
DEX |
Non-Patent Literature Citations (1)
Entry |
Lamola et al, Chemically Amplified Resists, Solid State Technology; Aug. 1991 pp. 53-60. |
Divisions (1)
|
Number |
Date |
Country |
Parent |
814632 |
Dec 1991 |
|