Number | Date | Country | Kind |
---|---|---|---|
2000-188176 | Jun 2000 | JP | |
2000-190631 | Jun 2000 | JP |
Number | Name | Date | Kind |
---|---|---|---|
4981549 | Yamashita et al. | Jan 1991 | A |
5817171 | Sakurada et al. | Oct 1998 | A |
5935320 | Graef et al. | Aug 1999 | A |
6045610 | Park et al. | Apr 2000 | A |
6077343 | Iida et al. | Jun 2000 | A |
6120598 | Iida et al. | Sep 2000 | A |
6179911 | Tomioka et al. | Jan 2001 | B1 |
6261361 | Iida et al. | Jul 2001 | B1 |
Number | Date | Country |
---|---|---|
0716168 | Jun 1996 | EP |
0747513 | Dec 1996 | EP |
0890662 | Jan 1999 | EP |
0909840 | Apr 1999 | EP |
0962557 | Dec 1999 | EP |
8-339024 | Dec 1996 | JP |
10-236897 | Sep 1998 | JP |
11-189493 | Jul 1999 | JP |
2000-44389 | Feb 2000 | JP |
Entry |
---|
Wolf et al.,. Silicon Processing for the VLSI Era, vol. 1: Process Technology, Lattice Press, Sunset Beach, CA, USA, pp. 8-11, 27-33, 36-72, 124, 139-142, 1986.* |
Japanese Journal of Applied Physics, vol. 36, No. 11 (1997) pp. 6595-6600. |