Claims
- 1. A laminate construction for microwave electronics applications, comprising:
at least one ground plane, a lower layer of dielectric material having a dissipation factor Df at 1 GHz of greater than 0.005, applied to the at least one ground plane, an upper layer of dielectric material having a dissipation factor Df at 1 GHz of less than 0.005 applied to the lower layer, and a conductor layer on the upper layer, wherein the material of the lower layer has a dielectric constant Dk that is greater than or substantially equal to the dielectric constant Dk of the material of the upper layer.
- 2. The laminate construction of claim 1, wherein the upper layer is approximately 200 μm thick.
- 3. A method of manufacturing a laminate construction, comprising the following steps:
applying onto a ground plane a lower layer of dielectric material having a dissipation factor Df at 1 GHz of greater than 0.005, applying onto the lower layer an upper layer of dielectric material having a dissipation factor Df at 1 GHz of less than 0.005 and having a dielectric constant Dk which is less than or substantially equal to the dielectric constant Dk of the lower layer, and thereafter applying a conductor layer onto the upper layer.
- 4. The method of claim 3, wherein the upper layer is approximately 200 μm thick.
Priority Claims (1)
Number |
Date |
Country |
Kind |
9802769-1 |
Aug 1998 |
SE |
|
Parent Case Info
[0001] This application is a continuation-in-part of co-pending U.S. patent application Ser. No. 09/377,272, filed Aug. 19, 1999, of which the entire content is hereby incorporated by reference.
Continuation in Parts (1)
|
Number |
Date |
Country |
Parent |
09377272 |
Aug 1999 |
US |
Child |
09829247 |
Apr 2001 |
US |