"Dry Etching for VLSI Fabrication", by S. Wolf and R. N. Tauber, Silicon Processing for the VLSI Era, vol. 1: Process Technology, Lattice Press, pp. 539-585 (1986). |
"A New Chemical Dry Etching", by Yasuhiro Horiike and Masahiro Shibagaki, Proceedings of the 7th Conference on Solid State Devices, Tokyo, 1975, Supplement to Japanese Journal of Applied Physics, vol. 15, pp. 13-18 (1976). |
"Chemiluminescence and the Reaction of Molecular Fluorine with Silicon", by J. A. Mucha, V. M. Donnelly, D. L. Flamm, and L. M. Webb, J. Phys. Chem., 1901, B5, pp. 3529-3532 (1981). |
"A Dry Etching Technology Using Long-Live Active Species Excited by Microwave", by Y. Horiike and M. Shibagaki, Toshiba Research and Development Center, Tokyo Shibaura Electric Co., Ltd., Kawasaki, Japan, pp. 1-11. |
"Down-Flow Type Resist Ashing Technique Employing Reaction of Fluorine Atoms to Water Vapor", by H. Okano, N. Hayasaka and Y. Horiike, VLSI Research Center Toshiba Corp. |
"Radio-Frequency (RF) Sputtering", by S. Wolf and R. N. Tauber, Silicon Processing for the VLSI Era, vol. 1: Process Technology, Lattice Press, pp. 348-353 (1986). |
"High Vacuum Pumps III: Turbomolecular Pumps", by S. Wolf and R. N. Tauber, Silicon Processing for the VLSI Era, vol. 1: Process Technology, Lattice Press, pp. 95-97 (1986). |