Problems associated with etching

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H01J2237/3343

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

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H01J2237/3343Problems associated with etching

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Stage, plasma processing apparatus, and cleaning method
- Patent number 12,300,471
- Issue date May 13, 2025
- Tokyo Electron Limited
- Takahiro Senda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating apparatus having edge impedance control circuit
- Patent number 12,300,470
- Issue date May 13, 2025
- Semes Co., Ltd.
- Daehyun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of uniformity control
- Patent number 12,300,468
- Issue date May 13, 2025
- Tokyo Electron Limited
- Shyam Sridhar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hybrid plasma source array
- Patent number 12,266,503
- Issue date Apr 1, 2025
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for using binning to increase power during a lo...
- Patent number 12,266,505
- Issue date Apr 1, 2025
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process control for ion energy delivery using multiple generators a...
- Patent number 12,255,052
- Issue date Mar 18, 2025
- Lam Research Corporation
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating apparatus and substrate support unit
- Patent number 12,249,491
- Issue date Mar 11, 2025
- Semes Co., Ltd.
- Hyoungkyu Son
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate supporting unit, apparatus for treating substrate includi...
- Patent number 12,243,726
- Issue date Mar 4, 2025
- Semes Co., Ltd.
- Jae-Won Shin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method for manufacturing semiconductor structure
- Patent number 12,165,851
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Lun Ke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Uniformity control circuit for impedance match
- Patent number 12,165,844
- Issue date Dec 10, 2024
- Lam Research Corporation
- Alexei M. Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,074,076
- Issue date Aug 27, 2024
- HITACHI HIGH-TECH CORPORATION
- Soichiro Eto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method for manufacturing mounting s...
- Patent number 12,033,886
- Issue date Jul 9, 2024
- Tokyo Electron Limited
- Yasuharu Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching uniformity regulating device and method
- Patent number 12,027,345
- Issue date Jul 2, 2024
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Xiaobo Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,014,903
- Issue date Jun 18, 2024
- HITACHI HIGH-TECH CORPORATION
- Tetsuo Kawanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-chamber low-profile sensor assembly
- Patent number 12,009,235
- Issue date Jun 11, 2024
- Applied Materials, Inc.
- Chuang-Chia Lin
- G01 - MEASURING TESTING
Information Patent Grant
Plasma processing apparatus
- Patent number 12,009,180
- Issue date Jun 11, 2024
- HITACHI HIGH-TECH CORPORATION
- Norihiko Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,972,925
- Issue date Apr 30, 2024
- Tokyo Electron Limited
- Bong seong Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 11,961,718
- Issue date Apr 16, 2024
- Tokyo Electron Limited
- Shojiro Yahata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,862,436
- Issue date Jan 2, 2024
- Tokyo Electron Limited
- Toru Fujii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Real-time control of temperature in a plasma chamber
- Patent number 11,823,875
- Issue date Nov 21, 2023
- Lam Research Corporation
- Changyou Jing
- G05 - CONTROLLING REGULATING
Information Patent Grant
Devices and methods for controlling wafer uniformity in plasma-base...
- Patent number 11,769,652
- Issue date Sep 26, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jr-Sheng Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Workpiece processing method
- Patent number 11,735,423
- Issue date Aug 22, 2023
- Tokyo Electron Limited
- Masahiro Tabata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process kit with adjustable tuning ring for edge uniformity control
- Patent number 11,728,143
- Issue date Aug 15, 2023
- Applied Materials, Inc.
- Yogananda Sarode Vishwanath
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reaction chamber and plasma apparatus
- Patent number 11,715,627
- Issue date Aug 1, 2023
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Wei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for delivering a plurality of waveform signals...
- Patent number 11,694,876
- Issue date Jul 4, 2023
- Applied Materials, Inc.
- James Rogers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 11,557,485
- Issue date Jan 17, 2023
- Tokyo Electron Limited
- Yoshihide Kihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method, plasma processing apparatus and method of...
- Patent number 11,521,866
- Issue date Dec 6, 2022
- Samsung Electronics Co., Ltd.
- Seung-Yoon Song
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for focus ring thickness determinations and fee...
- Patent number 11,393,663
- Issue date Jul 19, 2022
- Tokyo Electron Limited
- Merritt Funk
- G05 - CONTROLLING REGULATING
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,387,110
- Issue date Jul 12, 2022
- HITACHI HIGH-TECH CORPORATION
- Yasushi Sonoda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Workpiece processing method
- Patent number 11,322,354
- Issue date May 3, 2022
- Tokyo Electron Limited
- Masahiro Tabata
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE TREATING APPARATUS AND SUBSTRATE SUPPORT UNIT
- Publication number 20250166977
- Publication date May 22, 2025
- SEMES CO., LTD.
- HYOUNGKYU SON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND END POINT DETECTION METHOD
- Publication number 20250157787
- Publication date May 15, 2025
- TOKYO ELECTRON LIMITED
- Masakazu HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER EDGE TILT AND ETCH RATE UNIFORMITY
- Publication number 20250149306
- Publication date May 8, 2025
- LAM RESEARCH CORPORATION
- Pratik Mankidy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE HIGH-DENSITY PLASMA FOR SELECTIVE ETCH
- Publication number 20250118536
- Publication date Apr 10, 2025
- Applied Materials, Inc.
- Yi-Hsuan Hsiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS
- Publication number 20250079134
- Publication date Mar 6, 2025
- NGK Insulators, Ltd.
- Tatsuya KUNO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE
- Publication number 20250069860
- Publication date Feb 27, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Lun KE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UNIFORMITY CONTROL CIRCUIT FOR IMPEDANCE MATCH
- Publication number 20250062102
- Publication date Feb 20, 2025
- LAM RESEARCH CORPORATION
- Alexei M. Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY ETCHER UNIFORMITY CONTROL BY TUNING EDGE ZONE PLASMA SHEATH
- Publication number 20240387152
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Po-Lung HUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ELECTRODE SOURCE ASSEMBLY FOR PLASMA PROCESSING
- Publication number 20240355586
- Publication date Oct 24, 2024
- Applied Materials, Inc.
- Linying CUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Advanced OES Characterization
- Publication number 20240339309
- Publication date Oct 10, 2024
- TOKYO ELECTRON LIMITED
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DENSIFIED SEAM-FREE SILICON GAP FILL PROCESSES
- Publication number 20240331975
- Publication date Oct 3, 2024
- Applied Materials, Inc.
- Shuchi Sunil Ojha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-CHAMBER LOW-PROFILE SENSOR ASSEMBLY
- Publication number 20240290640
- Publication date Aug 29, 2024
- Applied Materials, Inc.
- Chuang-Chia Lin
- G01 - MEASURING TESTING
Information Patent Application
SEMICONDUCTOR MANUFACTURING DEVICE
- Publication number 20240266148
- Publication date Aug 8, 2024
- Samsung Electronics Co., Ltd.
- Min Su LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA UNIFORMITY CONTROL SYSTEM AND METHODS
- Publication number 20240266152
- Publication date Aug 8, 2024
- Applied Materials, Inc.
- Michael Andrew STEARNS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pulsed RF Plasma Generator With High Dynamic Range
- Publication number 20240258071
- Publication date Aug 1, 2024
- MKS Instruments, Inc.
- Ky LUU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA SUBSTRATE TREATMENT APPARATUS
- Publication number 20240234101
- Publication date Jul 11, 2024
- INNOVATION FOR CREATIVE DEVICES CO., LTD.
- Buil JEON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-SECTIONAL PLASMA CONFINEMENT RING STRUCTURE
- Publication number 20240234104
- Publication date Jul 11, 2024
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING DEVICE
- Publication number 20240203700
- Publication date Jun 20, 2024
- Jusung Engineering Co., Ltd.
- Ho Boem HER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORTING UNIT, APPARATUS FOR TREATING SUBSTRATE INCLUDI...
- Publication number 20240153747
- Publication date May 9, 2024
- SEMES CO., LTD.
- Jae-Won SHIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metallic Shield For Stable Tape-Frame Substrate Processing
- Publication number 20240136159
- Publication date Apr 25, 2024
- Harish Varma PENMETHSA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND CLEANING METHOD
- Publication number 20240120185
- Publication date Apr 11, 2024
- TOKYO ELECTRON LIMITED
- Kazuki TSUCHIYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUS RING AND PLASMA ETCHING APPARATUS COMPRISING THE SAME
- Publication number 20240055238
- Publication date Feb 15, 2024
- SK enpulse Co., Ltd.
- Kyungyeol MIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REAL-TIME CONTROL OF TEMPERATURE IN A PLASMA CHAMBER
- Publication number 20240047183
- Publication date Feb 8, 2024
- LAM RESEARCH CORPORATION
- Changyou Jing
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240021412
- Publication date Jan 18, 2024
- SEMES CO., LTD.
- Seong Pyo AHN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240014007
- Publication date Jan 11, 2024
- Hitachi High-Tech Corporation
- Norihiko Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240014010
- Publication date Jan 11, 2024
- Hitachi High-Tech Corporation
- Tetsuo KAWANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS FOR DRY ETCHING
- Publication number 20240006157
- Publication date Jan 4, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
- Chien-Liang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUS RING FOR A PLASMA-BASED SEMICONDUCTOR PROCESSING TOOL
- Publication number 20230386799
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Sheng-Chieh HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Uniformity Control
- Publication number 20230377849
- Publication date Nov 23, 2023
- TOKYO ELECTRON LIMITED
- Shyam Sridhar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING APPARATUS AND METHOD OF MANUFACTURE
- Publication number 20230326705
- Publication date Oct 12, 2023
- Taiwan Semiconductor Manufacturing Company Limited
- Chansyun David YANG
- H01 - BASIC ELECTRIC ELEMENTS

Problems associated with etching

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Stage, plasma processing apparatus, and cleaning method

Substrate treating apparatus having edge impedance control circuit

Method of uniformity control

Hybrid plasma source array

Systems and methods for using binning to increase power during a lo...

Process control for ion energy delivery using multiple generators a...

Substrate treating apparatus and substrate support unit

Substrate supporting unit, apparatus for treating substrate includi...

Plasma processing method for manufacturing semiconductor structure

Uniformity control circuit for impedance match

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and method for manufacturing mounting s...

Etching uniformity regulating device and method

Plasma processing apparatus

In-chamber low-profile sensor assembly

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Plasma processing method and plasma processing apparatus

Plasma processing apparatus and plasma processing method

Real-time control of temperature in a plasma chamber

Devices and methods for controlling wafer uniformity in plasma-base...

Workpiece processing method

Process kit with adjustable tuning ring for edge uniformity control

Reaction chamber and plasma apparatus

Apparatus and method for delivering a plurality of waveform signals...

Plasma processing method and plasma processing apparatus

Plasma processing method, plasma processing apparatus and method of...

Methods and systems for focus ring thickness determinations and fee...

Plasma processing apparatus and plasma processing method

Workpiece processing method

Patents Applicationslast 30 patents

SUBSTRATE TREATING APPARATUS AND SUBSTRATE SUPPORT UNIT

PLASMA PROCESSING APPARATUS AND END POINT DETECTION METHOD

WAFER EDGE TILT AND ETCH RATE UNIFORMITY

MICROWAVE HIGH-DENSITY PLASMA FOR SELECTIVE ETCH

MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS

PLASMA PROCESSING METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE

UNIFORMITY CONTROL CIRCUIT FOR IMPEDANCE MATCH

DRY ETCHER UNIFORMITY CONTROL BY TUNING EDGE ZONE PLASMA SHEATH

MULTI-ELECTRODE SOURCE ASSEMBLY FOR PLASMA PROCESSING

Advanced OES Characterization

DENSIFIED SEAM-FREE SILICON GAP FILL PROCESSES

IN-CHAMBER LOW-PROFILE SENSOR ASSEMBLY

SEMICONDUCTOR MANUFACTURING DEVICE

PLASMA UNIFORMITY CONTROL SYSTEM AND METHODS

Pulsed RF Plasma Generator With High Dynamic Range

PLASMA SUBSTRATE TREATMENT APPARATUS

MULTI-SECTIONAL PLASMA CONFINEMENT RING STRUCTURE

SUBSTRATE PROCESSING DEVICE

SUBSTRATE SUPPORTING UNIT, APPARATUS FOR TREATING SUBSTRATE INCLUDI...

Metallic Shield For Stable Tape-Frame Substrate Processing

PLASMA PROCESSING APPARATUS AND CLEANING METHOD

FOCUS RING AND PLASMA ETCHING APPARATUS COMPRISING THE SAME

REAL-TIME CONTROL OF TEMPERATURE IN A PLASMA CHAMBER

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

METHODS AND SYSTEMS FOR DRY ETCHING

FOCUS RING FOR A PLASMA-BASED SEMICONDUCTOR PROCESSING TOOL

Method of Uniformity Control

PROCESSING APPARATUS AND METHOD OF MANUFACTURE