Claims
- 1. An apparatus for performing Plasma Chemical Vapor Deposition, whereby one or more layers of silica can be deposited on an elongated viterous substrate, the apparatus comprising an elongated microwave guide which emerges into a resonant cavity which is substantially cylindrically symmetric about a cylindrical axis, along which axis the substrate can be positioned, the cavity being substantially annular in form, with an inner cylindrical wall and an outer cylindrical wall, the inner cylindrical wall comprising a slit which extends in a full circle around the cylindrical axis, and the guide having a longitudinal axis which is substantially perpendicular to the cylindrical axis and which does not intercept the slit, the slit having a width, W, the elongated microwave guide configured to deliver microwave radiation energy to the resonant cavity, the microwave radiation having a vacuum wavelength, λ, the width, W, of the slit being sized to satisfy the relationship: W≦λ/10.
- 2. The apparatus of claim 1 wherein the width, W, is further sized to satisfy the relationship: W>λ/35.
- 3. An apparatus for performing Plasma Chemical Vapor Deposition. whereby one or more layers of silica can be deposited on an elongated viterous substrate, the apparatus comprising an elongated microwave guide which emerges into a resonant cavity which is substantially cylindrically symmetric about a cylindrical axis, along which axis the substrate be positioned, the cavity being substantially annular in form, with an inner cylindrical wall and an outer cylindrical wall, the inner cylindrical wall comprising a slit which extends in a full circle around the cylindrical axis, and the guide having a longitudinal axis which is substantially perpcndicular to the cylindrical axis and which does not intercept the slit, and does not bisect the resident cavity, the slit having a width, W, the elongated microwave guidc contigured to deliver microwave radiation energy to the resonant cavity, the microwave radiation having a vacuum wavelength, λ, the width, W, of the slit being sized to satisfy the relationship: λ/35<W≦/10.
Priority Claims (1)
Number |
Date |
Country |
Kind |
97204152 |
Dec 1997 |
EP |
|
CROSS-REFERENCE TO RELATED APPLICATION
This application is a continuation-in-part of U.S. patent application Ser. No. 09/221,227, filed Dec. 23, 1998, and allowed Jan. 18, 2001, now pending, which application is incorporated herein by reference in its entirety.
US Referenced Citations (6)
Number |
Name |
Date |
Kind |
4292063 |
Abe |
Sep 1981 |
A |
4473596 |
Beerwald et al. |
Sep 1984 |
A |
4877938 |
Rau et al. |
Oct 1989 |
A |
5597624 |
Blinov et al. |
Jan 1997 |
A |
6161498 |
Toraguchi et al. |
Dec 2000 |
A |
6253703 |
Echizen et al. |
Jul 2001 |
B1 |
Foreign Referenced Citations (2)
Number |
Date |
Country |
0554845 |
Aug 1993 |
EP |
2149779 |
Jun 1985 |
GB |
Continuation in Parts (1)
|
Number |
Date |
Country |
Parent |
09/221227 |
Dec 1998 |
US |
Child |
09/839028 |
|
US |