Patent Application
20250147440
This application claims priority of EP Application Serial No. 22158569.8 which was filed on Feb. 24, 2022 and which is incorporated herein in its entirety by reference.
The present invention relates to pellicles for use in a lithographic apparatus and associated methods for forming such pellicles. The present invention also relates to a lithographic apparatus comprising a membrane disposed in a path of a radiation beam of the lithographic apparatus (used for forming an image on a substrate).
A lithographic apparatus is a machine constructed to apply a desired pattern onto a substrate. A lithographic apparatus can be used, for example, in the manufacture of integrated circuits (ICs). A lithographic apparatus may for example project a pattern from a patterning device (e.g., a mask) onto a layer of radiation-sensitive material (resist) provided on a substrate.
The wavelength of radiation used by a lithographic apparatus to project a pattern onto a substrate determines the minimum size of features that can be formed on that substrate. A lithographic apparatus that uses EUV radiation, being electromagnetic radiation having a wavelength within the range 4-20 nm, may be used to form smaller features on a substrate than a conventional lithographic apparatus (which may for example use electromagnetic radiation with a wavelength of 193 nm).
A patterning device (e.g., a mask) that is used to impart a pattern to a radiation beam in a lithographic apparatus may form part of a mask assembly. A mask assembly may include a pellicle that protects the patterning device from particle contamination. The pellicle may be supported by a pellicle frame.
It may be desirable to provide an apparatus and/or method that obviates or mitigates one or more problems associated with the prior art.
According to a first aspect of the present disclosure there is provided a membrane for use in a lithographic apparatus, the membrane comprising: a core substrate; and a metal silicate layer, wherein the metal silicate layer is an outermost layer of the membrane.
The membrane may be provided within an EUV lithographic apparatus.
For example, the membrane may form part of a pellicle. The pellicle may be suitable for use adjacent to a reticle within an EUV lithographic apparatus. In use, such a (reflective) reticle is illuminated with EUV radiation, for example from an illumination system. It will be appreciated that the reticle is configured to impart the radiation beam received from the illumination system with a pattern in its cross-section to form a patterned radiation beam. A projection system collects the (reflected) patterned radiation beam and forms a (diffraction-limited) image of the reticle on a substrate (for example a resist coated silicon wafer). Any contamination on the reticle will, in general, alter the image formed on the substrate, leading to printing errors.
To avoid particle contamination of the reticles, it is known to use a thin membrane, known as a pellicle, to protect the reticle. The pellicle is disposed in front of the reticle and prevents particles from the landing on the reticle. The pellicle is disposed such that it is not sharply imaged by the projection system and therefore particles on the pellicle do not interfere with the imaging process. It is desirable for the pellicle to be sufficiently thick that it stops particles from impinging on the reticle that would cause unacceptable printing errors but as thin as possible to reduce the absorption of EUV radiation by the pellicle. It is known to provide an outer layer on a pellicle that has better stability within the environment of an EUV lithographic apparatus in order to protect other layers of the pellicle. Such an outer layer may be referred to as a capping layer.
Alternatively, the membrane may form part of a dynamic gas lock. Alternatively, the membrane may form part of a spectral filter.
Designing a membrane that is stable in the environment within the lithographic apparatus is challenging for several reasons. First, the environment within the lithographic apparatus is alternatingly reducing and oxidizing in the presence of EUV photons, a high temperature, free radicals, ions and electrons. Second, in order to minimize attenuation of the EUV radiation, it is desirable to provide a capping layer with a small thickness, say of the order of 5 nm. For many materials, such a layer thickness when provided in the environment of the EUV lithographic apparatus are subject to significant degradation. For example, in general, most nitrides tend to oxidize, most oxides tend to reduce, and most metals tend to de-wet when they are provided in a layer of such a small thickness. Furthermore, most materials tend to be subject to thermally induced outgassing and desorption phenomena.
The membrane according to the first aspect is particularly advantageous, as now discussed.
The metal silicate layer may be generally of the form of MexSiyOz, where Me is a metal. Advantageously, it has been found that a metal silicate layer is suitable for use as a protective layer for other parts of the pellicle. In particular, in conditions experienced in use within an EUV lithographic apparatus, such a metal silicate layer has been found to be stable, even for thicknesses of the order of 5 nm or less (such thicknesses advantageously reduce the absorption of EUV radiation by the pellicle to an acceptable level). In particular, it has been found that at elevated temperatures metal silicate layers on a membrane are not susceptible to oxidation, not susceptible to thermal de-wetting, not susceptible to etching in the presence of hydrogen radicals, hydrogen ions (with energies of the order of up to ˜ 50 eV) and hydrogen plasma with energies in the range 1-30 eV, even with thicknesses smaller than 5 nm.
In use, a pellicle will receive a significant heat load from the EUV radiation. It is known to provide a metal layer on a pellicle to act as an emissive layer so as to reduce an operating temperature of the pellicle. Typically, metals absorb EUV radiation well and have a relatively high extinction coefficient for EUV radiation (for example relative to a bulk of the pellicle which may be formed, for example, from silicon). Therefore, it is desirable to minimize the thickness of such an emissive layer, whilst still reducing the operating temperature of pellicle to an acceptable level. A desirable thickness of a metal emissive layer may be of the order of 5 nm. However, metal layers having such thicknesses are susceptible to thermal de-wetting and degrade unacceptably quickly within the environment of an EUV lithographic apparatus. It has previously been suggested to use a metal silicate layer (the metal being ruthenium, zirconium or hafnium) between a silicon substrate and a metal (emissive) layer as it has been found that such an intermediate metal silicate layer can prevent or reduce the de-wetting of the metal layer. In contrast to such an intermediate metal silicate layer, the membrane according to the first aspect is an outermost layer of the membrane and acts as a protective layer to other parts of the membrane.
The membrane may comprise two metal silicate layers. The two metal silicate layers may be disposed on opposite sides of the core substrate. Each metal silicate layer may be an outermost layer of the membrane.
The metal of at least one of the metal silicate layer(s) may be yttrium.
That is, the metal silicate layer(s) may comprise yttrium silicate (YxSiyOz). For example, the metal silicate layer(s) may comprise yttrium orthosilicate (Y2Si1O5) or the ceramic Y2Si2O7.
The metal of at least one of the metal silicate layer(s) may be ruthenium.
At least one of the metal silicate layer(s) may be stable within the environment of an EUV lithographic apparatus.
It will be appreciated that a metal silicate layer being stable is intended to mean the metal silicate layer is not susceptible to oxidation, not susceptible to thermal de-wetting and not susceptible to plasma etching.
It will be appreciated that within the environment of an EUV lithographic apparatus the membrane may typically cycle through a range of temperatures of 20-600° C. Within the lithographic apparatus the hydrogen plasma may have energies in the range 1-30 eV. Typical hydrogen ion energies encountered within the lithographic apparatus may be, for example, ion energies of up to ˜ 50 eV (for example 1-30 e V).
A thickness of at least one of the metal silicate layer(s) may be less than or equal to 10 nm.
A thickness of at least one of the metal silicate layer(s) may be less than or equal to 5 nm.
In some embodiments, the thickness of the metal silicate layer(s) may be less than or equal to around 4.5 nm. In some embodiments, the thickness of the metal silicate layer(s) may be less than or equal to around 3.5 nm.
An EUV transmissivity of at least one of the metal silicate layer(s) may be 96% or more.
In some embodiments, an EUV transmissivity of at least one of the metal silicate layers is 97% or more. In some embodiments, an EUV transmissivity of at least one of the metal silicate layers is 98% or more. In some embodiments, an EUV transmissivity of at least one of the metal silicate layers is 99% or more.
According to a second aspect of the present disclosure there is provided a membrane for use in a lithographic apparatus, the membrane comprising an yttrium silicate layer.
In use, the membrane may be provided within an EUV lithographic apparatus. For example, the membrane may form part of a pellicle. Alternatively, the membrane may form part of a dynamic gas lock. Alternatively, the membrane may form part of a spectral filter. As explained above, designing a membrane that is stable in the environment within the lithographic apparatus is challenging for several reasons.
The membrane according to the second aspect is particularly advantageous, as now discussed.
The yttrium silicate layer may be generally of the form of YxSiyOz. Advantageously, it has been found that an yttrium silicate layer is suitable for use as a protective layer for other parts of the pellicle. In particular, in conditions experienced in use within an EUV lithographic apparatus, such an yttrium silicate layer has been found to be stable, even for thicknesses of the order of 5 nm or less (such thicknesses advantageously reduce the absorption of EUV radiation by the pellicle to an acceptable level). In particular, it has been found that at elevated temperatures yttrium silicate layers on a membrane are particularly stable (for example, not susceptible to oxidation, not susceptible to thermal de-wetting, and not susceptible to plasma etching), even with thicknesses smaller than 5 nm.
The yttrium silicate layer may comprise yttrium orthosilicate (Y2Si1O5) or the ceramic Y2Si2O7.
The membrane may further comprise a core substrate.
The membrane may comprise two yttrium silicate layers. The two yttrium silicate layers may be disposed on opposite sides of the core substrate.
At least one of the yttrium silicate layer(s) may be an outermost layer of the membrane.
At least one of the yttrium silicate layer(s) may be disposed between the core substrate and a layer of yttrium or yttrium oxide.
A thickness of at least one of the yttrium silicate layer(s) may be less than or equal to 10 nm.
A thickness of at least one of the yttrium silicate layer(s) may be less than or equal to 5 nm.
In some embodiments, the thickness of the yttrium silicate layer(s) may be less than or equal to around 4.5 nm. In some embodiments, the thickness of the yttrium silicate layer(s) may be less than or equal to around 3.5 nm.
An EUV transmissivity of at least one of the yttrium silicate layer(s) may be 96% or more.
In some embodiments, an EUV transmissivity of at least one of the yttrium silicate layer(s) is 97% or more. In some embodiments, an EUV transmissivity of at least one of the yttrium silicate layer(s) is 98% or more. In some embodiments, an EUV transmissivity of at least one of the yttrium silicate layer(s) is 99% or more.
The core substrate of the membrane of either the first aspect or the second aspect of the present disclosure may comprise a silicon-based substrate.
The silicon based substrate may comprise silicon and/or silicon nitride (SiNx).
The core substrate of the membrane of either the first aspect or the second aspect of the present disclosure may comprise a metallic layer.
Such a metal layer can act as an emissivity layer, improving removal of the EUV heat load from the membrane.
The membrane of either the first aspect or the second aspect of the present disclosure may further comprise a seed layer disposed between the silicon-based substrate and the metallic layer.
According to a third aspect of the present disclosure there is provided a pellicle for use in a lithographic apparatus, the pellicle comprising the membrane of any preceding claim.
The pellicle may further comprise a border portion at a peripheral portion of the membrane.
The pellicle may further comprise a frame arranged to support the pellicle.
According to a fourth aspect of the present disclosure there is provided a patterning device and pellicle assembly comprising: a patterning device; and the pellicle of the third aspect of the present disclosure releasably engaged with said patterning device.
According to a fifth aspect of the present disclosure there is provided a lithographic apparatus operable to form an image of a patterning device on a substrate using a radiation beam, the lithographic apparatus comprising the patterning device and pellicle assembly of the fourth aspect of the present disclosure.
According to a sixth aspect of the present disclosure there is provided a lithographic apparatus operable to form an image of a patterning device on a substrate using a radiation beam, the lithographic apparatus comprising the membrane of the first or second aspects of the present disclosure disposed in a path of the radiation beam.
The membrane may form part of a dynamic gas lock.
The membrane may form part of a spectral filter.
The membrane may form part of a pellicle.
According to a seventh aspect of the present disclosure there is provided a method for forming a membrane according to the first or second aspect of the present disclosure, the method comprising: providing a silicon-based substrate; applying a metal or metal oxide layer on the silicon-based substrate to form an intermediate membrane; and annealing the intermediate membrane so form the metal silicate layer from the silicon-based substrate and the metal or metal oxide layer.
The silicon-based substrate may comprise an outer layer of a silicon oxide or a silicon oxynitride.
The silicon-based substrate may further comprise a silicon substrate. The silicon substrate may, for example, comprise a polycrystalline silicon substrate.
Annealing the intermediate membrane may comprise elevating a temperature of the intermediate membrane to at least 700° C. for an annealing time period.
In some embodiments, annealing the intermediate membrane may comprise elevating a temperature of the intermediate membrane to at least 800° C. for the time annealing period. In some embodiments, annealing the intermediate membrane may comprise elevating a temperature of the intermediate membrane to at least 900° C. for the time annealing period.
It will be appreciated that the annealing time period may be sufficiently long to form the metal silicate layer from the silicon-based substrate and the metal or metal oxide layer. Therefore, the annealing time period may be selected based on the materials (for example the metal used and the type of silicon-based substrate), the thickness of the metal or metal oxide layer and/or a desired target thickness of the metal silicate layer. For a metal silicate layer with a thickness of less than 10 nm (for example less than 5 nm) a relatively short annealing time may be sufficient.
The annealing time period may be sufficiently long to ensure that substantially all of the metal or metal oxide layer is converted into the metal silicate layer.
In some embodiments, the annealing time period may be longer than necessary, for example, to ensure that substantially all of the metal or metal oxide layer is converted into the metal silicate layer.
The annealing time period may be at least 1 hour.
In some embodiments, the annealing time period may be at least 2 hours.
Annealing the intermediate membrane may occur in the presence of nitrogen gas at a pressure of 1 bar.
In other embodiments, annealing of the intermediate membrane may occur in vacuum. In some other embodiments, annealing of the intermediate membrane may occur in-situ (for example in a lithographic apparatus). Such in-situ annealing may be achieved by exposure of the membrane to EUV radiation.
It will be appreciated that one or more aspects or features described above or referred to in the following description may be combined with one or more other aspects or features.
Embodiments of the invention will now be described, by way of example only, with reference to the accompanying schematic drawings, in which:
The radiation source SO; the illumination system IL; the region adjacent the support structure MT and the patterning device MA; and the projection system PS may all be constructed and arranged such that they can be isolated from the external environment. A gas at a pressure below atmospheric pressure (e.g., hydrogen) may be provided in the radiation source SO. A vacuum may be provided in the illumination system IL; the region adjacent the support structure MT and the patterning device MA; and/or the projection system PS. A small amount of gas (e.g., hydrogen) at a pressure well below atmospheric pressure may be provided in the illumination system IL; the region adjacent the support structure MT and the patterning device MA; and/or the projection system PS.
The radiation source SO shown in
The EUV radiation is collected and focused by a near normal incidence radiation collector 5 (sometimes referred to more generally as a normal incidence radiation collector). The collector 5 may have a multilayer structure that is arranged to reflect EUV radiation (e.g., EUV radiation having a desired wavelength such as 13.5 nm). The collector 5 may have an elliptical configuration, having two ellipse focal points. A first focal point may be at the plasma formation region 4, and a second focal point may be at an intermediate focus 6, as discussed below.
In other embodiments of a laser produced plasma (LPP) source the collector 5 may be a so-called grazing incidence collector that is configured to receive EUV radiation at grazing incidence angles and focus the EUV radiation at an intermediate focus. A grazing incidence collector may, for example, be a nested collector, comprising a plurality of grazing incidence reflectors. The grazing incidence reflectors may be disposed axially symmetrically around an optical axis.
The radiation source SO may include one or more contamination traps (not shown). For example, a contamination trap may be located between the plasma formation region 4 and the radiation collector 5. The contamination trap may for example be a rotating foil trap, or may be any other suitable form of contamination trap.
The laser 1 may be separated from the radiation source SO. Where this is the case, the laser beam 2 may be passed from the laser 1 to the radiation source SO with the aid of a beam delivery system (not shown) comprising, for example, suitable directing mirrors and/or a beam expander, and/or other optics. The laser 1 and the radiation source SO may together be considered to be a radiation system.
Radiation that is reflected by the collector 5 forms a radiation beam B. The radiation beam B is focused at point 6 to form an image of the plasma formation region 4, which acts as a virtual radiation source for the illumination system IL. The point 6 at which the radiation beam B is focused may be referred to as the intermediate focus. The radiation source SO is arranged such that the intermediate focus 6 is located at or near to an opening 8 in an enclosing structure 9 of the radiation source SO.
The radiation beam B passes from the radiation source SO into the illumination system IL, which is configured to condition the radiation beam. The illumination system IL may include a facetted field mirror device 10 and a facetted pupil mirror device 11. The faceted field mirror device 10 and faceted pupil mirror device 11 together provide the radiation beam B with a desired cross-sectional shape and a desired angular distribution. The radiation beam B passes from the illumination system IL and is incident upon the reticle assembly 15 held by the support structure MT. The reticle assembly 15 includes a patterning device MA and a pellicle 19. The pellicle is mounted to the patterning device MA via a pellicle frame 17. The reticle assembly 15 may be referred to as a reticle and pellicle assembly 15. The patterning device MA reflects and patterns the radiation beam B. The illumination system IL may include other mirrors or devices in addition to or instead of the faceted field mirror device 10 and faceted pupil mirror device 11.
Following reflection from the patterning device MA the patterned radiation beam B enters the projection system PS. The projection system comprises a plurality of mirrors 13, 14 that are configured to project the radiation beam B onto a substrate W held by the substrate table WT. The projection system PS may apply a reduction factor to the radiation beam, forming an image with features that are smaller than corresponding features on the patterning device MA. A reduction factor of 4 may for example be applied. Although the projection system PS has two mirrors 13, 14 in
The lithographic apparatus may, for example, be used in a scan mode, wherein the support structure (e.g., mask table) MT and the substrate table WT are scanned synchronously while a pattern imparted to the radiation beam is projected onto a substrate W (i.e., a dynamic exposure). The velocity and direction of the substrate table WT relative to the support structure (e.g., mask table) MT may be determined by the demagnification and image reversal characteristics of the projection system PS. The patterned radiation beam that is incident upon the substrate W may comprise a band of radiation. The band of radiation may be referred to as an exposure slit. During a scanning exposure, the movement of the substrate table WT and the support structure MT may be such that the exposure slit travels over an exposure field of the substrate W.
The radiation source SO and/or the lithographic apparatus that is shown in
In other embodiments of a lithographic system the radiation source SO may take other forms. For example, in alternative embodiments the radiation source SO may comprise one or more free electron lasers. The one or more free electron lasers may be configured to emit EUV radiation that may be provided to one or more lithographic apparatus.
As was described briefly above, the reticle assembly 15 includes a pellicle 19 that is provided adjacent to the patterning device MA. The pellicle 19 is provided in the path of the radiation beam B such that radiation beam B passes through the pellicle 19 both as it approaches the patterning device MA from the illumination system IL and as it is reflected by the patterning device MA towards the projection system PS. The pellicle 19 comprises a thin film or membrane that is substantially transparent to EUV radiation (although it will absorb a small amount of EUV radiation). By EUV transparent pellicle or a film substantially transparent for EUV radiation herein is meant that the pellicle 19 is transmissive for at least 65% of the EUV radiation, preferably at least 80% and more preferably at least 90% of the EUV radiation. The pellicle 19 acts to protect the patterning device MA from particle contamination.
Whilst efforts may be made to maintain a clean environment inside the lithographic apparatus LA, particles may still be present inside the lithographic apparatus LA. In the absence of a pellicle 19, particles may be deposited onto the patterning device MA. Particles on the patterning device MA may disadvantageously affect the pattern that is imparted to the radiation beam B and therefore the pattern that is transferred to the substrate W. The pellicle 19 advantageously provides a barrier between the patterning device MA and the environment in the lithographic apparatus LA in order to prevent particles from being deposited on the patterning device MA.
The pellicle 19 is positioned at a distance from the patterning device MA that is sufficient that any particles that are incident upon the surface of the pellicle 19 are not in a field plane of the lithographic apparatus LA. This separation between the pellicle 19 and the patterning device MA acts to reduce the extent to which any particles on the surface of the pellicle 19 impart a pattern to the radiation beam B that is imaged onto the substrate W. It will be appreciated that where a particle is present in the beam of radiation B, but at a position that is not in a field plane of the beam of radiation B (for example not at the surface of the patterning device MA), then any image of the particle will not be in focus at the surface of the substrate W. In the absence of other considerations it may be desirable to position the pellicle 19 a considerable distance away from the patterning device MA. However, in practice the space which is available in the lithographic apparatus LA to accommodate the pellicle is limited due to the presence of other components. In some embodiments, the separation between the pellicle 19 and the patterning device MA may, for example, be approximately between 1 mm and 10 mm, for example between 1 mm and 5 mm, for example between 2 mm and 2.5 mm.
The pellicle may comprise a border portion and a membrane. The border portion of the pellicle may be hollow and generally rectangular and the membrane may be bounded by the border portion. As known in the art, one type of pellicle may be formed by deposition of one or more thin layers of material on a generally rectangular silicon substrate. The silicon substrate supports the one or more thin layers during this stage of the construction of the pellicle. Once a desired or target thickness and composition of layers has been applied, a central portion of the silicon substrate is removed by etching (this may be referred to as back etching). A peripheral portion of the rectangular silicon substrate is not etched (or alternatively is etched to a lesser extent than the central portion). This peripheral portion forms the border portion of the final pellicle while the one or more thin layers form the membrane of the pellicle (which is bordered by the border portion). The border portion of the pellicle may be formed from silicon.
A pellicle (for example comprising a membrane and a border) may require some support from a more rigid pellicle frame. The pellicle frame may provide two functions. First, the pellicle frame may support the pellicle and may also tension the pellicle membrane. Second, the pellicle frame may facilitate connection of the pellicle to a patterning device (reticle). It one known arrangement, the pellicle frame may comprise a main, generally rectangular body portion which is glued to the border portion of the pellicle and titanium attachment mechanisms that are glued to the side of this main body. Intermediate fixing members (known as studs) are affixed to the patterning device (reticle). The intermediate fixing members (studs) on the patterning device (reticle) may engage (for example releasably engage) with the attachment members of the pellicle frame.
Ideally the EUV transmissivity of the pellicle 19 is as high as possible. However, in practice, some portion of the EUV radiation beam B is absorbed by the pellicle 19. Since the pellicle 19 is disposed in the direct path of the EUV radiation beam B and the power of the radiation beam B is significant, in use, the pellicle 19 absorbs a significant amount of power. Furthermore, as stated above the region adjacent or in the vicinity of the reticle assembly 15 (which includes the pellicle 19) may be under vacuum conditions or may be provided with a gas (e.g., hydrogen) at a pressure well below atmospheric pressure, which limits the removal of the EUV heat load via conduction and convection. The high heat load received by the pellicle 19 in combination with this low operational ambient gas pressure can therefore result in significantly elevated temperatures for the membrane of the pellicle 19. In the conditions within the lithographic apparatus LA, the pellicle 19 may degrade over time. The low pressure hydrogen gas provided within the lithographic apparatus LA forms a hydrogen plasma in the presence of the EUV radiation (during exposure). It has been found that hydrogen ions and hydrogen free radicals from the hydrogen plasma can chemically affect (for example reduce or etch) pellicles 19, limiting the potential lifetime of the pellicles. The environment within the lithographic apparatus LA is alternatingly reducing and oxidizing in the presence of EUV radiation beam B, free radicals, ions and electrons. Furthermore, the relevant degradation processes often proceed more rapidly at elevated temperatures.
The relevant degradation processes often also occur at the exterior surface of the membrane of the pellicle 19. Therefore one way to raise the pellicle lifetime is to apply a layer to the external surfaces of a pellicle that has a better stability within the environment of an EUV lithographic apparatus (for example, a layer that has increased resistance to plasma etching). Such an outer layer may be referred to as a capping layer. As stated above, in order to avoid high temperatures of the membrane the EUV transmission of the pellicle 19 should be as high as possible (whilst still functioning to block particles from impinging on the patterning device). The choice of the material for the capping layer should be based on the compromise between performance properties (EUV transmission) and protective properties (protection of the layer itself and all the underlying layers).
Some embodiments of the present disclosure relate to a new type of membrane (which may form part of the pellicle 19) and methods of forming such a membrane.
The membrane 100, 100a may form part of a pellicle 19 of the type shown in
Alternatively, the membrane 100, 100a may form part of a dynamic gas lock. Alternatively, the membrane 100, 100a may form part of a spectral filter.
Designing a membrane that is stable in the environment within the lithographic apparatus LA is challenging for several reasons. First, the environment within the lithographic apparatus LA is alternatingly reducing and oxidizing in the presence of EUV photons, a high temperature, free radicals, ions and electrons. Second, in order to minimize attenuation of the EUV radiation beam B, it is desirable to provide a capping layer with a small thickness, say of the order of 5 nm or smaller. For many materials, such a layer thickness would be subject to significant degradation when provided in the environment of the EUV lithographic apparatus LA. For example, in general, most nitrides tend to oxidize, most oxides tend to reduce, and most metals tend to de-wet when they are provided in a layer of such a small thickness. Furthermore, most materials tend to be subject to thermally induced outgassing and desorption phenomena.
The membranes 100, 100a shown schematically in
The metal silicate layer(s) 104, 104a, 104b may be generally of the form of MexSiyOz, where Me is a metal. Advantageously, it has been found that a metal silicate layer is suitable for use as a protective layer for other parts of the pellicle 19. In particular, in conditions experienced in use within an EUV lithographic apparatus LA, such a metal silicate layer 104, 104a, 104b has been found to be stable, even for thicknesses of the order of 5 nm or less (such thicknesses advantageously reduce the absorption of EUV radiation by a pellicle 19 to an acceptable level). In particular, it has been found that at elevated temperatures metal silicate layer(s) 104, 104a, 104b on a membrane 100, 100a are not susceptible to oxidation, not susceptible to thermal de-wetting, not susceptible to etching in the presence of hydrogen radicals, hydrogen ions (with energies of the order of up to ˜ 50 eV) and hydrogen plasma with energies in the range 1-30 eV, even with thicknesses smaller than 5 nm.
In use, a pellicle 19 will receive a significant heat load from the EUV radiation. It is known to provide a metal layer on a pellicle 19 to act as an emissive layer so as to reduce an operating temperature of the pellicle 19. Typically, metals absorb EUV radiation well and have a relatively high extinction coefficient for EUV radiation (for example relative to a bulk of the pellicle 19 which may be formed, for example, from silicon). Therefore, it is desirable to minimize the thickness of such an emissive layer, whilst still reducing the operating temperature of pellicle 19 to an acceptable level. A desirable thickness of a metal emissive layer may be of the order of 5 nm. However, metal layers having such thicknesses are susceptible to thermal de-wetting and degrade unacceptably quickly within the environment of an EUV lithographic apparatus LA. It has previously been suggested to use a metal silicate layer between a silicon substrate and a metal (emissive) layer as it has been found that such an intermediate metal silicate layer can prevent or reduce the de-wetting of the metal layer. In contrast to such an intermediate metal silicate layer, the or each metal silicate layer 104, 104a, 104b of the membranes 100, 100a shown in
In one embodiment that is known to perform well the metal of the metal silicate layer(s) 104, 104a, 104b is yttrium. That is, the metal silicate layer(s) 104, 104a, 104b may comprise yttrium silicate (YxSiyOz). For example, the metal silicate layer(s) 104, 104a, 104b may comprise yttrium orthosilicate (Y2Si1O5) or the ceramic Y2Si2O7.
In another embodiment, the metal of the metal silicate layer(s) 104, 104a, 104b is ruthenium. That is, the metal silicate layer(s) 104, 104a, 104b may comprise ruthenium silicate (RuxSiyOz).
It is expected that there may be other metal silicates that may be stable within the environment of an EUV lithographic apparatus LA. Therefore, in other embodiments, the metal of the metal silicate layer(s) 104, 104a, 104b may be any metal whose metal silicate is stable within the environment of an EUV lithographic apparatus LA. It will be appreciated that a metal silicate layer being stable is intended to mean the metal silicate layer is not susceptible to oxidation, not susceptible to thermal de-wetting and not susceptible to plasma etching. It will be further appreciated that within the environment of an EUV lithographic apparatus LA the membrane 100, 100a may typically cycle through a range of temperatures of around 20-600° C. Within the lithographic apparatus LA the hydrogen plasma may have energies in the range 1-30 eV. Typical hydrogen ion energies encountered within the lithographic apparatus LA may be, for example, ion energies of up to ˜ 50 eV (for example 1-30 eV).
In some embodiments, a thickness of the or each metal silicate layer 104, 104a, 104b is less than or equal to 10 nm. In some embodiments, a thickness of the or each metal silicate layer 104, 104a, 104b is less than or equal to 5 nm. In some embodiments, the thickness of the metal silicate layer(s) 104, 104a, 104b may be less than or equal to around 4.5 nm. In some embodiments, the thickness of the metal silicate layer(s) 104, 104a, 104b may be less than or equal to around 3.5 nm.
In some embodiments, an EUV transmissivity of the or each metal silicate layer 104, 104a, 104b is 96% or more. In some embodiments, an EUV transmissivity of the or each metal silicate layer 104, 104a, 104b is 97% or more. In some embodiments, an EUV transmissivity of the or each metal silicate layer 104, 104a, 104b is 98% or more. In some embodiments, an EUV transmissivity of the or each metal silicate layer 104, 104a, 104b is 99% or more.
The membranes 200, 200a may form part of a pellicle 19 of the type shown in
As previously discussed, designing a membrane that is stable in the environment within the lithographic apparatus LA is challenging for several reasons. The membranes 200, 200a shown schematically in
The yttrium silicate layer(s) 204, 204a, 204b may be generally of the form of YxSiyOz. Advantageously, it has been found that an yttrium silicate layer is suitable for use as a protective layer for other parts of the pellicle 19. In particular, in conditions experienced in use within an EUV lithographic apparatus LA, such an yttrium silicate layer 204, 204a, 204b has been found to be stable, even for thicknesses of the order of 5 nm or less (such thicknesses advantageously reduce the absorption of EUV radiation by a pellicle 19 to an acceptable level). In particular, it has been found that at elevated temperatures yttrium silicate layer(s) 204, 204a, 204b on a membrane 200, 200a are not susceptible to oxidation, not susceptible to thermal de-wetting, not susceptible to etching in the presence of hydrogen radicals, hydrogen ions (with energies of the order of up to ˜50 eV) and hydrogen plasma with energies in the range 1-30 eV, even with thicknesses smaller than 5 nm.
In some embodiments, a thickness of the or each yttrium silicate layer 204, 204a, 204b is less than or equal to 10 nm. In some embodiments, a thickness of the or each yttrium silicate layer 204, 204a, 204b is less than or equal to 5 nm. In some embodiments, the thickness of the yttrium silicate layer(s) 204, 204a, 204b may be less than or equal to around 4.5 nm. In some embodiments, the thickness of the yttrium silicate layer(s) 204, 204a, 204b may be less than or equal to around 3.5 nm.
In some embodiments, an EUV transmissivity of the or each yttrium silicate layer 204, 204a, 204b is 96% or more. In some embodiments, an EUV transmissivity of the or each yttrium silicate layer 204, 204a, 204b is 97% or more. In some embodiments, an EUV transmissivity of the or each yttrium silicate layer 204, 204a, 204b is 98% or more. In some embodiments, an EUV transmissivity of the or each yttrium silicate layer 204, 204a, 204b is 99% or more.
The core substrate 102, 202 of the membranes 100, 100a, 200, 200a may comprise a silicon-based substrate. The silicon based substrate may, for example, comprise silicon and/or silicon nitride (SiNx).
In some embodiments, the core substrate 102, 202 of the membrane 100, 100a, 200, 200a may comprise a metallic layer. Such a metal layer can act as an emissivity layer, improving removal of the EUV heat load from the membrane 100, 100a, 200, 200a.
The membrane 100, 100a, 200, 200a may further comprise a seed layer disposed between the silicon-based substrate and the metallic layer of the core substrate 102, 202.
A pellicle 19 of the type shown in
A pellicle 19 comprising a novel membrane 100, 100a, 200, 200a of the type shown above may form part of a patterning device and pellicle assembly 15 also comprising a patterning device MA, the pellicle 19 being releasably engaged with said patterning device MA.
First, the method 300 comprises a step 302 of providing a silicon-based substrate. The silicon-based substrate may comprise an outer layer of a silicon oxide or a silicon oxynitride. The silicon-based substrate may further comprise a silicon substrate. The silicon substrate may, for example, comprise a polycrystalline silicon substrate.
Next, the method 300 comprises a step 304 of applying a metal or metal oxide layer (MeOx) on the silicon-based substrate to form an intermediate membrane. The thickness of the metal or metal oxide layer applied in step 304 may be less than 5 nm. For example, the thickness of the metal or metal oxide layer applied in step 304 may be less than 4 nm. For example, the thickness of the metal or metal oxide layer applied in step 304 may be less than 3 nm. For example, the thickness of the metal or metal oxide layer applied in step 304 may be less than 2 nm. For example, the thickness of the metal or metal oxide layer applied in step 304 may be less than 1 nm. For example, the thickness of the metal or metal oxide layer applied in step 304 may be less than 0.5 nm. The silicon-based substrate may comprise a barrier layer (such as SiO2) which may have substantially the same thickness as the thickness of the metal or metal oxide layer applied in step 304.
Finally, the method 300 comprises a step 306 of annealing the intermediate membrane to form the metal silicate layer from the silicon-based substrate and the metal or metal oxide layer. As a result of this annealing of the intermediate membrane the metal or metal oxide layer may react partially or fully with the silicon-based substrate so as to form the metal silicate layer.
The annealing of the intermediate membrane may comprise elevating a temperature of the intermediate membrane to at least 700° C. for an annealing time period. In some embodiments, annealing the intermediate membrane may comprise elevating a temperature of the intermediate membrane to at least 800° C. for the time annealing period. In some embodiments, annealing the intermediate membrane may comprise elevating a temperature of the intermediate membrane to at least 900° C. for the time annealing period.
It will be appreciated that the annealing time period may be sufficiently long to form the metal silicate layer from the silicon-based substrate and the metal or metal oxide layer. Therefore, the annealing time period may be selected based on the materials (for example the metal used and the type of silicon-based substrate), the thickness of the metal or metal oxide layer and/or a desired target thickness of the metal silicate layer. For a metal silicate layer with a thickness of less than 10 nm (for example less than 5 nm) a relatively short annealing time may be sufficient. In some embodiments, the annealing time period is sufficiently long to ensure that substantially all of the metal or metal oxide layer is converted into the metal silicate layer. In some embodiments, the annealing time period may be longer than necessary, for example, to ensure that substantially all of the metal or metal oxide layer is converted into the metal silicate layer. For example, in some embodiments, the annealing time period may be at least 1 hour. In some embodiments, the annealing time period may be at least 2 hours.
Annealing the intermediate membrane may occur in the presence of nitrogen gas at a pressure of 1 bar. In other embodiments, annealing of the intermediate membrane may occur in vacuum. In some other embodiments, annealing of the intermediate membrane may occur in-situ (for example in a lithographic apparatus LA). Such in-situ annealing may be achieved by exposure of the membrane to EUV radiation with the lithographic apparatus LA.
The first and second steps 302, 304 of the method shown in
The output of the third step 306 of the method shown in
As shown in
As shown in
The method 300 shown in
As a combined result of the deposition of the materials onto a silicon containing under layer (SiNx) with a subsequent thermal anneal treatment, the metal oxide films formed a metal silicate layer. This has been confirmed using x-ray photoelectron spectroscopy (XPS) when the thickness of the metal oxide was of the order of 5 nm or less.
After formation of an yttrium silicate layer, the resultant membrane 100, 100a, 200, 200a was subject to the following conditions: (i) exposure to thermal hydrogen radicals with a flux of 1021/cm2 at a temperature of 700° C.; (ii) exposure to 50 eV hydrogen ions with a flux of 1019/cm2 at a temperature of 650° C.; or (iii) exposure to ˜8 eV hydrogen plasma with an ion flux of 1019/cm2 at a temperature of 550° C. It was found that the yttrium silicate was stable under these conditions (for example based on XPS analysis). Furthermore, it was found that the hydrogen plasma etching rate of the underlying SiNx substrate was reduced from 0.15 nm/min to 0.0 nm/min.
The EUV absorption (extinction) coefficient of Y2Si1O5 is 0.0114 nm−1. Therefore, the material has an EUV transmission of 90% at a thickness of about 9 nm. If the material at this thickness meets pellicle specifications then it may serve as pellicle core material.
However, in some embodiments, the yttrium silicate is provided as a capping layer, in which case less material is required. A capping layer of Y2Si1O5 having a thickness of 2.5 nm applied as protective layer on each side of a pellicle core has an EUV transmission of 94.5%. Thus when applied on a pellicle core of 95.3% this results in a total EUV transmission of 90%.
As an alternative to the method 300 shown in
References to a mask or reticle in this document may be interpreted as references to a patterning device (a mask or reticle is an example of a patterning device) and the terms may be used interchangeably. In particular, the term mask assembly is synonymous with reticle assembly and patterning device assembly.
Although specific reference may be made in this text to embodiments of the invention in the context of a lithographic apparatus, embodiments of the invention may be used in other apparatus. Embodiments of the invention may form part of a mask inspection apparatus, a metrology apparatus, or any apparatus that measures or processes an object such as a wafer (or other substrate) or mask (or other patterning device). These apparatus may be generally referred to as lithographic tools. Such a lithographic tool may use vacuum conditions or ambient (non-vacuum) conditions.
The term “EUV radiation” may be considered to encompass electromagnetic radiation having a wavelength within the range of 4-20 nm, for example within the range of 13-14 nm. EUV radiation may have a wavelength of less than 10 nm, for example within the range of 4-10 nm such as 6.7 nm or 6.8 nm.
Although specific reference may be made in this text to the use of lithographic apparatus in the manufacture of ICs, it should be understood that the lithographic apparatus described herein may have other applications. Possible other applications include the manufacture of integrated optical systems, guidance and detection patterns for magnetic domain memories, flat-panel displays, liquid-crystal displays (LCDs), thin-film magnetic heads, etc.
While specific embodiments of the invention have been described above, it will be appreciated that the invention may be practiced otherwise than as described. The descriptions above are intended to be illustrative, not limiting. Thus it will be apparent to one skilled in the art that modifications may be made to the invention as described without departing from the scope of the claims set out below.
| Number | Date | Country | Kind |
|---|---|---|---|
| 22158569.8 | Feb 2022 | EP | regional |
| Filing Document | Filing Date | Country | Kind |
|---|---|---|---|
| PCT/EP2023/050495 | 1/10/2023 | WO |
