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G03F1/64

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/64characterised by the frames

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Pellicle frame and pellicle
- Patent number 12,306,532
- Issue date May 20, 2025
- Shin-Etsu Chemical Co., Ltd.
- Yu Yanase
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Adhesive composition, method for preparing the same, reticle assemb...
- Patent number 12,297,379
- Issue date May 13, 2025
- Samsung Electronics Co., Ltd.
- Mun Ja Kim
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Pellicle for flat panel display photomask
- Patent number 12,282,257
- Issue date Apr 22, 2025
- Photronics, Inc.
- Bryan S. Kasprowicz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for positioning and clamped curing
- Patent number 12,271,108
- Issue date Apr 8, 2025
- ASML Netherlands B.V.
- Martin Dieter Nico Peters
- B65 - CONVEYING PACKING STORING HANDLING THIN OR FILAMENTARY MATERIAL
Information Patent Grant
Pellicle demounting method, and pellicle demounting device
- Patent number 12,271,109
- Issue date Apr 8, 2025
- Mitsui Chemicals, Inc.
- Akira Ishikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask pellicle including network of nanowires and method of for...
- Patent number 12,266,525
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Company Ltd.
- Yun-Yue Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pellicle for an EUV lithography mask and a method of manufacturing...
- Patent number 12,265,323
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tzu-Ang Chao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Agglutinant for pellicle, pellicle, exposure original plate with pe...
- Patent number 12,265,324
- Issue date Apr 1, 2025
- Shin-Etsu Chemical Co., Ltd.
- Yuichi Hamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photomask protection device, photomask protection system, and use m...
- Patent number 12,259,648
- Issue date Mar 25, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Fei Sun
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Adhesive for pellicle, pellicle for photo mask and method for manuf...
- Patent number 12,258,494
- Issue date Mar 25, 2025
- Samsung Electronics Co., Ltd.
- Mun Ja Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cleaning method for photo masks and apparatus therefor
- Patent number 12,259,649
- Issue date Mar 25, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsin-Chang Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle design for mask application
- Patent number 12,253,797
- Issue date Mar 18, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multilayer graphene direct growth method and method for manufacturi...
- Patent number 12,248,243
- Issue date Mar 11, 2025
- Korea Electronics Technology Institute
- Hyeong Keun Kim
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Pellicle removal tool
- Patent number 12,249,528
- Issue date Mar 11, 2025
- Photronics, Inc.
- Hilario Ar-Miguel Alvarez
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask assembly and method of forming the same
- Patent number 12,242,181
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kuo-Hao Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for removing particles from pellicle and photomask
- Patent number 12,242,182
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Company Ltd.
- Tzu Han Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle for an EUV lithography mask and a method of manufacturing...
- Patent number 12,174,526
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tzu-Ang Chao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle
- Patent number 12,164,224
- Issue date Dec 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Yu Yanase
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle frame, pellicle, and method for peeling pellicle
- Patent number 12,164,222
- Issue date Dec 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Yu Yanase
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle frame and pellicle
- Patent number 12,164,223
- Issue date Dec 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Yu Yanase
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle frame, pellicle, and method for peeling pellicle
- Patent number 12,158,696
- Issue date Dec 3, 2024
- Shin-Etsu Chemical Co., Ltd.
- Yu Yanase
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle frame and pellicle
- Patent number 12,158,697
- Issue date Dec 3, 2024
- Shin-Etsu Chemical Co., Ltd.
- Yu Yanase
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Network type pellicle membrane and method for forming the same
- Patent number 12,153,339
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Pei-Cheng Hsu
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Pellicle frame and pellicle
- Patent number 12,153,340
- Issue date Nov 26, 2024
- Shin-Etsu Chemical Co., Ltd.
- Yu Yanase
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle frame with stress relief trenches
- Patent number 12,130,551
- Issue date Oct 29, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kuo-Hao Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle frame, pellicle, and method of producing pellicle frame
- Patent number 12,130,550
- Issue date Oct 29, 2024
- Shin-Etsu Chemical Co., Ltd.
- Yuichi Hamada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask defect prevention
- Patent number 12,124,163
- Issue date Oct 22, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chi-Ta Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle and pellicle assembly
- Patent number 12,117,726
- Issue date Oct 15, 2024
- ASML Netherlands B.V.
- David Ferdinand Vles
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ultra-thin, ultra-low density films for EUV lithography
- Patent number 12,085,844
- Issue date Sep 10, 2024
- LINTEC OF AMERICA, INC.
- Marcio D. Lima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle
- Patent number 12,085,847
- Issue date Sep 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Yu Yanase
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PELLICLE FOR FLAT PANEL DISPLAY PHOTOMASK
- Publication number 20250199410
- Publication date Jun 19, 2025
- PHOTRONICS, INC.
- Bryan S. Kasprowicz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE REMOVAL TOOL
- Publication number 20250191952
- Publication date Jun 12, 2025
- PHOTRONICS, INC.
- Hilario Ar-Miguel Alvarez
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK ASSEMBLY
- Publication number 20250189883
- Publication date Jun 12, 2025
- SAMSUNG DISPLAY CO., LTD.
- WONYOUNG JANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING...
- Publication number 20250189882
- Publication date Jun 12, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tzu-Ang CHAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CLEANING METHOD FOR PHOTO MASKS AND APPARATUS THEREFOR
- Publication number 20250180983
- Publication date Jun 5, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsin-Chang LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL MEMBER AND PRODUCTION METHOD THEREFOR
- Publication number 20250155796
- Publication date May 15, 2025
- NIPPON LIGHT METAL COMPANY, LTD.
- Takeshi OSHIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLES AND MEMBRANES FOR USE IN A LITHOGRAPHIC APPARATUS
- Publication number 20250147440
- Publication date May 8, 2025
- ASML NETHERLANDS B.V.
- Zomer Silvester HOUWELING
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV MASK AND PELLICLE ASSEMBLY
- Publication number 20250102903
- Publication date Mar 27, 2025
- Intel Corporation
- Yongbae Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE, EXPOSURE ORIGINAL PLATE, EXPOSURE APPARATUS, METHOD FOR P...
- Publication number 20250085624
- Publication date Mar 13, 2025
- MITSUI CHEMICALS, INC.
- Ryo TANAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE
- Publication number 20250068055
- Publication date Feb 27, 2025
- Shin-Etsu Chemical Co., Ltd.
- Yu YANASE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING...
- Publication number 20250060663
- Publication date Feb 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tzu-Ang CHAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FRAME AND PELLICLE
- Publication number 20250053078
- Publication date Feb 13, 2025
- Shin-Etsu Chemical Co., Ltd.
- Yu YANASE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE ASSEMBLY, RETICLE ASSEMBLY, RETICLE CASE, PELLICLE MEASURE...
- Publication number 20250013143
- Publication date Jan 9, 2025
- Samsung Electronics Co., Ltd.
- Yunhan LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV-TRANSMISSIVE FILM PRODUCTION METHOD AND PELLICLE
- Publication number 20250004364
- Publication date Jan 2, 2025
- NGK Insulators, Ltd.
- Toshikatsu KASHIWAYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ZIRCONIUM-COATED ULTRA-THIN, ULTRA-LOW DENSITY FILMS FOR EUV LITHOG...
- Publication number 20250004363
- Publication date Jan 2, 2025
- LINTEC OF AMERICA, INC.
- Marcio D. LIMA
- B82 - NANO-TECHNOLOGY
Information Patent Application
ULTRA-THIN, ULTRA-LOW DENSITY FILMS FOR EUV LITHOGRAPHY
- Publication number 20240419062
- Publication date Dec 19, 2024
- LINTEC OF AMERICA, INC.
- Marcio D. LIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY SYSTEM AND METHODS
- Publication number 20240402623
- Publication date Dec 5, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chen-Pin CHENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVICE AND METHOD FOR CLEANING PELLICLE FRAME AND MEMBRANE
- Publication number 20240393679
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kun-Lung Hsieh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK DEFECT PREVENTION
- Publication number 20240385507
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chi-Ta Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY SYSTEM AND METHODS
- Publication number 20240385509
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chi YANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE, EXPOSURE ORIGINAL PLATE, EXPOSURE APPARATUS, METHOD OF MA...
- Publication number 20240385510
- Publication date Nov 21, 2024
- Mitsui Chemicals, Inc.
- Yousuke ONO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE
- Publication number 20240377725
- Publication date Nov 14, 2024
- MITSUI CHEMICALS, INC.
- Ken ITO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE, EXPOSURE ORIGINAL PLATE, EXPOSURE DEVICE AND PELLICLE PRO...
- Publication number 20240377726
- Publication date Nov 14, 2024
- MITSUI CHEMICALS, INC.
- Takashi UNEZAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING A MEMBRANE ASSEMBLY
- Publication number 20240369920
- Publication date Nov 7, 2024
- ASML NETHERLANDS B.V.
- Pieter-Jan VAN ZWOL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE PELLICLE CAPABLE OF ADJUSTING ATMOSPHERIC PRESSURE AT HIGH...
- Publication number 20240353750
- Publication date Oct 24, 2024
- Shin-Etsu Chemical Co., Ltd.
- Yoshihiro KUBOTA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE ASSEMBLY AND METHOD OF MAKING SAME
- Publication number 20240345472
- Publication date Oct 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsin-Chang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PELLICLE AND METHOD OF MANUFACTURING THEREOF
- Publication number 20240345471
- Publication date Oct 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pei-Cheng HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET PELLICLE STORAGE AND METHOD OF PRESERVING EXTRE...
- Publication number 20240337922
- Publication date Oct 10, 2024
- LINTEC OF AMERICA, INC.
- Marcio D. LIMA
- B65 - CONVEYING PACKING STORING HANDLING THIN OR FILAMENTARY MATERIAL
Information Patent Application
PELLICLE FOR EXPOSURE CAPABLE OF EASY ADJUSTMENT OF ATMOSPHERIC PRE...
- Publication number 20240337921
- Publication date Oct 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Yoshihiro KUBOTA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE HAVING VENT HOLE
- Publication number 20240329517
- Publication date Oct 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chue San YOO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

characterised by the frames

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Pellicle frame and pellicle

Adhesive composition, method for preparing the same, reticle assemb...

Pellicle for flat panel display photomask

Apparatus for positioning and clamped curing

Pellicle demounting method, and pellicle demounting device

Photomask pellicle including network of nanowires and method of for...

Pellicle for an EUV lithography mask and a method of manufacturing...

Agglutinant for pellicle, pellicle, exposure original plate with pe...

Photomask protection device, photomask protection system, and use m...

Adhesive for pellicle, pellicle for photo mask and method for manuf...

Cleaning method for photo masks and apparatus therefor

Pellicle design for mask application

Multilayer graphene direct growth method and method for manufacturi...

Pellicle removal tool

Photomask assembly and method of forming the same

Method for removing particles from pellicle and photomask

Pellicle for an EUV lithography mask and a method of manufacturing...

Pellicle

Pellicle frame, pellicle, and method for peeling pellicle

Pellicle frame and pellicle

Pellicle frame, pellicle, and method for peeling pellicle

Pellicle frame and pellicle

Network type pellicle membrane and method for forming the same

Pellicle frame and pellicle

Pellicle frame with stress relief trenches

Pellicle frame, pellicle, and method of producing pellicle frame

Mask defect prevention

Pellicle and pellicle assembly

Ultra-thin, ultra-low density films for EUV lithography

Pellicle

Patents Applicationslast 30 patents

PELLICLE FOR FLAT PANEL DISPLAY PHOTOMASK

PELLICLE REMOVAL TOOL

MASK ASSEMBLY

PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING...

CLEANING METHOD FOR PHOTO MASKS AND APPARATUS THEREFOR

OPTICAL MEMBER AND PRODUCTION METHOD THEREFOR

PELLICLES AND MEMBRANES FOR USE IN A LITHOGRAPHIC APPARATUS

EUV MASK AND PELLICLE ASSEMBLY

PELLICLE, EXPOSURE ORIGINAL PLATE, EXPOSURE APPARATUS, METHOD FOR P...

PELLICLE

PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING...

PELLICLE FRAME AND PELLICLE

PELLICLE ASSEMBLY, RETICLE ASSEMBLY, RETICLE CASE, PELLICLE MEASURE...

EUV-TRANSMISSIVE FILM PRODUCTION METHOD AND PELLICLE

ZIRCONIUM-COATED ULTRA-THIN, ULTRA-LOW DENSITY FILMS FOR EUV LITHOG...

ULTRA-THIN, ULTRA-LOW DENSITY FILMS FOR EUV LITHOGRAPHY

LITHOGRAPHY SYSTEM AND METHODS

DEVICE AND METHOD FOR CLEANING PELLICLE FRAME AND MEMBRANE

MASK DEFECT PREVENTION

LITHOGRAPHY SYSTEM AND METHODS

PELLICLE, EXPOSURE ORIGINAL PLATE, EXPOSURE APPARATUS, METHOD OF MA...

PELLICLE

PELLICLE, EXPOSURE ORIGINAL PLATE, EXPOSURE DEVICE AND PELLICLE PRO...

METHOD OF MANUFACTURING A MEMBRANE ASSEMBLY

EXPOSURE PELLICLE CAPABLE OF ADJUSTING ATMOSPHERIC PRESSURE AT HIGH...

PELLICLE ASSEMBLY AND METHOD OF MAKING SAME

PELLICLE AND METHOD OF MANUFACTURING THEREOF

EXTREME ULTRAVIOLET PELLICLE STORAGE AND METHOD OF PRESERVING EXTRE...

PELLICLE FOR EXPOSURE CAPABLE OF EASY ADJUSTMENT OF ATMOSPHERIC PRE...

PELLICLE HAVING VENT HOLE