Optical system protection

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CPC
G03F7/70983

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70983Optical system protection

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Agglutinant for pellicle, pellicle, exposure original plate with pe...
- Patent number 12,265,324
- Issue date Apr 1, 2025
- Shin-Etsu Chemical Co., Ltd.
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pellicle removal tool
- Patent number 12,249,528
- Issue date Mar 11, 2025
- Photronics, Inc.
- Hilario Ar-Miguel Alvarez
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multilayer graphene direct growth method and method for manufacturi...
- Patent number 12,248,243
- Issue date Mar 11, 2025
- Korea Electronics Technology Institute
- Hyeong Keun Kim
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Method for removing particles from pellicle and photomask
- Patent number 12,242,182
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Company Ltd.
- Tzu Han Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask and reticle protection with atomic layer deposition (ALD)
- Patent number 12,197,125
- Issue date Jan 14, 2025
- Nano-Master, Inc.
- Birol Kuyel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning a structure surface in an EUV chamber
- Patent number 12,189,313
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- Chunguang Xia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Network type pellicle membrane and method for forming the same
- Patent number 12,153,339
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Pei-Cheng Hsu
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Pellicle frame with stress relief trenches
- Patent number 12,130,551
- Issue date Oct 29, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kuo-Hao Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle for an EUV lithography mask and a method of manufacturing...
- Patent number 12,117,725
- Issue date Oct 15, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ultra-thin, ultra-low density films for EUV lithography
- Patent number 12,085,844
- Issue date Sep 10, 2024
- LINTEC OF AMERICA, INC.
- Marcio D. Lima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle and pellicle assembly
- Patent number 12,066,758
- Issue date Aug 20, 2024
- ASML Netherlands B.V.
- David Ferdinand Vles
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet lithography method using robust, high transmiss...
- Patent number 12,055,855
- Issue date Aug 6, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle for EUV lithography
- Patent number 11,977,326
- Issue date May 7, 2024
- ASML Netherlands B.V.
- Dennis De Graaf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing a membrane assembly
- Patent number 11,971,656
- Issue date Apr 30, 2024
- ASML Netherlands B.V.
- Johan Hendrik Klootwijk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle removal tool
- Patent number 11,948,824
- Issue date Apr 2, 2024
- Photronics, Inc.
- Hilario Ar-Miguel Alvarez
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Simultaneous double-side coating of multilayer graphene pellicle by...
- Patent number 11,947,256
- Issue date Apr 2, 2024
- ASML Netherlands B.V.
- Evgenia Kurganova
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Mask protective module, pellicle having the same, and lithography a...
- Patent number 11,940,726
- Issue date Mar 26, 2024
- Industry-University Cooperation Foundation Hanyang University
- Jinho Ahn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for determining a condition associated with a...
- Patent number 11,906,907
- Issue date Feb 20, 2024
- ASML Netherlands B.V.
- Derk Servatius Gertruda Brouns
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stud attachment device and stud attachment method with independent...
- Patent number 11,892,767
- Issue date Feb 6, 2024
- Samsung Electronics Co., Ltd.
- Byungchul Yoo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle, exposure master, exposure device and method for manufactu...
- Patent number 11,852,968
- Issue date Dec 26, 2023
- Mitsui Chemicals, Inc.
- Yosuke Ono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for removing particles from pellicle and photomask
- Patent number 11,822,231
- Issue date Nov 21, 2023
- Taiwan Semiconductor Manufacturing Company Ltd.
- Tzu Han Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet light source device
- Patent number 11,774,856
- Issue date Oct 3, 2023
- USHIO DENKI KABUSHIKI KAISHA
- Hajime Kikuiri
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Membrane for EUV lithography
- Patent number 11,762,281
- Issue date Sep 19, 2023
- ASML Netherlands B.V.
- Maxim Aleksandrovich Nasalevich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ultra-thin, ultra-low density films for EUV lithography
- Patent number 11,740,548
- Issue date Aug 29, 2023
- LINTEC OF AMERICA, INC.
- Marcio D. Lima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle frame with stress relief trenches
- Patent number 11,726,401
- Issue date Aug 15, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kuo-Hao Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for removing a pellicle frame from a photomask and the me...
- Patent number 11,714,348
- Issue date Aug 1, 2023
- Taiwan Semiconductor Manufacturing Company Ltd.
- Wei Cheng Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of accelerated hazing of mask assembly
- Patent number 11,703,752
- Issue date Jul 18, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wu-Hung Ko
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for in-situ dynamic protection of a surface and optical asse...
- Patent number 11,681,236
- Issue date Jun 20, 2023
- Carl Zeiss SMT GmbH
- Vitaliy Shklover
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle removal tool
- Patent number 11,682,573
- Issue date Jun 20, 2023
- Photronics, Inc.
- Hilario Ar-Miguel Alvarez
- B32 - LAYERED PRODUCTS
Information Patent Grant
EUV pellicle with structured ventilation frame
- Patent number 11,662,661
- Issue date May 30, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
ASSEMBLY FOR A LITHOGRAPHIC APPARATUS
- Publication number 20250102902
- Publication date Mar 27, 2025
- ASML NETHERLANDS B.V.
- Tim Willem Johan VAN DE GOOR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE, EXPOSURE MASTER, EXPOSURE DEVICE, PELLICLE PRODUCTION MET...
- Publication number 20250093767
- Publication date Mar 20, 2025
- MITSUI CHEMICALS, INC.
- Yutaka YOSHIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CLEANING A STRUCTURE SURFACE IN AN EUV CHAMBER
- Publication number 20250085643
- Publication date Mar 13, 2025
- ASML NETHERLANDS B.V.
- Chunguang Xia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Mask and Reticle Protection with Atomic Layer Deposition (ALD)
- Publication number 20250068054
- Publication date Feb 27, 2025
- Nano-Master, Inc.
- Birol Kuyel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLES AND MEMBRANES FOR USE IN A LITHOGRAPHIC APPARATUS
- Publication number 20250013142
- Publication date Jan 9, 2025
- ASML NETHERLANDS B.V.
- Zomer Silvester HOUWELING
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CONTROLLING ELECTROSTATIC CHARGE ON MASKS FOR EXTREME ULTRAVIOLET L...
- Publication number 20250004387
- Publication date Jan 2, 2025
- Intel Corporation
- Yongbae Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ULTRA-THIN, ULTRA-LOW DENSITY FILMS FOR EUV LITHOGRAPHY
- Publication number 20240419062
- Publication date Dec 19, 2024
- LINTEC OF AMERICA, INC.
- Marcio D. LIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY SYSTEM AND METHODS
- Publication number 20240419082
- Publication date Dec 19, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ming-Hsin CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND ASSOCIATED METHODS
- Publication number 20240411233
- Publication date Dec 12, 2024
- ASML NETHERLANDS B.V.
- Gosse Charles DE VRIES
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY SYSTEM AND METHODS
- Publication number 20240402623
- Publication date Dec 5, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chen-Pin CHENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY SYSTEM AND METHODS
- Publication number 20240385509
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chi YANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE, PELLICLE REMOVAL TOOL, AND METHOD OF UTILIZING PELLICLE A...
- Publication number 20240385544
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- H.J. CHANG
- B32 - LAYERED PRODUCTS
Information Patent Application
PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING...
- Publication number 20240377724
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yun-Yue LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM OF REMOVING PARTICLES FROM PELLICLE
- Publication number 20240353767
- Publication date Oct 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng-Kang HU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASUREMENT APPARATUS AND METHOD FOR INSPECTING PHOTOMASKS INTENDED...
- Publication number 20240353757
- Publication date Oct 24, 2024
- Christian Roedel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASURING DEVICE AND METHOD FOR INSPECTING PHOTOMASKS INTENDED FOR...
- Publication number 20240353768
- Publication date Oct 24, 2024
- Carl Zeiss SMT GMBH
- Lutz Brekerbohm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RETICLE OF PROTECTING FROM PARTICLE ATTACKS
- Publication number 20240353763
- Publication date Oct 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yao-Tang LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FOR EUV LITHOGRAPHY
- Publication number 20240302736
- Publication date Sep 12, 2024
- ASML NETHERLANDS B.V.
- Dennis DE GRAAF
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LASER LITHOGRAPHY DEVICE AND METHOD FOR PRODUCING A THREE-DIMENSION...
- Publication number 20240288786
- Publication date Aug 29, 2024
- Nanoscribe Holding GmbH
- Marc Hippler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM, LITHOGRAPHY APPARATUS AND METHOD
- Publication number 20240288777
- Publication date Aug 29, 2024
- Carl Zeiss SMT GMBH
- Stefan Krone
- G02 - OPTICS
Information Patent Application
PELLICLE REMOVAL TOOL
- Publication number 20240242996
- Publication date Jul 18, 2024
- PHOTRONICS, INC.
- Hilario Ar-Miguel Alvarez
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL ELEMENT WITH COOLING CHANNELS, AND OPTICAL ARRANGEMENT
- Publication number 20240219849
- Publication date Jul 4, 2024
- Carl Zeiss SMT GMBH
- Eric EVA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM AND PROJECTION EXPOSURE APPARATUS
- Publication number 20240184212
- Publication date Jun 6, 2024
- Carl Zeiss SMT GMBH
- Boaz Pnini
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE MEMBRANE FOR A LITHOGRAPHIC APPARATUS AND METHOD
- Publication number 20240116760
- Publication date Apr 11, 2024
- Paul Alexander VERMEULEN
- B82 - NANO-TECHNOLOGY
Information Patent Application
APPARATUS AND METHOD FOR DETERMINING A CONDITION ASSOCIATED WITH A...
- Publication number 20240103386
- Publication date Mar 28, 2024
- ASML NETHERLANDS B.V.
- Derk Servatius Gertruda BROUNS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RETICLE COVERING PELLICLE FOR PHOTOLITHOGRPHY SCANNER
- Publication number 20240045323
- Publication date Feb 8, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
- Yen-Hao Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR REMOVING PARTICLES FROM PELLICLE AND PHOTOMASK
- Publication number 20240036463
- Publication date Feb 1, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- TZU HAN LIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HIGH-PERFORMANCE EUV MICROSCOPE WITH FREE FORM ILLUMINATION SYSTEM
- Publication number 20240011922
- Publication date Jan 11, 2024
- ESOL, Inc.
- Dong Gun LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEMBRANE FOR EUV LITHOGRAPHY
- Publication number 20240004283
- Publication date Jan 4, 2024
- ASML NETHERLANDS B.V.
- Maxim Aleksandrovich Nasalevich
- G02 - OPTICS
Information Patent Application
OPTICAL ASSEMBLY WITH COATING AND METHODS OF USE
- Publication number 20230408906
- Publication date Dec 21, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Pei-Cheng Hsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Optical system protection

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Agglutinant for pellicle, pellicle, exposure original plate with pe...

Pellicle removal tool

Multilayer graphene direct growth method and method for manufacturi...

Method for removing particles from pellicle and photomask

Mask and reticle protection with atomic layer deposition (ALD)

Cleaning a structure surface in an EUV chamber

Network type pellicle membrane and method for forming the same

Pellicle frame with stress relief trenches

Pellicle for an EUV lithography mask and a method of manufacturing...

Ultra-thin, ultra-low density films for EUV lithography

Pellicle and pellicle assembly

Extreme ultraviolet lithography method using robust, high transmiss...

Pellicle for EUV lithography

Method for manufacturing a membrane assembly

Pellicle removal tool

Simultaneous double-side coating of multilayer graphene pellicle by...

Mask protective module, pellicle having the same, and lithography a...

Apparatus and method for determining a condition associated with a...

Stud attachment device and stud attachment method with independent...

Pellicle, exposure master, exposure device and method for manufactu...

Method for removing particles from pellicle and photomask

Extreme ultraviolet light source device

Membrane for EUV lithography

Ultra-thin, ultra-low density films for EUV lithography

Pellicle frame with stress relief trenches

Apparatus for removing a pellicle frame from a photomask and the me...

Method of accelerated hazing of mask assembly

Method for in-situ dynamic protection of a surface and optical asse...

Pellicle removal tool

EUV pellicle with structured ventilation frame

Patents Applicationslast 30 patents

ASSEMBLY FOR A LITHOGRAPHIC APPARATUS

PELLICLE, EXPOSURE MASTER, EXPOSURE DEVICE, PELLICLE PRODUCTION MET...

CLEANING A STRUCTURE SURFACE IN AN EUV CHAMBER

Mask and Reticle Protection with Atomic Layer Deposition (ALD)

PELLICLES AND MEMBRANES FOR USE IN A LITHOGRAPHIC APPARATUS

CONTROLLING ELECTROSTATIC CHARGE ON MASKS FOR EXTREME ULTRAVIOLET L...

ULTRA-THIN, ULTRA-LOW DENSITY FILMS FOR EUV LITHOGRAPHY

LITHOGRAPHY SYSTEM AND METHODS

LITHOGRAPHIC APPARATUS AND ASSOCIATED METHODS

LITHOGRAPHY SYSTEM AND METHODS

LITHOGRAPHY SYSTEM AND METHODS

PELLICLE, PELLICLE REMOVAL TOOL, AND METHOD OF UTILIZING PELLICLE A...

PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING...

METHOD AND SYSTEM OF REMOVING PARTICLES FROM PELLICLE

MEASUREMENT APPARATUS AND METHOD FOR INSPECTING PHOTOMASKS INTENDED...

MEASURING DEVICE AND METHOD FOR INSPECTING PHOTOMASKS INTENDED FOR...

RETICLE OF PROTECTING FROM PARTICLE ATTACKS

PELLICLE FOR EUV LITHOGRAPHY

LASER LITHOGRAPHY DEVICE AND METHOD FOR PRODUCING A THREE-DIMENSION...

OPTICAL SYSTEM, LITHOGRAPHY APPARATUS AND METHOD

PELLICLE REMOVAL TOOL

OPTICAL ELEMENT WITH COOLING CHANNELS, AND OPTICAL ARRANGEMENT

OPTICAL SYSTEM AND PROJECTION EXPOSURE APPARATUS

PELLICLE MEMBRANE FOR A LITHOGRAPHIC APPARATUS AND METHOD

APPARATUS AND METHOD FOR DETERMINING A CONDITION ASSOCIATED WITH A...

RETICLE COVERING PELLICLE FOR PHOTOLITHOGRPHY SCANNER

METHOD FOR REMOVING PARTICLES FROM PELLICLE AND PHOTOMASK

HIGH-PERFORMANCE EUV MICROSCOPE WITH FREE FORM ILLUMINATION SYSTEM

MEMBRANE FOR EUV LITHOGRAPHY

OPTICAL ASSEMBLY WITH COATING AND METHODS OF USE