Number | Name | Date | Kind |
---|---|---|---|
RE30186 | Rubner et al. | Jan 1980 | |
2965553 | Dixon et al. | Dec 1960 | |
3325450 | Holub | Jun 1967 | |
3553282 | Holub | Jan 1971 | |
3622321 | Smets et al. | Nov 1971 | |
3902902 | Kleeburg et al. | Sep 1975 | |
4030948 | Berger | Jun 1977 | |
4266005 | Nakamura et al. | May 1981 | |
4410612 | Goff et al. | Oct 1983 |
Number | Date | Country |
---|---|---|
0065352 | Nov 1982 | EPX |
Entry |
---|
W. S. DeForest, Photoresist, McGraw-Hill Book Company, 1975, New York, N.Y., pp. 89-109. |
T. F. Saunders et al., "Photosensitive Polyimide Coatings", IBM Technical Disclosure Bulletin, vol. 16, No. 2, Jul. 1973, pp. 601-602. |
R. Rubner et al., "Production of Highly Heat-Resistant Film Patterns from Photoreactive Polymeric Precursors, Part 2, Polyimide Film Patterns", Siemens Forschiu, Entwickl. Ber. Bd. 5, 1976, No. 4, pp. 235-239. |