H. Ito et al; "Applications of Photoinitiators to the Design of Resists for Semiconductor Manufacturing"; Polymers in Microelectronics; American Chemical Society (1984); pp. 11-23. |
K. Nakano et al.; "Positive Chemically Amplified Resist for ArF Excimer Laser Lithography . . . Terpolymer"; SPIE, vol. 2438; pp. 433-444. |
R.D. Allen et al.; "Single Layer Resists with Enhanced Etch Resistance for 193 nm Lithography"; Journal of Photopolymer Science and Technology, vol. 7, No. 3 (1994); pp. 507-516. |
T. Sakamizu et al.; "Acid-Catalyzed Reactions of Tetrahydropyranyl-Protected Polyvinylphenol in a Novolak-Resin-Based Positive Resist"; Jpn. J. Appl. Phys., vol. 31 (1992), pp. 4288-4293. |
O. Nalmasu et al.; Development of a Chemically Amplified Positive (CAMP) Resist Material for Single Layer Deep-UV Lithography; SPIE, vol. 1262 Advances in Resist Technology and Processing VII (1990), pp. 32-48. |
T. Ueno et al; "Chemical Amplification Positive Resist Systems Using Novel Sulfonates as Acid Generators"; Proceedings of PME'89 (1990), pp. 413-424. |
R. D. Allen, G. M. Wallraff, R. A. Depieto, D. C. Hofer, and R. R. Kunz; Journal of Photopolymer Science and Technology 7 (3), 507-516, 1994. |