Macromolecular compounds which are rendered insoluble or differentially wettable

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CPC
G03F7/038

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Resist composition and patterning process
- Patent number 12,169,360
- Issue date Dec 17, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 12,164,228
- Issue date Dec 10, 2024
- FUJIFILM Corporation
- Michihiro Ogawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified negative resist composition and resist pattern...
- Patent number 12,164,227
- Issue date Dec 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, method for forming resist pattern...
- Patent number 12,158,700
- Issue date Dec 3, 2024
- JSR Corporation
- Hirokazu Sakakibara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photocurable composition and method for producing semiconductor device
- Patent number 12,147,158
- Issue date Nov 19, 2024
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist composition and method of manufacturing a semiconductor...
- Patent number 12,134,690
- Issue date Nov 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yen-Hao Chen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resin, photoresist composition, and method of manufacturing semicon...
- Patent number 12,135,502
- Issue date Nov 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Siao-Shan Wang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Negative resist formulation for producing undercut pattern profiles
- Patent number 12,124,166
- Issue date Oct 22, 2024
- Merck Patent GmbH
- Anupama Mukherjee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Carboxylate, resist composition and method for producing resist pat...
- Patent number 12,124,167
- Issue date Oct 22, 2024
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 12,117,728
- Issue date Oct 15, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, method of forming resist pattern, compound, and...
- Patent number 12,111,574
- Issue date Oct 8, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya Ikeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Salt, quencher, resist composition and method for producing resist...
- Patent number 12,105,419
- Issue date Oct 1, 2024
- Sumitomo Chemical Company, Limited
- Katsuhiro Komuro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 12,099,298
- Issue date Sep 24, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist compositions and pattern formation methods
- Patent number 12,085,854
- Issue date Sep 10, 2024
- Rohm and Haas Electronic Materials LLC
- Cong Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, pattern forming method, cured fil...
- Patent number 12,078,929
- Issue date Sep 3, 2024
- FUJIFILM Corporation
- Toshihide Aoshima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 12,072,627
- Issue date Aug 27, 2024
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and pattern forming process
- Patent number 12,072,628
- Issue date Aug 27, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Water-developable photosensitive resin printing original plate
- Patent number 12,061,417
- Issue date Aug 13, 2024
- TOYOBO MC CORPORATION
- Toshiyuki Kita
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Onium salt, chemically amplified negative resist composition, and p...
- Patent number 12,060,317
- Issue date Aug 13, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Coating composition for photoresist underlayer
- Patent number 12,055,854
- Issue date Aug 6, 2024
- Rohm and Haas Electronic Materials Korea Ltd.
- Jin Hong Park
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photoresist with polar-acid-labile-group
- Patent number 12,050,404
- Issue date Jul 30, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic-ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 12,044,967
- Issue date Jul 23, 2024
- FUJIFILM Corporation
- Daisuke Asakawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
UV patternable polymer blends for organic thin-film transistors
- Patent number 12,048,236
- Issue date Jul 23, 2024
- Corning Incorporated
- Mingqian He
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for producing substrate with patterned film
- Patent number 12,038,691
- Issue date Jul 16, 2024
- Central Glass Company, Limited
- Yuzuru Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing substrate with patterned film and fluorine-con...
- Patent number 12,038,692
- Issue date Jul 16, 2024
- Central Glass Company, Limited
- Yuzuru Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for building an etching-free hybrid nonlinear waveguide comp...
- Patent number 12,038,687
- Issue date Jul 16, 2024
- SHANDONG NORMAL UNIVERSITY
- Chen Chen
- G02 - OPTICS
Information Patent Grant
Composition, light shielding film, solid-state imaging element, ima...
- Patent number 12,038,688
- Issue date Jul 16, 2024
- FUJIFILM Corporation
- Yoshinori Taguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning interconnects and other structures by photo-sensitizing...
- Patent number 12,033,890
- Issue date Jul 9, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wei-Jen Lo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polymer, chemically amplified resist composition and patterning pro...
- Patent number 12,032,289
- Issue date Jul 9, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of making a bonded assembly and a re-entrant structure, and...
- Patent number 12,025,913
- Issue date Jul 2, 2024
- The Board of Trustees of the University of Illinois
- Seok Kim
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20240419071
- Publication date Dec 19, 2024
- FUJIFILM CORPORATION
- Tsutomu YOSHIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER COMP...
- Publication number 20240411226
- Publication date Dec 12, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroki Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PREPARING PIXEL DEFINING LAYER
- Publication number 20240414954
- Publication date Dec 12, 2024
- DUK SAN NEOLUX CO., LTD.
- Hyunsang CHO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20240402601
- Publication date Dec 5, 2024
- FUJIFILM CORPORATION
- Minoru UEMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AN...
- Publication number 20240402604
- Publication date Dec 5, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Rin Odashima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD
- Publication number 20240393687
- Publication date Nov 28, 2024
- JSR Corporation
- Fuyuki EGAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE COMPOSITION, TRANSFER FILM, CURED FILM, SEMICONDUCTO...
- Publication number 20240395551
- Publication date Nov 28, 2024
- FUJIFILM CORPORATION
- Keigo YAMAGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, MULTIL...
- Publication number 20240393686
- Publication date Nov 28, 2024
- Resonac Corporation
- Hideyuki KATAGI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN
- Publication number 20240385520
- Publication date Nov 21, 2024
- JSR Corporation
- Ken MARUYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE COMPOSITION FOR FORMING INSULATION FILM, RESIN...
- Publication number 20240389227
- Publication date Nov 21, 2024
- JSR Corporation
- Ryouji TATARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR...
- Publication number 20240376303
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-hao CHEN
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, AND AC...
- Publication number 20240377734
- Publication date Nov 14, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya Uehara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PRO...
- Publication number 20240377737
- Publication date Nov 14, 2024
- Shin-Etsu Chemical Co., Ltd.
- Gentaro Hida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIN, PHOTORESIST COMPOSITION, AND METHOD OF MANUFACTURING SEMICON...
- Publication number 20240377739
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Siao-Shan WANG
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
BOTTOM ANTIREFLECTIVE COATING MATERIALS
- Publication number 20240377743
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chien-Chih Chen
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOTOSENSITIVE POLYCYCLIC-OLEFINIC POLYMERS AND DIAZIRINE COMPOSITI...
- Publication number 20240376339
- Publication date Nov 14, 2024
- PROMERUS, LLC
- PRAMOD KANDANARACHCHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20240377738
- Publication date Nov 14, 2024
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING...
- Publication number 20240377733
- Publication date Nov 14, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Application
LOCAL SHADOW MASKING FOR MULTI-COLOR EXPOSURES
- Publication number 20240377744
- Publication date Nov 14, 2024
- Geminatio, Inc.
- Brennan Peterson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CROSS-LINKABLE PHOTORESIST FOR EXTREME ULTRAVIOLET LITHOGRAPHY
- Publication number 20240369926
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Li-Po YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Optimizing Negative Tone Development Photoresist Model
- Publication number 20240369942
- Publication date Nov 7, 2024
- Dongfang Jingyuan Electron CO., LTD.
- Shijia GAO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR SELECTING PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR P...
- Publication number 20240361697
- Publication date Oct 31, 2024
- Resonac Corporation
- Yuki IMAZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Monomer, Resist Material, Resist Composition, And Patterning Process
- Publication number 20240360069
- Publication date Oct 31, 2024
- Shin-Etsu Chemical Co., Ltd.
- Yutaro OTOMO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ON-PRESS DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR, ME...
- Publication number 20240359500
- Publication date Oct 31, 2024
- FUJIFILM CORPORATION
- Yusuke NAMBA
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
PHOTOSENSITIVE COMPOSITION FOR PATTERN FORMATION, AND FLEXOGRAPHIC...
- Publication number 20240353754
- Publication date Oct 24, 2024
- ZEON CORPORATION
- Atsushi NOZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SILPHENYLENE-SKELETON-CONTAINING POLYMER, PHOTOSENSITIVE RESIN COMP...
- Publication number 20240345481
- Publication date Oct 17, 2024
- Shin-Etsu Chemical Co., Ltd.
- Hiroto Omori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING...
- Publication number 20240337924
- Publication date Oct 10, 2024
- Samsung SDI Co., Ltd.
- Junghwa LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20240337937
- Publication date Oct 10, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroki KATO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE POLYAMIC ACID AND DIAZIRINE COMPOSITIONS
- Publication number 20240336599
- Publication date Oct 10, 2024
- PROMERUS, LLC
- PRAMOD KANDANARACHCHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20240337935
- Publication date Oct 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Macromolecular compounds which are rendered insoluble or differentially wettable

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Resist composition and patterning process

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Chemically amplified negative resist composition and resist pattern...

Photosensitive resin composition, method for forming resist pattern...

Photocurable composition and method for producing semiconductor device

Photoresist composition and method of manufacturing a semiconductor...

Resin, photoresist composition, and method of manufacturing semicon...

Negative resist formulation for producing undercut pattern profiles

Carboxylate, resist composition and method for producing resist pat...

Resist composition and patterning process

Resist composition, method of forming resist pattern, compound, and...

Salt, quencher, resist composition and method for producing resist...

Resist composition and method of forming resist pattern

Photoresist compositions and pattern formation methods

Photosensitive resin composition, pattern forming method, cured fil...

Resist composition and patterning process

Resist composition and pattern forming process

Water-developable photosensitive resin printing original plate

Onium salt, chemically amplified negative resist composition, and p...

Coating composition for photoresist underlayer

Photoresist with polar-acid-labile-group

Actinic-ray-sensitive or radiation-sensitive resin composition, res...

UV patternable polymer blends for organic thin-film transistors

Method for producing substrate with patterned film

Method for producing substrate with patterned film and fluorine-con...

Method for building an etching-free hybrid nonlinear waveguide comp...

Composition, light shielding film, solid-state imaging element, ima...

Patterning interconnects and other structures by photo-sensitizing...

Polymer, chemically amplified resist composition and patterning pro...

Methods of making a bonded assembly and a re-entrant structure, and...

Patents Applicationslast 30 patents

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER COMP...

METHOD FOR PREPARING PIXEL DEFINING LAYER

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AN...

RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD

PHOTOSENSITIVE COMPOSITION, TRANSFER FILM, CURED FILM, SEMICONDUCTO...

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, MULTIL...

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN

RADIATION-SENSITIVE COMPOSITION FOR FORMING INSULATION FILM, RESIN...

PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR...

RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, AND AC...

CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PRO...

RESIN, PHOTORESIST COMPOSITION, AND METHOD OF MANUFACTURING SEMICON...

BOTTOM ANTIREFLECTIVE COATING MATERIALS

PHOTOSENSITIVE POLYCYCLIC-OLEFINIC POLYMERS AND DIAZIRINE COMPOSITI...

CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...

ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING...

LOCAL SHADOW MASKING FOR MULTI-COLOR EXPOSURES

CROSS-LINKABLE PHOTORESIST FOR EXTREME ULTRAVIOLET LITHOGRAPHY

Method for Optimizing Negative Tone Development Photoresist Model

METHOD FOR SELECTING PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR P...

Monomer, Resist Material, Resist Composition, And Patterning Process

ON-PRESS DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR, ME...

PHOTOSENSITIVE COMPOSITION FOR PATTERN FORMATION, AND FLEXOGRAPHIC...

SILPHENYLENE-SKELETON-CONTAINING POLYMER, PHOTOSENSITIVE RESIN COMP...

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING...

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

PHOTOSENSITIVE POLYAMIC ACID AND DIAZIRINE COMPOSITIONS

CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...