Macromolecular compounds which are rendered insoluble or differentially wettable

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G03F7/038

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Polypeptide, photoresist composition including the same, and method...
- Patent number 12,222,646
- Issue date Feb 11, 2025
- Samsung Electronics Co., Ltd.
- Jinha Kim
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresist composition and method of forming photoresist pattern
- Patent number 12,222,647
- Issue date Feb 11, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Chih Ho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 12,216,404
- Issue date Feb 4, 2025
- FUJIFILM Corporation
- Masafumi Kojima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Sulfonium salt, chemically amplified resist composition, and patter...
- Patent number 12,216,401
- Issue date Feb 4, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resin composition, resin sheet, cured film, method for producing cu...
- Patent number 12,210,285
- Issue date Jan 28, 2025
- Toray Industries, Inc.
- Keika Hashimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Quantum dot light emitting panel, display device, and manufacturing...
- Patent number 12,213,332
- Issue date Jan 28, 2025
- BEIJING BOE TECHNOLOGY DEVELOPMENT CO., LTD.
- Aidi Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metal oxide resist patterning with electrical field guided post-exp...
- Patent number 12,204,246
- Issue date Jan 21, 2025
- Applied Materials, Inc.
- Huixiong Dai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Negative photosensitive resin composition, patterning process, meth...
- Patent number 12,197,127
- Issue date Jan 14, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masashi Iio
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Chemically sensitive sensor comprising micro-barrier and method of...
- Patent number 12,196,699
- Issue date Jan 14, 2025
- Technion Research & Development Foundation Limited
- Hossam Haick
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Production method for resist composition purified product, resist p...
- Patent number 12,186,715
- Issue date Jan 7, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Akihiko Nakata
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Photosensitive resin composition, dry film using same, printed wiri...
- Patent number 12,189,290
- Issue date Jan 7, 2025
- Resonac Corporation
- Nobuhito Komuro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative resist composition and pattern forming process
- Patent number 12,189,292
- Issue date Jan 7, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition and method of forming photoresist pattern
- Patent number 12,189,287
- Issue date Jan 7, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Li-Po Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Epoxy formulations and processes for fabrication of relief patterns...
- Patent number 12,189,291
- Issue date Jan 7, 2025
- KAYAKU ADVANCED MATERIALS, INC.
- Daniel J. Nawrocki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of producing three-dimensional objects with apparatus havin...
- Patent number 12,179,435
- Issue date Dec 31, 2024
- Carbon, Inc.
- Jason P. Rolland
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist compositions and semiconductor fabrication methods using the...
- Patent number 12,181,799
- Issue date Dec 31, 2024
- Samsung Electronics Co., Ltd.
- Thanh Cuong Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for producing three-dimensional objects
- Patent number 12,172,382
- Issue date Dec 24, 2024
- Carbon, Inc.
- Jason P. Rolland
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Negative photosensitive resin composition, production method for po...
- Patent number 12,174,539
- Issue date Dec 24, 2024
- Asahi Kasei Kabushiki Kaisha
- Takeki Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist composition and patterning process
- Patent number 12,169,360
- Issue date Dec 17, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 12,164,228
- Issue date Dec 10, 2024
- FUJIFILM Corporation
- Michihiro Ogawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified negative resist composition and resist pattern...
- Patent number 12,164,227
- Issue date Dec 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, method for forming resist pattern...
- Patent number 12,158,700
- Issue date Dec 3, 2024
- JSR Corporation
- Hirokazu Sakakibara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photocurable composition and method for producing semiconductor device
- Patent number 12,147,158
- Issue date Nov 19, 2024
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist composition and method of manufacturing a semiconductor...
- Patent number 12,134,690
- Issue date Nov 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yen-Hao Chen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resin, photoresist composition, and method of manufacturing semicon...
- Patent number 12,135,502
- Issue date Nov 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Siao-Shan Wang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Negative resist formulation for producing undercut pattern profiles
- Patent number 12,124,166
- Issue date Oct 22, 2024
- Merck Patent GmbH
- Anupama Mukherjee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Carboxylate, resist composition and method for producing resist pat...
- Patent number 12,124,167
- Issue date Oct 22, 2024
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 12,117,728
- Issue date Oct 15, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, method of forming resist pattern, compound, and...
- Patent number 12,111,574
- Issue date Oct 8, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya Ikeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Salt, quencher, resist composition and method for producing resist...
- Patent number 12,105,419
- Issue date Oct 1, 2024
- Sumitomo Chemical Company, Limited
- Katsuhiro Komuro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FO...
- Publication number 20250053087
- Publication date Feb 13, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST UNDERLAYER COMPOSITION AND METHOD OF FORMING PATTERNS USING...
- Publication number 20250053090
- Publication date Feb 13, 2025
- Samsung SDI Co., Ltd.
- Hwayoung JIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250044688
- Publication date Feb 6, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PATTERN FORMING METHOD AND METHOD FOR PRODUCING ELECTRONIC DEVICE
- Publication number 20250044700
- Publication date Feb 6, 2025
- FUJIFILM CORPORATION
- Michihiro SHIRAKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR USING COMPOSITION COMPRISING ORGANIC ACID COMPOUND, LITH...
- Publication number 20250044695
- Publication date Feb 6, 2025
- Merck Patent GmbH
- Tomotsugu YANO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOCURABLE COMPOSITION AND PATTERN FORMING METHOD
- Publication number 20250043126
- Publication date Feb 6, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Ryuma MIZUSAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250044687
- Publication date Feb 6, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MONOMER, POLYMER, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION,...
- Publication number 20250044689
- Publication date Feb 6, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM
- Publication number 20250036027
- Publication date Jan 30, 2025
- NISSAN CHEMICAL CORPORATION
- Kosuke IGATA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20250036028
- Publication date Jan 30, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER, MONOMER, RESIST COMPOSITION COMPRISING THE SAME AND METHOD...
- Publication number 20250021003
- Publication date Jan 16, 2025
- Samsung Electronics Co., Ltd.
- Cheol KANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250020999
- Publication date Jan 16, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20250013152
- Publication date Jan 9, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
THERMOSETTING COMPOSITIONS AND FORMING THREE-DIMENSIONALOBJECTS THE...
- Publication number 20250002735
- Publication date Jan 2, 2025
- Stratasys, Inc.
- Paulus Antonius Maria Steeman
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, ACID...
- Publication number 20250004366
- Publication date Jan 2, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi ARAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLOCK COPOLYMER
- Publication number 20250004372
- Publication date Jan 2, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Kazuaki EBISAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
A RELIEF PRECURSOR WITH VEGETABLE OILS AS PLASTICIZERS SUITABLE FOR...
- Publication number 20250004368
- Publication date Jan 2, 2025
- XSYS Germany GmbH
- Patrick-Kurt Dannecker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER, RESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMI...
- Publication number 20250004370
- Publication date Jan 2, 2025
- Samsung Electronics Co., Ltd.
- Beomseok KIM
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20250004367
- Publication date Jan 2, 2025
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20250004371
- Publication date Jan 2, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro FUKUSHIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FREE-RADICALLY POLYMERIZABLE COMPOUNDS, COMPOSITIONS INCLUDING THE...
- Publication number 20250004373
- Publication date Jan 2, 2025
- 3M Innovative Properties Company
- Thomas P. Klun
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20240427244
- Publication date Dec 26, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Yasuo SOMEYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LIGHT PATTERNABLE SURFACE MODIFICATION
- Publication number 20240427240
- Publication date Dec 26, 2024
- Brewer Science, Inc.
- Reuben T. Chacko
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
MONOMER, POLYMER, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION,...
- Publication number 20240427241
- Publication date Dec 26, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20240419071
- Publication date Dec 19, 2024
- FUJIFILM CORPORATION
- Tsutomu YOSHIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER COMP...
- Publication number 20240411226
- Publication date Dec 12, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroki Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PREPARING PIXEL DEFINING LAYER
- Publication number 20240414954
- Publication date Dec 12, 2024
- DUK SAN NEOLUX CO., LTD.
- Hyunsang CHO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20240402601
- Publication date Dec 5, 2024
- FUJIFILM CORPORATION
- Minoru UEMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AN...
- Publication number 20240402604
- Publication date Dec 5, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Rin Odashima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD
- Publication number 20240393687
- Publication date Nov 28, 2024
- JSR Corporation
- Fuyuki EGAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Macromolecular compounds which are rendered insoluble or differentially wettable

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Polypeptide, photoresist composition including the same, and method...

Photoresist composition and method of forming photoresist pattern

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Sulfonium salt, chemically amplified resist composition, and patter...

Resin composition, resin sheet, cured film, method for producing cu...

Quantum dot light emitting panel, display device, and manufacturing...

Metal oxide resist patterning with electrical field guided post-exp...

Negative photosensitive resin composition, patterning process, meth...

Chemically sensitive sensor comprising micro-barrier and method of...

Production method for resist composition purified product, resist p...

Photosensitive resin composition, dry film using same, printed wiri...

Negative resist composition and pattern forming process

Photoresist composition and method of forming photoresist pattern

Epoxy formulations and processes for fabrication of relief patterns...

Methods of producing three-dimensional objects with apparatus havin...

Resist compositions and semiconductor fabrication methods using the...

Methods for producing three-dimensional objects

Negative photosensitive resin composition, production method for po...

Resist composition and patterning process

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Chemically amplified negative resist composition and resist pattern...

Photosensitive resin composition, method for forming resist pattern...

Photocurable composition and method for producing semiconductor device

Photoresist composition and method of manufacturing a semiconductor...

Resin, photoresist composition, and method of manufacturing semicon...

Negative resist formulation for producing undercut pattern profiles

Carboxylate, resist composition and method for producing resist pat...

Resist composition and patterning process

Resist composition, method of forming resist pattern, compound, and...

Salt, quencher, resist composition and method for producing resist...

Patents Applicationslast 30 patents

ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FO...

RESIST UNDERLAYER COMPOSITION AND METHOD OF FORMING PATTERNS USING...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

PATTERN FORMING METHOD AND METHOD FOR PRODUCING ELECTRONIC DEVICE

METHOD FOR USING COMPOSITION COMPRISING ORGANIC ACID COMPOUND, LITH...

PHOTOCURABLE COMPOSITION AND PATTERN FORMING METHOD

RESIST COMPOSITION AND PATTERN FORMING PROCESS

MONOMER, POLYMER, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION,...

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

POLYMER, MONOMER, RESIST COMPOSITION COMPRISING THE SAME AND METHOD...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...

THERMOSETTING COMPOSITIONS AND FORMING THREE-DIMENSIONALOBJECTS THE...

RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, ACID...

BLOCK COPOLYMER

A RELIEF PRECURSOR WITH VEGETABLE OILS AS PLASTICIZERS SUITABLE FOR...

POLYMER, RESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMI...

RESIST UNDERLAYER FILM-FORMING COMPOSITION

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...

FREE-RADICALLY POLYMERIZABLE COMPOUNDS, COMPOSITIONS INCLUDING THE...

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

LIGHT PATTERNABLE SURFACE MODIFICATION

MONOMER, POLYMER, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION,...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER COMP...

METHOD FOR PREPARING PIXEL DEFINING LAYER

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AN...

RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD