Claims
- 1. A photosensitive composition comprising a mixture of:
- (a) 5-60 wt. % of a 1,2-naphthoquinone-2-diazido-4-sulfonic acid ester compound;
- (b) 50-95 wt. % of an alkali-soluble resin;
- (c) 0.01-20 wt. % of a halomethyloxadiazole compound which releases halogen free radicals upon irradiation with actinic rays; and
- (d) 0.01-10 wt. % of a dye which interacts with the decomposition product of said halomethyloxadiazole compound and discolors or develops color.
- 2. The photosensitive composition as recited in claim 1, wherein said alkali-soluble resin (b) contains a polymer having a structural unit represented by the formula: ##STR29## wherein R.sup.1 and R.sup.2 are respectively a hydrogen atom, a halogen atom, an alkyl group, an aryl group or a carboxylic group; R.sup.3 is a hydrogen atom, a halogen atom, an alkyl group or an aryl group; R.sup.4 is a hydrogen atom, an alkyl group or an aryl group or an aralkyl group; B is a divalent aromatic group which may have a substituent or substituents; A is a divalent organic group; and m is an integer of 0-5.
- 3. The photosensitive composition as recited in claim 1, wherein said alkali soluble resin (b) is a novolak resin or a vinyl polymer which contains structural units having phenolic hydroxyl groups.
- 4. The photosensitive composition as recited in any of claim 1-3, wherein the 1,2-naphthoquinone-2-diazido-5-sulfonic acid ester compound (a) is a polycondensate of 1,2-naphthoquinone-2-diazido-4-sulfonic acid, a phenol and an aldehyde or a ketone.
- 5. The photosensitive composition as recited in claim 3 wherein the vinyl polymer as an alkali-soluble resin (b) is a polymer containing (meth)acrylic acid, an ester of an aliphatic monocarboxylic acid or a nitrile.
- 6. The photosensitive composition as recited in claim 1, wherein the alkali-soluble resin (b) is a phenol-m-cresol.multidot.p-cresol.multidot.formaldehyde resin.
- 7. The photosensitive composition as recited in claim 1 wherein 1,2-naphthoquinone-2-diazido-4-sulfonic acid ester compound is an ester of 1,2-naphthoquinone-2-diazido-4-sulfonic acid and 2,3,4-trihydroxybenzophenone.
- 8. The photosensitive composition as recited in claim 1, wherein the alkali-soluble resin (b) contains structural units represented by the formula ##STR30##
Priority Claims (2)
Number |
Date |
Country |
Kind |
63-249398 |
Oct 1988 |
JPX |
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63-250248 |
Oct 1988 |
JPX |
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Parent Case Info
This application is a continuation of application Ser. No. 07/516,453, filed on Oct. 3, 1989, now abandoned.
US Referenced Citations (6)
Foreign Referenced Citations (2)
Number |
Date |
Country |
3097946 |
Apr 1988 |
JPX |
3235936 |
Sep 1988 |
JPX |
Non-Patent Literature Citations (1)
Entry |
J. Kosar, "Light-Sensitive Systems," J. Wiley & Sons, 1965, pp. 339-352. |
Continuations (1)
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Number |
Date |
Country |
Parent |
416453 |
Oct 1989 |
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