Claims
- 1. A plasma processing apparatus comprising:
- a processing container having a reactive gas inlet and a reactive gas outlet;
- a high-frequency electrode disposed in said processing container for supporting a substrate;
- a high-frequency power supply connected to said high-frequency electrode;
- magnetic field generating means for generating a magnetic field in said processing container; and
- a focus ring for surrounding the substrate and having a magnet therein for levitation above the high-frequency electrode by a magnetic field generated by said magnetic field generating means.
- 2. A plasma processing apparatus according to claim 1 wherein said magnetic field generating means is an electromagnet.
- 3. A plasma processing apparatus according to claim 2 wherein said electromagnet is embedded in said high-frequency electrode.
- 4. A plasma processing apparatus according to claim 2 wherein said container includes side walls and said electromagnet is disposed at a side wall of said processing container.
- 5. A plasma processing apparatus according to claim 2 wherein said electromagnet is disposed outside said processing container.
- 6. A plasma processing apparatus according to claim 1 wherein said magnet in said focus ring is an electromagnet.
- 7. A plasma processing apparatus according to claim 1 wherein said magnet in said focus ring is a permanent magnet.
Priority Claims (1)
Number |
Date |
Country |
Kind |
2-287330 |
Oct 1990 |
JPX |
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Parent Case Info
This application is a division of application Ser. No. 07/644,625, filed Jan. 23, 1991, now U.S. Pat. No. 5,213,658.
US Referenced Citations (4)
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Divisions (1)
|
Number |
Date |
Country |
Parent |
644625 |
Jan 1991 |
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