This is a continuation-in-part of U.S. patent application Ser. No. 09/158,563, filed Sep. 22, 1998, by Ye, et al., entitled RF PLASMA ETCH REACTOR WITH INTERNAL INDUCTIVE COIL ANTENNA AND ELECTRICALLY CONDUCTIVE CHAMBER WALLS, which is a continuation-in-part of U.S. patent application Ser. No. 08/869,798, filed Jun. 5, 1997 now U.S. Pat. No. 6,071,372 by Ye, et al., entitled RF PLASMA ETCH REACTOR WITH INTERNAL INDUCTIVE COIL ANTENNA AND ELECTRICALLY CONDUCTIVE CHAMBER WALLS, both herein incorporated by reference in their entireties.
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Number | Date | Country | |
---|---|---|---|
Parent | 09/158563 | Sep 1998 | US |
Child | 09/336512 | US | |
Parent | 08/869798 | Jun 1997 | US |
Child | 09/158563 | US |