W. Brunsvold, et al., “Evaluation of a Deep UV Bilayer Resist for Sub-Half Micron Lithography”, pp. 377-387. |
Carl R. Kessel, et al., “Novel Silicon-Containing Resists for EUV and 193 nm Lithography”, Mar. 1999, pp. 214-220. |
Qinghuang Lin, et al., “A High Resolution 248 nm Bilayer Resist”, Mar. 1999, pp. 241-250. |
Larry D. Boardman, et al., “Chemical Aspects of Silicon-Containing Bilayer Resists”, Mar. 1999, pp. 562-572. |
Jin-Beak Kim, et al., “Chemically amplified resist based on the methacrylate polymer with 2-trimethylsilyl-2-propyl ester protecting group”, Mar. 1999, p. 420-428. |
SPIE vol. 1925 (1993) p. 377-387. |
SPIE vol. 3678 (1999) p. 214-220, p. 241-250, p. 562-572, p. 420-428. |