Positive resist composition and pattern forming method using the same

Abstract

A resist composition, which comprises: (A) a resin containing a repeating unit represented by formula (I); and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation:

Description

Claims

1. A resist composition, which comprises: (A) a resin containing a repeating unit represented by formula (I); and(B) a compound capable of generating an acid upon irradiation with actinic rays or radiation:

2. The resist composition according to claim 1, wherein (A) the resin containing a repeating unit represented by formula (I) further contains a repeating unit represented by formula (A1) or (A2):

3. The resist composition according to claim 2, wherein in the repeating unit represented by formula (A2), A2 contains a cyclic carbon structure.

4. A pattern forming method, which comprises: forming a resist film from a resist composition according to claim 1; andexposing and developing the resist film.