The present application is based upon and claims the benefit of priority to Japanese Patent Application No. 2014-204503, filed Oct. 3, 2014, the entire contents of which are incorporated herein by reference.
1. Field of the Invention
The present invention relates to a printed wiring board with a bump and a method for manufacturing the same.
2. Description of Background Art
Japanese Patent Laid-Open Publication No. 2006-074002 describes a package substrate in which bumps as connecting parts between a package substrate and a semiconductor component are formed by mounting solder balls on conductor pads in openings of a solder resist layer as a coating insulating layer. The entire contents of this publication are incorporated herein by reference.
According to one aspect of the present invention, a printed wiring board includes a base insulating layer including an insulating material, a conductor layer formed on the base insulating layer and including conductor pads, a coating insulating layer formed on the base insulating layer such that the coating insulating layer is covering the conductor layer and having opening portions exposing the conductor pads, respectively, and bumps formed on the conductor pads respectively such that each of the bumps includes an electroless plating metal layer formed on a respective one of the conductor pads and a solder layer formed on the electroless plating metal layer, the electroless plating metal layer having an upper end surface formed such that a central portion of the upper end surface is recessed relative to a peripheral portion of the upper end surface.
According to one aspect of the present invention, a method for manufacturing a printed wiring board includes preparing a printed wiring board including a base insulating layer including an insulating material, a conductor layer formed on the base insulating layer and including conductor pads, and a coating insulating layer formed on the base insulating layer such that the coating insulating layer is covering the conductor layer, forming opening portions penetrating through the coating insulating layer such that the opening portions reach the conductor pads, respectively, forming in each of the opening portions an electroless plating metal layer such that the electroless plating metal layer connects to a respective one of the conductor pads and has an upper end surface having a central portion which is recessed relative to a peripheral portion of the upper end surface, mounting solder only on the upper end surface of the electroless plating metal layer through an adhesive layer, and reflowing the solder by applying heat such that a solder layer is formed on the upper end surface of the electroless plating metal layer and a bump including the electroless plating metal layer and the solder layer protruding from a surface of the coating insulating layer is formed.
A more complete appreciation of the invention and many of the attendant advantages thereof will be readily obtained as the same becomes better understood by reference to the following detailed description when considered in connection with the accompanying drawings, wherein:
The embodiments will now be described with reference to the accompanying drawings, wherein like reference numerals designate corresponding or identical elements throughout the various drawings.
The insulating material that forms the base insulating layer 1 may be resin such as epoxy and may also be ceramic. The conductor layer 2 may be made of any conductive material and is preferably made of copper. A material that forms the coating insulating layer 3 may be ABF (Ajinomoto Build-up Film (trade name)), and may also be a normal solder resist. It is preferable that a pitch (center-to-center distance) of the bumps 4 be 30 μm or more and 80 μm or less. As a result, a package substrate can be formed on which, for example, mounted semiconductor components are connected by an ultrahigh density wiring. The electroless metal plating that forms the bumps 4 may be electroless copper plating. However, it is preferable that the electroless metal plating be electroless nickel plating. This is because the electroless nickel plating can be formed thicker than the electroless copper plating in a short period of time. The electroless copper plating or the electroless nickel plating is reliably filled in the openings (3a) of the coating insulating layer 3, the openings (3a) being finely formed along with a demand for fineness of the bump pitch. Therefore, the bumps 4 are likely to have uniform heights.
It is preferable that the conductor pads (2a) be SMD (Solder Mask Defined) type conductor pads. In the case of SMD type conductor pads, as illustrated in the drawings, the conductor pads (2a) are partially exposed from the openings (3a) of the coating insulating layer 3. The central part of the upper end surface of the electroless plating metal layer 5 that is formed on a conductor pad (2a) exposed from an openings (3a) is recessed relative to the peripheral part of the upper end surface. This is because the electroless plating metal is laminated from an inner peripheral surface of the opening (3a) and an exposed surface of the conductor pad (2a) toward the center of the opening.
When the electroless plating metal layer 5 is made of nickel, it is preferable that the solder layer 6 formed on the electroless plating metal layer 5 be formed of tin. This is because the alloy layer 7 is formed of an intermetallic compound of a nickel-tin alloy in which nickel and tin are tightly bonded.
It is preferable that phosphorus content in the electroless nickel plating that forms the electroless plating metal layer 5 be 5% or more and 12% or less. When the phosphorus content is less than 5%, it is likely to cause reduction in insulation due to migration. When the phosphorus content is more than 12%, adhesion strength of the solder bumps 6 (to be described later) decreases.
In the following, a method for manufacturing a printed wiring board with a bump according to an embodiment of the present invention is described based on the drawings.
In the method for manufacturing the printed wiring board of the present embodiment, as illustrated in
As illustrated in
As illustrated in
The electroless plating metal is laminated from an inner peripheral surface of the opening (3a) and an exposed surface of the conductor pad (2a) toward the center of the opening. Therefore, the upper end surface (5a) of the electroless plating metal layer 5 is formed into a state in which the central part is recessed relative to the peripheral part that is adjacent to the inner peripheral surface of the opening (3a) of the coating insulating layer 3. At the time when the electroless plating metal layer 5 is formed up to the vicinity of the supper surface of the coating insulating layer 3, generation of the electroless plating metal is stopped.
As illustrated in
As illustrated in
Thereafter, by heating the substrate to reflow the solder powder 9, as illustrated in
By adjusting an amount and a particle size of the solder powder 9, the solder layer 6 of any height can be formed. The height of the solder layer 6 is preferably 12-15 μm. By using nickel as the metal that forms the electroless plating metal layer 5 and using tin as the metal that forms the solder layer, the alloy layer 7 of a nickel-tin alloy can be formed, and the solder layer 6 can be firmly bonded to the electroless plating metal layer 5.
The central part of the upper end surface (5a) of the electroless plating metal layer 5 is recessed relative to the peripheral part of the upper end surface (5a). Therefore, the solder powder 9 is easily held in the openings (3a), and further, as compared to a case of a flat upper end surface, the upper end surface (5a) has a larger area and thus a bonding force between the solder layer 6 and the electroless plating metal layer 5 is increased.
According to the printed wiring board with a bump of the present embodiment and the method for manufacturing the printed wiring board, the electroless plating metal layer 5, the solder layer 6 and the alloy layer 7, which are made of conductors, are reliably formed in the openings (3a) of the coating insulating layer 3; bumps are each formed by the electroless plating metal layer 5, the solder layer 6 and the alloy layer 7; variation in heights of the bumps as connecting parts between a package substrate and a semiconductor component is reduced; and the pads (2a) can be reliably connected to bumps of the semiconductor component.
As a method forming the solder layer 6 and the alloy layer 7 on the upper end surface (5a) of the electroless plating metal layer 5, instead of the above-described SJ method in which the adhesive layer 8 and the solder powder 9 are used, the PPS (Precoated by Powder Sheet) method of Senju Metal Industry Co., Ltd. (see Japanese Patent Laid-Open Publication No. 2004-193334) may also be used. According to the PPS method, solder balls are held in holes, which are formed in a heat-resistant sheet and correspond to the openings (3a) of the coating insulating layer 3, by adhesive layers that are exposed to bottom surfaces and side surfaces of the holes; in a state in which the solder balls are opposed to the openings (3a) of the coating insulating layer 3, the heat-resistant sheet is put on the coating insulating layer 3 and is heated together with the printed board, and thereby, the solder balls are reflowed in the openings (3a); and thereafter, by removing the heat-resistant sheet, it is possible to form the solder layer 6 and the alloy layer 7 only on the upper end surface (5a) of the electroless plating metal layer 5.
In the embodiment illustrated in
In the embodiment illustrated in
When the lower side package substrate (P1) is manufactured, it is possible that openings of a coating insulating layer for the large-diameter electroless plating metal layers (5B), together with openings of a coating insulating layer for the small-diameter electroless plating metal layers (5A), are formed, for example, using the same UV laser, or are formed sequentially using different laser such as CO2 laser, and then the electroless plating metal layers (5A, 5B) are formed together or separately in the openings. Or, it is also possible that, after the openings of the coating insulating layer for the small-diameter electroless plating metal layers (5A) are formed, for example, using UV laser, in a state in which the openings of the coating insulating layer is covered by a PET film or the like, a coating insulating layer for the large-diameter electroless plating metal layers (5B) is formed, and openings are formed in the coating insulating layer by etching or the like, and, after the PET film or the like that covers the openings of the coating insulating layer for the small-diameter electroless plating metal layers (5A) is removed, the electroless plating metal layers (5A, 5B) are formed together or separately in the openings.
Bumps as connecting parts between a package substrate and a semiconductor component may be formed by mounting solder balls on conductor pads in openings of a solder resist layer or by printing of solder paste. However, along with demand for a fine bump pitch, it has become difficult to reliably fill solders in openings of a solder resist layer.
Therefore, a bump connection method has been examined in which electroless tin plating having good solderability is filled in openings of a solder resist layer, and bumps formed by the electroless tin plating and bumps of a semiconductor component are connected by applying pressure to the bumps. However, the electroless tin plating requires processing for a longer period of time as compared to other electroless plating. In a case where a large number of substrates are processed for a long period of time in a batch in a rack system, due to variation in plating liquid exhaustion, a plating region may be non-uniform within a substrate. Therefore, variation in height of the plating is increased and it may cause a conduction failure when connecting to a semiconductor component.
A printed wiring board according to an embodiment of the present invention allows pads to be reliably connected to bumps of a semiconductor component by reliably forming conductors in openings of a coating insulating layer and reducing variation in heights of bumps as connecting parts between a package substrate and the semiconductor component.
A printed wiring board with a bump according to an embodiment of the present invention includes: a base insulating layer made of an insulating material; a conductor layer that is formed on the base insulating layer and includes a conductor pad; a coating insulating layer that is formed on the base insulating layer and has an opening that exposes the conductor pad; and a bump that is formed on the conductor pad. The bump includes: an electroless plating metal layer that is formed on the exposed conductor pad; and a solder layer that is formed on the electroless plating metal layer. A central part of an upper end surface of the electroless plating metal layer is recessed relative to a peripheral part of the upper end surface.
A method for manufacturing a printed wiring board with a bump according to an embodiment of the present invention includes: preparing a printed wiring board that includes a base insulating layer made of an insulating material, a conductor layer that is formed on the base insulating layer and includes a conductor pad, and a coating insulating layer that is formed on the base insulating layer and the conductor layer; forming an opening that penetrates the coating insulating layer to reach the conductor pad; forming, in the opening, an electroless plating metal layer that is electrically connected to the pad and of which a central part of an upper end surface is recessed relative to a peripheral part of the upper end surface; using an adhesive layer to mount solder only on the upper end surface of the electroless plating metal layer; and forming a solder layer that protrudes from an upper surface of the coating insulating layer on the upper end surface of the electroless plating metal layer by applying heat to the solder to reflow the solder and forming a bump that at least includes the electroless plating metal layer and the solder layer.
Obviously, numerous modifications and variations of the present invention are possible in light of the above teachings. It is therefore to be understood that within the scope of the appended claims, the invention may be practiced otherwise than as specifically described herein.
Number | Date | Country | Kind |
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2014-204503 | Oct 2014 | JP | national |