Claims
- 1. A probe contactor for electrical connection with a contact target, comprising:a dielectric substrate; an interconnect trace provided on a surface of the dielectric substrate for establishing an electric conductive path; and a contactor formed on said dielectric substrate through a photolithography process, said contactor having a base portion vertically formed on said dielectric substrate at substantially right angle relative to said dielectric substrate, a horizontal portion in parallel with a surface of said dielectric substrate, one end of which being formed on said base portion, and a contact portion vertically formed on another end of said horizontal portion at substantially right angle relative to said horizontal portion; wherein said base portion, said horizontal portion and said contact portion are uniformly made of conductive material as a whole and are integral with one another and have substantially the same shape and size in cross section, and wherein said horizontal portion of said contactor is extended in a diagonal direction relative to a direction of the interconnect trace and produces a resilient contact force when said contactor is pressed against said contact target, and said contact portion of said contactor is sharpened at an end so that when said contactor is pressed against said contact target, it scrubs a surface of the contact target.
- 2. A probe contactor as defined in claim 1, further comprising an interconnect pad on said dielectric substrate which is electrically connected to said interconnect trace and said contactor.
- 3. A probe contactor as defined in claim 1, wherein said interconnect trace is made of metal and formed through either a deposition, evaporation, sputtering or plating process.
- 4. A probe contactor as defined in claim 1, wherein said contactor is directly formed on said interconnect trace to establish electrical connection therebetween.
- 5. A probe contactor as defined in claim 1, wherein said contactor is made of metal and formed through a deposition process after forming a photo mask on said interconnect trace.
- 6. A probe contactor as defined in claim 1, wherein said contactor is formed on said interconnect trace by repeating at least three photolithography processes, each of said photolithography processes includes steps of photoresist coating, masking, exposure, photoresist stripping and conductive material deposition.
- 7. A probe contactor for electrical connection with a contact target, comprising:a silicon substrate having an interconnect trace thereon which is an electric conductive path; and a contactor formed on said silicon substrate through a photolithography process, said contactor having a base portion vertically formed on said silicon substrate at substantially right angle relative to said silicon substrate, a horizontal portion in parallel with a surface of said silicon substrate, one end of which being formed on said base portion, and a contact portion vertically formed on another end of said horizontal portion at substantially right angle relative to said horizontal portion; wherein said base portion, said horizontal portion and said contact portion are uniformly made of conductive material as a whole and are integral with one another and have substantially the same square shape and size in cross section, and wherein said horizontal portion of said contactor is extended in a diagonal direction relative to a direction of the interconnect trace and produces a resilient contact force when said contactor is pressed against said contact target, and said contact portion of said contactor is sharpened at an end so that when said contactor is pressed against said contact target, it scrubs a surface of the contact target.
- 8. A probe contactor as defined in claim 7, further comprising an interconnect pad on said silicon substrate which is electrically connected to said interconnect trace and said contactor.
- 9. A probe contactor as defined in claim 7, wherein said interconnect trace is made of metal and formed through either a deposition, evaporation, sputtering or plating process.
- 10. A probe contactor as defined in claim 7, wherein said contactor is directly formed on said interconnect trace to establish electrical connection therebetween.
- 11. A probe contactor as defined in claim 7, wherein said contactor is made of metal and formed through a deposition process after forming a photo mask on said interconnect trace.
- 12. A probe contactor as defined in claim 7, wherein said contactor is formed on said interconnect trace by repeating at least three photolithography processes, each of said photolithography processes includes steps of photoresist coating, masking, exposure, photoresist stripping and conductive material deposition.
- 13. A method of producing a contactor for electrical connection with a contact target, comprising the following steps of:providing a substrate made of dielectric or semiconductor material; forming an interconnect trace on said substrate either by deposition or plating; and applying photolithography processes for forming a contactor having a base portion vertically formed on said interconnect trace at substantially right angle relative to said substrate, a horizontal portion in parallel with a surface of said substrate, one end of said horizontal portion being formed on said base portion, and a contact portion vertically formed on another end of said horizontal portion at substantially right angle relative to said horizontal portion, each of said photolithography processes including steps of photoresist coating, masking, exposure, photoresist stripping and conductive material deposition; wherein said base portion, said horizontal portion and said contact portion are uniformly made of conductive material as a whole and integral with one another and have substantially the same square shape and size in cross section, and said horizontal portion is extended in a diagonal direction relative to a direction of the interconnect trace and produces a resilient contact force when pressed against the contact target, and said contact portion of said contactor is sharpened at an end so that when said contactor is pressed against said contact target, it scrubs a surface of the contact target.
Parent Case Info
This is a continuation-in-part of application Ser. No. 09/099,614, filed Jun. 19, 1998, entitled “PROBE CONTACT FORMED OF PHOTOLITHOGRAPHY PROCESS”, now abandoned.
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Continuation in Parts (1)
|
Number |
Date |
Country |
Parent |
09/099614 |
Jun 1998 |
US |
Child |
09/740179 |
|
US |