Claims
- 1. A process for producing a ceramic multi-layer circuit board, wherein a plurality of ceramic layers each having a conductor pattern on an upper surface are piled, which comprises making a mixture of (1) 20 to 80% by weight of single silica, said single silica being at least two kinds of single silica, the at least two kinds of single silica being different from each other in crystal form, each of the at least two kinds of single silica having an average particle size of not more than 10 .mu.m, the at least two kinds of single silica different from each other in crystal form being selected from the group consisting of critobolite, tridymite, quarta glass and quartz, and (2) 80 to 20% by weight of at least one kind of low melting point glass having a lower softening point than that of a metal forming said conductor pattern and having an average particle size of not more than 10 .mu.m, said at least one kind of low melting point glass being selected from the group consisting of borosilicate glass, barium borosilicate glass, magnesium borosilicate glass, aluminum phosphate glass and lead oxide-containing low softening point glass; forming said mixture into a slurry together with an organic synthetic resin-based binder and a solvent; forming a sheet from the slurry on a flexible film; removing the solvent therefrom, thereby obtaining a green sheet; depositing a circuit conductor of a metal selected from the group consisting of gold, silver, copper or their alloys, on the green sheet, in a desired pattern form; piliing a plurality of the green sheets to form a laminate thereof; and firing the piled green sheets at a temperature lower than the melting point of the circuit conductor metal, thereby obtaining a fired ceramic where the single silica is evenly distributed in the matrix of the low melting point glass.
- 2. The process according to claim 1, wherein a plasticizer is further added in forming the mixture into a slurry.
- 3. The process according to claim 1, wherein said firing is performed so as to sinter the piled green sheets.
- 4. The process according to claim 1, wherein said mixture consists essentially of said at least two kinds of single silica different from each other in crystal form and said at least one kind of low melting point glass.
- 5. The process according to claim 1, wherein the resulting fired ceramic has a thermal expansion coefficient in the range of 1.times.10.sup.-6 /.degree.C. to 20.times.10.sup.-6 /.degree.C. in the temperature range of room temperature to 400.degree. C.
- 6. The process according to claim 1, wherein, after obtaining the green sheet and before depositing the circuit conductor, holes are formed in the green sheet so as to form through-holes through the green sheet.
- 7. The process according to claim 6, wherein the depositing a circuit conductor includes depositing the metal for the circuit conductor in said holes so as to connect conductor patterns when a plurality of the green sheets are piled to form a laminate thereof.
- 8. The process according to claim 1, wherein the at least two kinds of single silica different from each other in crystal form are provided in making the mixture so as to control the thermal expansion coefficient of the resulting ceramic material.
- 9. The process according to claim 8, wherein the thermal expansion coefficient of the resulting ceramic material is controlled to be in the range of 1.times.10.sup.-6 /.degree.C. to 20.times.10.sup.-6 /.degree.C. in the temperature range of room temperature to 400.degree. C.
- 10. The process according to claim 9, wherein the at least two kinds of single silica different from each other in crystal form are provided in making the mixture so as to control the thermal expansion coefficient of the resulting ceramic material to correspond to that of the metal forming the circuit conductor pattern.
- 11. The process according to claim 10, wherein the mixing ratio of the single silica and the low melting point glass is controlled so as to control the thermal expansion coefficient of the resulting ceramic material.
- 12. The process according to claim 11, wherein the particles of the at least two kinds of single silica and the particles of the at least one kind of low melting point glass have particle sized of 325 mesh or smaller.
- 13. The process according to claim 11, wherein the firing is performed at a temperature between 800.degree. C. and 1050.degree. C.
Priority Claims (1)
Number |
Date |
Country |
Kind |
57-119811 |
Jul 1982 |
JPX |
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Parent Case Info
This application is a continuing application of application Ser. No. 511,903, filed July 8, 1983, now abandoned.
US Referenced Citations (11)
Continuations (1)
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Number |
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Parent |
511903 |
Jul 1983 |
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