Number | Date | Country | Kind |
---|---|---|---|
87 05669 | Apr 1987 | FRX |
This application is a continuation of application Ser. No. 278,925, filed Nov. 21, 1988, now abandoned.
Filing Document | Filing Date | Country | Kind | 102e Date | 371c Date |
---|---|---|---|---|---|
PCT/FR88/00196 | 4/21/1988 | 11/21/1988 | 11/21/1988 |
Publishing Document | Publishing Date | Country | Kind |
---|---|---|---|
WO88/08439 | 11/3/1988 |
Number | Name | Date | Kind |
---|---|---|---|
4328646 | Kaganowicz | May 1982 | |
4546008 | Saitoh et al. | Oct 1985 | |
4585537 | Nakayama et al. | Apr 1986 | |
4645684 | Osada et al. | Feb 1987 | |
4668365 | Foster et al. | May 1987 | |
4673588 | Bringmann et al. | Jun 1987 | |
4716048 | Ishihara et al. | Dec 1987 | |
4816341 | Nakayama et al. | Mar 1989 | |
4840873 | Benz et al. | May 1989 |
Number | Date | Country |
---|---|---|
0110258 | Jun 1984 | EPX |
61-30671 | Feb 1986 | JPX |
61-077132 | Apr 1986 | JPX |
61-174510 | Dec 1986 | JPX |
61-186293 | Jan 1987 | JPX |
2071673 | Sep 1981 | GBX |
Entry |
---|
"Thin Si Films Can Form at Room Temperature", Electronics, vol. 54(22), Nov. 1981, p. 82. |
Tsu et al., "Silicon Nitride and Silicon Dimide Grown by Remote Plasma Enhanced Chemical Vapor Deposition", J. Vac. Sci. Technol. A, vol. 4(3), May 1986, pp. 480-485. |
"Plasma Polymerization and Deposition of Amorphous Hydrogenated Silicon from rf and dc Silane Plasmas", Journal of Applied Physics, vol. 55, No. 10, May 1984, by R. Ross et al., pp. 3785-3794. |
Number | Date | Country | |
---|---|---|---|
Parent | 278925 | Nov 1988 |