Claims
- 1. A process for the production of negative relief copies, in which a photosensitive copying material comprising a layer support and a photosensitive layer comprising a binder which is insoluble in water and soluble in aqueous-alkaline solutions, a photosensitive 1,2-quinone-diazide or a photosensitive mixture comprising a compound which splits off acid upon exposure to light and a compound containing at least one acid-cleavable C--O--C group, and a thermal-hardening substance, is exposed imagewise to actinic radiation to produce a latent positive image, thereafter heated to about 80.degree. to 150.degree. C. to thermally harden exposed areas, cooled, and, after cooling, subjected to an overall exposure to actinic radiation to produce a latent negative relief image which is then developed by means of an aqueous-alkaline developer, wherein the thermal-hardening substance comprises at least one compound of the general formula I ##STR3## wherein R.sub.1 may be alkyl or aryl group and
- R.sub.2 may be an alkoxy or aryloxy group or an amino group which has one or two alkyl, cycloalkyl or aryl substituents, and wherein the photosensitive compound or mixture is present in an amount sufficient to render exposed areas soluble in developer and the thermal-hardening substance is present in an amount sufficient to cause hardening of exposed areas under the action of heat.
- 2. A process as claimed in claim 1, wherein the imagewise exposed material is heated for about 10 seconds to 10 minutes.
- 3. A process as claimed in claim 1, wherein, for producing negative and positive copies on the same copying layer, the material is, after cooling, exposed imagewise in the still unexposed, previously covered layer areas with the aid of additional originals and is then developed by means of an aqueous-alkaline developer.
- 4. A process as claimed in claim 1, wherein
- R.sub.1 may be a (C.sub.1 -C.sub.4) -alkyl or phenyl group and
- R.sub.2 may be an (C.sub.1 -C.sub.4)-alkoxy or phenyl group or an amino group which has one or two (C.sub.1 -C.sub.4)-alkyl or (C.sub.4 -C.sub.8)-cycloalkyl substituents.
- 5. A process as claimed in claim 1, wherin the thermal-hardening substance comprises 2-dialkylamino-4,6-dialkoxy-s-triazine.
- 6. A process as claimed in claim 1, wherein the photosensitive layer comprises 2-dialkylamino-4,6-dialkoxy-s-triazine, 1,2-naphthoquinone-2-diazide-4-sulfonic acid ester, 4-dialkylaminoazobenzene and a triphenyl methane dye.
- 7. A process as claimed in claim 1, wherein the photosensitive layer comprises 2-dialkylamino-4,6-dialkoxy-s-triazine, 1,2-naphthoquinone-2-diazide-4-sulfonic acid ester, 2,4-bis-trihalogenomethyl-s-triazine and a triphenyl methane dye.
Priority Claims (1)
Number |
Date |
Country |
Kind |
3711263 |
Apr 1987 |
DEX |
|
Parent Case Info
This application is a division, of application Ser. No. 07/177/411, filed Apr. 4, 1988, abandoned.
US Referenced Citations (13)
Foreign Referenced Citations (4)
Number |
Date |
Country |
565734 |
Dec 1987 |
AUX |
164248 |
Dec 1985 |
EPX |
57-74417 |
Aug 1983 |
JPX |
2082339 |
Mar 1982 |
GBX |
Non-Patent Literature Citations (3)
Entry |
English Abstract of Japanese Document 58-190,946, Published 11/1983 (Sharp KK). |
Dudley et al., "Cyanuric Chloride Derivatives, III-Alkoxy-s-triazines", The Journal of Am. Chem. Soc., vol. 73, 7-9/1951, pp. 2986-2992. |
De Forest, W. S., Photoresist Materials and Processes, McGraw-Hill Book Co., 1975, pp. 47-59. |
Divisions (1)
|
Number |
Date |
Country |
Parent |
177411 |
Apr 1988 |
|