The present disclosure relates to the diffusion and/or deposition of metallic and/or ceramic coatings onto a tubular surface using double glow discharge.
There are a number of applications where it may be desirable to provide corrosion, erosion or wear protection in tubular structures that may transmit fluids, gasses or other materials. While a number of techniques may be used to coat interior surfaces, including painting, electroplating, plasma spray or cladding, plasma enhanced chemical vapor deposition by plasma immersion ion deposition, or cylindrical magnetron sputter deposition, it may be difficult to coat the inner diameter of a tube, particularly when the tube is curved. In addition, the coatings may not be sufficient to meet technical requirements. In particular, while plasma enhanced chemical deposition may be used to provide coatings for curved tubes, the resulting diamond like carbon films produced typically include pin holes and the deposition of pure metallic film may be difficult. Furthermore, cylindrical magnetron sputter deposition has not been found to accommodate small diameter tubing and is not applicable to curved tubes.
An aspect of the present disclosure relates to a method of sputtering a component. The method may include positioning a conductive substrate into a vacuum chamber, wherein the conductive substrate is tubular and has a surface. A source electrode including a source material may be inserted into the conductive substrate. A first bias voltage ΔVac1 may be applied between the conductive substrate and the vacuum chamber and a second bias voltage ΔVas1 may be applied between the source electrode and the vacuum chamber, sputtering the source material onto the conductive substrate.
Another aspect of the present disclosure relates to a method of sputtering a component. The method may include positioning a conductive substrate into a vacuum chamber, wherein the conductive substrate is tubular and has a surface. A source electrode including a source material may be inserted into the conductive substrate. A first bias voltage ΔVac1 may be applied between the conductive substrate and the vacuum chamber and a second bias voltage ΔVas1 may be applied between the source electrode and the vacuum chamber; and the source material may be sputtered onto the conductive substrate. The source material may be coated onto the conductive substrate at a thickness of up to and including 250 μm and/or the source material may diffuse up to and including 250 μm from the surface of the conductive substrate.
A further aspect of the present disclosure may relate to a method of sputtering a component. The method may include positioning a source electrode including a source material into a vacuum chamber. A conductive substrate may be inserted into the source electrode, wherein the source material is tubular. A first bias voltage ΔVac1 may be applied between the conductive substrate and the vacuum chamber and a second bias voltage ΔVas1 may be applied between the source electrode and the vacuum chamber, sputtering the source material onto the conductive substrate.
The above-mentioned and other features of this disclosure, and the manner of attaining them, will become more apparent and better understood by reference to the following description of embodiments described herein taken in conjunction with the accompanying drawings, wherein:
The present disclosure relates to a method and system for the diffusion and/or deposition of metallic and/or ceramic coatings onto an inner diameter of a tubular substrate using double glow discharge. Double glow discharge may be understood herein as a sputter coating or diffusion process wherein solid alloying elements or metals are introduced to or into the surfaces of electrically conductive substrates. The process may utilize an anode, which may include the vacuum chamber itself or a surface within the vacuum chamber, a cathode including the substrate to be treated and a source electrode including the alloying elements or metals to be introduced to the substrate surface. During double glow discharge, the substrate may be heat treated, diffused and/or coated with metallic and/or ceramic materials. In particular, the substrate may be treated with a pure metallic element, (i.e., the deposited metal may include less than 5% of impurities), such as Ti, Cr or TiN.
Inside the chamber a first electrode or cathode may be arranged within. The first electrode may include a hollow, tubular substrate 106. The substrate, which may be the cathode, may be a conductive material. Such conductive material may include metals, metal alloys, conductive polymers, conductive ceramics or combinations thereof. The substrate to be treated may be tubular, i.e., define a hollow interior, and may exhibit any given cross-section(s) including circular, square, oval, triangular, hexagonal, octagonal, rectangular, etc. The substrate may define an internal surface 107 and have an internal diameter in the range of 1 mm to 4 m including all values and increments therein. The substrate may also be curved, as illustrated in
Referring back to
During processing, the vacuum chamber may be evacuated to a pressure of approximately 1×10−4 torr to 1×101 torr, including all values and increments therein. An inert gas may be supplied to the vacuum chamber, such as argon or helium. The addition of the gas may slightly raise the pressure in the chamber to 1×10−2 torr to 1×102 torr, including all values and increments therein. The surface of the substrate may be sputter cleaned via the inert gas. Once cleaned, and during coating, additional gas may be supplied and the pressure may be in the range of 1×10−1 to 1×102 torr, including all values and increments therein.
A power supply 112 may be connected to the substrate 106 and the same or another power supply 114 may be connected to the source electrode 108. The power supply connected to the substrate may provide direct current. The power supply connected to the source electrode may provide direct current and/or alternating current. A first voltage differential may be applied between the first electrode, i.e., the substrate, and the anode, i.e., the vacuum chamber. The bias voltage or potential difference (ΔVac1) may be in the range of 100-1000 V, including all values and increments therein. The bias voltage may cause the substrate to be bombarded with positive ions from the inert atmosphere and the temperature of the substrate to increase. A second bias voltage or potential difference (ΔVac1) between the anode and substrate may be applied, where the potential difference may be increased to the range of 300-1000 V, including all values and increments therein. The second bias voltage may be applied once the substrate has been cleaned or after a given time period, such as from 1 second to 2 hours, including all values and increments therein.
Once the substrate has been cleaned, a bias voltage may also be applied between the anode (the vacuum chamber) and the source electrode, wherein the potential difference (ΔVas1) may be less than or equal to the first voltage differential between the anode and substrate (ΔVac1). The bias or potential difference between the anode and the source electrode may be the same polarity as the bias between the anode and the substrate. Thus, one glow discharge may be present between the substrate and the vacuum chamber and a second glow discharge may be present between the vacuum chamber and the source electrode. An alternating current may also as resistance heating.
The bombardment by positive ions may cause the ejection of positive ions from the source electrode, which may be attracted to the relatively negative cathode (or substrate), having a higher or greater voltage bias than the source electrode with respect to the anode or vacuum chamber. The ions may coat and/or penetrate (diffuse) into the surface of the substrate. For example, they may diffuse into the surface up to and including 250 μm from the surface, including all values and increments in the range from 0.1 μm-250 μm. A coating may also be formed on the surface, also up to and including 250 μm, including all values and increments in the range from 0.1 μm to 250 μm. The coating formed on the surface may therefore be a layer having a thickness in the range of 0.1 μm to 250 μm, including all values and increments therein. Furthermore, both coating and/or diffusion may be provided as desired. The double glow discharge process may be applied for a few seconds to a few days, such as 2 or 3 seconds to up to 48 hours, including all values and increments therein. The atoms or ions may be implanted at a concentration of up to 20 atomic % or more, including all values and increments in the range of 1 to 30 atomic %, within 100 μm from the surface.
It may be appreciated that the substrate or the source electrode may be cooled or voltage biases may be adjusted such that temperature of the substrate or source electrode may be reduced to or maintained at or about a given set point forming a metallic coating on the surface of the sample during discharge processing, wherein the material of the source electrode (along with any reaction products to the introduction of additional gasses) may be deposited on the substrate surface. Substrate cooling may be facilitated by, for example, providing jackets around the substrate or providing cooling channels within the substrate through which a cooling media, such as water or gas may be circulated. It may be appreciated that in one example, depending on the various process parameters, i.e., gas pressure, voltage biases, etc., and temperature of the substrate and/or source electrode, the amount of diffusion of the source electrode material deposited onto the substrate may be adjusted.
Furthermore, melting of the substrate or the coating materials may not be necessary to obtain the coating or diffusion of the coating material in the substrate. That is, the source electrode material may not be melted to deposit the material onto the substrate. Thus, it may be appreciated that a refractory metal, such as W, Mo, Nb, Ta or Re, may be deposited on a relatively low temperature metal having a lower melting point than the refractory metal, without melting either metal. Accordingly, the present disclosure may avoid melting of the source electrode, and provide coating of a relatively lower melting substrate, with a relatively higher melting coating material, without substrate and/or substrate surface melting.
The deposited and diffuse coatings provided herein may be used to increase erosion or wear resistance of the tubing in various systems. Such systems may include petroleum or natural gas products where sand entrapped in fluid media may cause wear or in power generation products where water droplets contained in two phase flow tubings may affect erosion of the tubings. In addition, the coatings herein may increase corrosion resistance against various media such as water, H2S, CO2, NH3, Cl, F, Br, acid and other chemical products for industries such as chemical industries, power industries or oil industries.
It may be appreciated that the examples herein are provided for the purposes of illustration only and are not meant to be limiting of the description and/claims appended hereto.
As illustrated in
The foregoing description of several methods and embodiments has been presented for purposes of illustration. It is not intended to be exhaustive or to limit the claims to the precise steps and/or forms disclosed, and obviously many modifications and variations are possible in light of the above teaching. It is intended that the scope of the invention be defined by the claims appended hereto.
Number | Name | Date | Kind |
---|---|---|---|
4374722 | Zega | Feb 1983 | A |
4377773 | Hershcovitch et al. | Mar 1983 | A |
4407712 | Henshaw et al. | Oct 1983 | A |
4520268 | Xu | May 1985 | A |
4680197 | Sagoi et al. | Jul 1987 | A |
4731539 | Xu | Mar 1988 | A |
4764394 | Conrad | Aug 1988 | A |
4795942 | Yamasaki | Jan 1989 | A |
5249554 | Tamor et al. | Oct 1993 | A |
5458927 | Malaczynski et al. | Oct 1995 | A |
5483121 | Okagaki et al. | Jan 1996 | A |
5593798 | Muller et al. | Jan 1997 | A |
5605714 | Dearnaley et al. | Feb 1997 | A |
5725573 | Dearnaley et al. | Mar 1998 | A |
6055928 | Murzin et al. | May 2000 | A |
6087025 | Dearnaley et al. | Jul 2000 | A |
6120660 | Chu et al. | Sep 2000 | A |
6182604 | Goeckner et al. | Feb 2001 | B1 |
6410144 | Dearnaley et al. | Jun 2002 | B2 |
6497803 | Glocker et al. | Dec 2002 | B2 |
6514565 | Dearnaley et al. | Feb 2003 | B2 |
6524538 | Barankova et al. | Feb 2003 | B2 |
6572933 | Nastasi et al. | Jun 2003 | B1 |
6632482 | Sheng | Oct 2003 | B1 |
6767436 | Wei et al. | Jul 2004 | B2 |
6878404 | Verrasamy et al. | Apr 2005 | B2 |
6893907 | Maydan et al. | May 2005 | B2 |
7052736 | Wei et al. | May 2006 | B2 |
7094670 | Collins et al. | Aug 2006 | B2 |
7300684 | Boardman et al. | Nov 2007 | B2 |
8029875 | Wei et al. | Oct 2011 | B2 |
8753725 | Wei et al. | Jun 2014 | B2 |
20010009225 | Leyendecker et al. | Jul 2001 | A1 |
20040025454 | Burgess | Feb 2004 | A1 |
20040055870 | Wei | Mar 2004 | A1 |
20040084152 | Gregoire et al. | May 2004 | A1 |
20040254545 | Rider, II et al. | Dec 2004 | A1 |
20050061251 | Wei et al. | Mar 2005 | A1 |
20050287307 | Singh et al. | Dec 2005 | A1 |
20060011468 | Boardman et al. | Jan 2006 | A1 |
20060076231 | Wei | Apr 2006 | A1 |
20060076235 | Wei | Apr 2006 | A1 |
20060121704 | Walther et al. | Jun 2006 | A1 |
20060196419 | Tudhope et al. | Sep 2006 | A1 |
20060198965 | Tudhope et al. | Sep 2006 | A1 |
20060251917 | Chiang et al. | Nov 2006 | A1 |
20060264060 | Ramaswamy et al. | Nov 2006 | A1 |
20080292806 | Wei et al. | Nov 2008 | A1 |
20090120367 | Porshnev et al. | May 2009 | A1 |
20090176035 | Tudhope et al. | Jul 2009 | A1 |
20110111132 | Wei et al. | May 2011 | A1 |
20110151141 | Upadhyaya et al. | Jun 2011 | A1 |
20120045592 | Kumar et al. | Feb 2012 | A1 |
20120231177 | Wei et al. | Sep 2012 | A1 |
Number | Date | Country |
---|---|---|
63 026373 | Feb 1988 | JP |
02205666 | Aug 1990 | JP |
02243766 | Sep 1990 | JP |
Entry |
---|
Chen, et al., “Development and Characterization of Micromachined Hollow Cathode Plasma Display Devices,” Journal of Microelectromechanical Systems, vol. 11, No. 5, Oct. 2002. pp. 536-543. |
Anders, “From Plasma Immersion Ion Implantation to Deposition: A Historical Perspective on Principles and Trends,” Surface and Coatings Technology, vol. 156, Issues 1-3, Jul. 1, 2002, pp. 3-12. |
Kostov, et al., “Two Dimensional Computer Simulation of Plasma Immersion Ion Implantation,” Brazilian Journal of Physics, vol. 34, No. 4B, Dec. 2004. |
“Plasma-enhanced Chemical Vapor Deposition,” available at http://en.wikipedia.org/wiki/Plasma- enhanced—chemical—vapor—deposition, retrieved on May 18, 2007, 3 pages. |
“Diamond-like Carbon,” available at http://en.wikipedia.org/wiki/Diamond-like—carbon, retrieved on May 16, 2007, 6 pages. |
Apetrei, et al., “Characterization of a Modified Hollow-cathode Discharge Plasma by Optical Means,” 32nd EPS Conference of Plasma Phys. Tarragona, Jun. 27-Jul. 1, 2005 ECA vol. 29C, P-4.139 (2205), 4 pages. |
Shader, et al., “Hollow Cathode Lamps—Yesterday, Today and Tomorrow,” Mar. 1999, available at https://www.varianinc.com/media/sci/apps/a-aa14.pdf, retrieved on May 15, 2008, 7 pages. |
“Plasma Immersion Ion Implantation (PI3)—The Technology, Applications and Success to Date,” Materials Australia, vol. 34, No. 1, p. 9, Jan./Feb. 2002, available at http://www.azom.com/details.asp?ArticleID=2090, retrieved on May 16, 2007, 3 pages. |
“Plasma Immersion Ion Processing,” 18-Steam Turbine Technology Brochure, available at http://www.swri.org/3pubs/brochure/d18/plasma/plasma.htm, retrieved on May 16, 2007, 2 pages. |
“Hollow Cathodes,” available at http://www.engr.colostate.edu/ionstand/research—hollowcathods.html, retrieved on May 17, 2007, 3 pages. |
“Hollow Cathode Plasma Source,” available at http://www.vtd.de/en/produkte/komponenten/ko—ref2.php, retrieved on May 17, 2007, 1 page. |
“Cold War Against Hydrates,” available at http://www.ntnu.no/gemini/2003-06e/28-31.htm. retrieved on May 16, 2007, 5 pages. |
Wei, “A novel High-Intensity Metal Ion Source for Plasma Immersion Implantation and Deposition (MPIII&D) 18-9292,” available at http://www.swri.org/3pubs/IRD2003/Synopses/189292.htm, retrieved on May 16, 2007, 2 pages. |
“SwRI Surface Modification Facility Offers Two New Capabilities,” available at http://www.swri.org/9what/releases/2000/PIIP.htm, retrieved on May 16, 2007, 2 pages. |
Monaghan, et al. “Diamond-Like Carbon Coatings,” Materials World, vol. 1 No. 6 pp. 347-349, Jun. 1993, available at http://www.azom.com/details.asp?ArticleID=623, retrieved on May 16, 2007. |
International Search Report and Written Opinion dated Aug. 26, 2008 issued in related International Patent Application No. PCT/US08/64344. |
U.S. Office Action dated May 25, 2010 issued in related U.S. Appl. No. 11/752,787. |
U.S. Office Action dated Sep. 15, 2009 issued in related U.S. Appl. No. 11/752,787. |
Zizka, “Plasma deposition of thin metal layers in the discharge with a hollow target”. Czech. J. Phys. B 33 (1983), pp. 14-24. |
Tian, et al., “Theoretical investigation of plasma immersion ion implantation of cylindrical bore using hollow cathode plasma discharge”. Surface and Coatings Technology 203 (2009) pp. 2727-2730. |
Wei, et al., “Magnetic field enhanced plasma (MFEP) deposition of inner surfaces of tubes”. Surface and Coatings Technology 188-189 (2004) pp. 691-696. |
Xu, et al. “Double glow plasma surface alloying and plasma nitride,” Surface and Coating Technology vol. 201, Issue 9-11, Feb. 2007, pp. 4822-4825 (abstract enclosed). |
Hosokawa, et al., “Self-sputtering phenomena in high-rate coaxial cylindrical magnetron sputtering,” J. Vac. Sci. Technol., vol. 14, No. 1, Jan./Feb. 1997. pp. 143-146. |
Examiner's Report dated Dec. 7, 2011 issued in related Australian Patent Application No. 2008256944. |
Search Report dated Jul. 5, 2012 issued in related European Patent Application No. 08756039.7 (8 pgs). |
T.Casserly, et al; “Investigation of DLC-Si Film Deposited Inside a 304SS Pipe Using a Novel Hollow Cathode Plasma Immersion Ion Processing Method”; 2007 Society of Vacuum Coaters 505/865-7188; 50th Annual Technical Conference Proceedings (2007) ISSN 0737-5921; pp. 59-62. |
Office Action dated Sep. 2, 2013 issued in related European Patent Application No. 08 756 039.7 (4 pgs). |
Non-Final Office Action dated Sep. 25, 2013 issued in related U.S. Appl. No. 13/046,181 (12 pgs). |
Lusk, et al, “A High Density Hollow Cathode Plasma PECVD Technique for Depositing Films on the Internal Surfaces of Cylindrical Substrates”, Wiley InterScience, Plasma Processes and Polymers, 2009, 6, S429-S432. |
Lusk, et al, “A Hollow Cathode High Density Plasma Process for Internally Coating Cylindrical Substrates”, [US Office Action dated Sep. 25, 2013 (U.S. Appl. No. 13/046,181)]. |
Number | Date | Country | |
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20100006421 A1 | Jan 2010 | US |