Number | Date | Country | Kind |
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7-190124 | Jul 1995 | JPX |
Entry |
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E. Barouch, et al. "Resist Development Described By Least Action Principle-Line Profile Prediction", J. Vac. Sci. Technol. B6, (pp. 2234-2237), Nov./Dec. 1988. |
Masato Fujinaga, et al. "Three-Dimensional Topography Simulation Model: Etching and Lithography", IEEE Transactions on Electron Devices, vol. 37. No. 10, (pp. 2183-2192), Oct. 1990. |
Masaya Komatsu. "Three Dimensional Resist Profile Simulation", SPIE, vol. 1927 Optical/Laser Microlithography VI (pp. 413-426), Feb. 1993. |