Modelling and simulation from physical phenomena up to complete wafer process or whole workflow in wafer fabrication

Industry

CPC
G03F7/705

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/705Modelling and simulation from physical phenomena up to complete wafer process or whole workflow in wafer fabrication

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor processing tool and methods of operation
- Patent number 12,298,672
- Issue date May 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kai-Chieh Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination correction apparatus
- Patent number 12,298,671
- Issue date May 13, 2025
- Samsung Electronics Co., Ltd.
- Donghyeong Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Data inspection for digital lithography for HVM using offline and i...
- Patent number 12,292,693
- Issue date May 6, 2025
- Applied Materials, Inc.
- Chung-Shin Kang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for controlling a lithographic apparatus and associated appa...
- Patent number 12,287,582
- Issue date Apr 29, 2025
- ASML Netherlands B.V.
- Frank Staals
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and systems for generating shape data for electronic designs
- Patent number 12,288,022
- Issue date Apr 29, 2025
- Center for Deep Learning in Electronics Manufacturing
- Suhas Pillai
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for determining a production aerial image of an object to be...
- Patent number 12,288,272
- Issue date Apr 29, 2025
- Carl Zeiss SMT GmbH
- Martin Dietzel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for modeling measurement data over a substrate area and asso...
- Patent number 12,287,583
- Issue date Apr 29, 2025
- ASML Netherlands B.V.
- Edo Maria Hulsebos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and apparatus for obtaining diagnostic information relating...
- Patent number 12,287,584
- Issue date Apr 29, 2025
- ASML Netherlands B.V.
- Alexander Ypma
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for controlling extreme ultraviolet light
- Patent number 12,282,262
- Issue date Apr 22, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ssu-Yu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Full-chip cell critical dimension correction method and method of m...
- Patent number 12,282,249
- Issue date Apr 22, 2025
- Samsung Electronics Co., Ltd.
- Kisung Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for calculating a spatial map associated with...
- Patent number 12,276,918
- Issue date Apr 15, 2025
- ASML Netherlands B.V.
- Mauritius Gerardus Elisabeth Schneiders
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Process recipe, method and system for generating same, and semicond...
- Patent number 12,276,965
- Issue date Apr 15, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Shaowen Qiu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for controlling a semiconductor manufacturing process
- Patent number 12,276,919
- Issue date Apr 15, 2025
- ASML Netherlands B.V.
- Marc Hauptmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate comprising a target arrangement, and associated at least...
- Patent number 12,276,921
- Issue date Apr 15, 2025
- ASML Netherlands B.V.
- Olger Victor Zwier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for predicting substrate image
- Patent number 12,271,114
- Issue date Apr 8, 2025
- ASML Netherlands B.V.
- Scott Anderson Middlebrooks
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method to detect a defect on a lithographic sample and metrology sy...
- Patent number 12,271,115
- Issue date Apr 8, 2025
- Carl Zeiss SMT GmbH
- Toufic Jabbour
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for calibration of an optical measurement system and optical...
- Patent number 12,270,647
- Issue date Apr 8, 2025
- ASML Netherlands B.V.
- Maarten Jozef Jansen
- G01 - MEASURING TESTING
Information Patent Grant
Optical proximity correction and photomasks
- Patent number 12,265,334
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Dong-Yo Jheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Matching process controllers for improved matching of process
- Patent number 12,265,380
- Issue date Apr 1, 2025
- Applied Materials, Inc.
- James Robert Moyne
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Lithography system and method of detecting fluid leakage in liquid...
- Patent number 12,259,657
- Issue date Mar 25, 2025
- United Microelectronics Corp.
- Zhi Fan Sun
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection method and inspection platform for lithography
- Patent number 12,259,660
- Issue date Mar 25, 2025
- Industrial Technology Research Institute
- Cheng-Hsien Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Aligning a distorted image
- Patent number 12,259,659
- Issue date Mar 25, 2025
- ASML Netherlands B.V.
- Coen Adrianus Verschuren
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Apparatus and method for property joint interpolation and prediction
- Patent number 12,254,392
- Issue date Mar 18, 2025
- ASML Netherlands B.V.
- Faegheh Hasibi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Large scale computational lithography using machine learning models
- Patent number 12,249,115
- Issue date Mar 11, 2025
- Synopsys, Inc.
- Dereje Shewaseged Woldeamanual
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Universal metrology file, protocol, and process for maskless lithog...
- Patent number 12,248,254
- Issue date Mar 11, 2025
- Applied Materials, Inc.
- Tamer Coskun
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Determining hot spot ranking based on wafer measurement
- Patent number 12,242,201
- Issue date Mar 4, 2025
- ASML Netherlands B.V.
- Youping Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for and method of optical component alignment
- Patent number 12,244,116
- Issue date Mar 4, 2025
- Cymer, LLC
- Hong Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device and apparatus for ma...
- Patent number 12,235,589
- Issue date Feb 25, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shinn-Sheng Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process window qualification modulation layouts
- Patent number 12,235,224
- Issue date Feb 25, 2025
- KLA Corporation
- Andrew Cross
- G01 - MEASURING TESTING
Information Patent Grant
System and method for dynamically controlling temperature of thermo...
- Patent number 12,235,593
- Issue date Feb 25, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tzu-Jung Pan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR DETERMINING ABERRATION SENSITIVITY OF PATTERNS
- Publication number 20250155824
- Publication date May 15, 2025
- ASML NETHERLANDS B.V.
- Jingjing LIU
- G05 - CONTROLLING REGULATING
Information Patent Application
OPTICAL APPARATUS AND CONTROL METHOD OF OPTICAL APPARATUS
- Publication number 20250155823
- Publication date May 15, 2025
- Lasertec Corporation
- Ko GONDAIRA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV LIGHT SOURCE CONTAMINATION MONITORING SYSTEM
- Publication number 20250155828
- Publication date May 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng Hung TSAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR PROCESS-WINDOW CHARACTERIZATION
- Publication number 20250147428
- Publication date May 8, 2025
- ASML NETHERLANDS B.V.
- Te-Sheng WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MA...
- Publication number 20250147431
- Publication date May 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shinn-Sheng YU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INSPECTION APPARATUS, MOTORIZED APERTURES, AND METHOD BACKGROUND
- Publication number 20250147438
- Publication date May 8, 2025
- ASML NETHERLANDS B.V.
- Krishanu SHOME
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR SUBMICRON ADDITIVE MANUFACTURING
- Publication number 20250144873
- Publication date May 8, 2025
- LAWRENCE LIVERMORE NATIONAL SECURITY, LLC
- Sourabh Kumar SAHA
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
ILLUMINATING APPARATUS, MOLDING APPARATUS, AND METHOD FOR MANUFACTU...
- Publication number 20250138430
- Publication date May 1, 2025
- Canon Kabushiki Kaisha
- OSAMU YASUNOBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ABERRATION IMPACT SYSTEMS, MODELS, AND MANUFACTURING PROCESSES
- Publication number 20250138433
- Publication date May 1, 2025
- ASML NETHERLANDS B.V.
- Xingyue PENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF CONFIGURING EXTREME ULTRA-VIOLET (EUV) LIGHT SOURCE AND E...
- Publication number 20250138431
- Publication date May 1, 2025
- Samsung Electronics Co., Ltd.
- Sungmin Nam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF CONFIGURING EXTREME ULTRA-VIOLET (EUV) ILLUMINATION SYSTE...
- Publication number 20250138434
- Publication date May 1, 2025
- Samsung Electronics Co., Ltd.
- Yeongchan CHO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD OF CALIBRATING AND MONITORING RADIATION IN EUV LIT...
- Publication number 20250137844
- Publication date May 1, 2025
- KLA Corporation
- Earl Jensen
- G01 - MEASURING TESTING
Information Patent Application
DEVICE FOR REPLICATING A MASTER HOLOGRAPHIC OPTICAL ELEMENT WITH VA...
- Publication number 20250130506
- Publication date Apr 24, 2025
- Carl Zeiss Jena GmbH
- Markus GIEHL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
VIBRATION CONTROL OF STRUCTURAL ELEMENTS OF EXPOSURE APPARATUS
- Publication number 20250130510
- Publication date Apr 24, 2025
- Nikon Corporation
- Pai-Hsueh Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, LITHOG...
- Publication number 20250130509
- Publication date Apr 24, 2025
- Canon Kabushiki Kaisha
- GENICHIROU KIYOTA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
USE OF ALTERNATING LAYER PATTERNS APPROACH FOR EFFECTIVE OVERLAY ME...
- Publication number 20250123569
- Publication date Apr 17, 2025
- Applied Materials, Inc.
- Yau Loong CHONG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR HEATING AN OPTICAL ELEMENT, AND OPTICAL SYSTEM
- Publication number 20250123575
- Publication date Apr 17, 2025
- Carl Zeiss SMT GMBH
- Malte LANGENHORST
- G01 - MEASURING TESTING
Information Patent Application
TREATMENT SOLUTION SUPPLY APPARATUS, REPORTING METHOD, AND STORAGE...
- Publication number 20250116942
- Publication date Apr 10, 2025
- TOKYO ELECTRON LIMITED
- Yoshinori UTSUNOMIYA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
STRUCTURE AND TECHNIQUE OF PHOTO-DEFINED SEMICONDUCTOR DEVICE WITH...
- Publication number 20250117561
- Publication date Apr 10, 2025
- Applied Materials, Inc.
- Benjamin D. Briggs
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR CONTROLLING A PRODUCTION SYSTEM AND METHOD FOR THERMALLY...
- Publication number 20250103855
- Publication date Mar 27, 2025
- ASML NETHERLANDS B.V.
- Wenjie JIN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEMS AND METHODS THAT USE INFRARED (IR) SPECTROSCOPY TO MONITOR...
- Publication number 20250105066
- Publication date Mar 27, 2025
- TOKYO ELECTRON LIMITED
- Sean Berglund
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ASSEMBLY FOR A LITHOGRAPHIC APPARATUS
- Publication number 20250102902
- Publication date Mar 27, 2025
- ASML NETHERLANDS B.V.
- Tim Willem Johan VAN DE GOOR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF GENERATING DRAWING DATA, DRAWING DATA GENERATION DEVICE,...
- Publication number 20250093785
- Publication date Mar 20, 2025
- Nikon Corporation
- Yuho KANAYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR ASSESSING PHOTORESIST RINSE SOLUTION
- Publication number 20250093784
- Publication date Mar 20, 2025
- Samsung Electronics Co., Ltd.
- DAIKI MINAMI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
EDGE PLACEMENT WITH SPATIAL LIGHT MODULATOR WRITING
- Publication number 20250093783
- Publication date Mar 20, 2025
- Mycronic AB
- Martin GLIMTOFT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TEMPERATURE MEASUREMENT OF OPTICAL ELEMENTS IN AN OPTICAL APPARATUS
- Publication number 20250085172
- Publication date Mar 13, 2025
- ASML Netherland B.V.
- Koen Martin Willem Jan BOS
- G01 - MEASURING TESTING
Information Patent Application
CALIBRATION SYSTEM FOR AN EXTREME ULTRAVIOLET LIGHT SOURCE
- Publication number 20250085641
- Publication date Mar 13, 2025
- ASML NETHERLANDS B.V.
- Daniel Jason Riggs
- G01 - MEASURING TESTING
Information Patent Application
RESIST PATTERN PREDICTION DEVICE AND RESIST PATTERN PREDICTION DEVI...
- Publication number 20250076772
- Publication date Mar 6, 2025
- Samsung Electronics Co., Ltd.
- Hanveen Koh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
UTILIZE MACHINE LEARNING IN SELECTING HIGH QUALITY AVERAGED SEM IMA...
- Publication number 20250078244
- Publication date Mar 6, 2025
- ASML NETHERLANDS B.V.
- Chen ZHANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method for Monitoring Ghost Image of Illumination Unit of Lithograp...
- Publication number 20250076195
- Publication date Mar 6, 2025
- SHANGHAI HUALI MICROELECTRONICS CORPORATION
- Kaifeng Xu
- G01 - MEASURING TESTING

Modelling and simulation from physical phenomena up to complete wafer process or whole workflow in wafer fabrication

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Semiconductor processing tool and methods of operation

Illumination correction apparatus

Data inspection for digital lithography for HVM using offline and i...

Method for controlling a lithographic apparatus and associated appa...

Methods and systems for generating shape data for electronic designs

Method for determining a production aerial image of an object to be...

Method for modeling measurement data over a substrate area and asso...

Methods and apparatus for obtaining diagnostic information relating...

Method for controlling extreme ultraviolet light

Full-chip cell critical dimension correction method and method of m...

Method and apparatus for calculating a spatial map associated with...

Process recipe, method and system for generating same, and semicond...

Method for controlling a semiconductor manufacturing process

Substrate comprising a target arrangement, and associated at least...

Method and apparatus for predicting substrate image

Method to detect a defect on a lithographic sample and metrology sy...

Method for calibration of an optical measurement system and optical...

Optical proximity correction and photomasks

Matching process controllers for improved matching of process

Lithography system and method of detecting fluid leakage in liquid...

Inspection method and inspection platform for lithography

Aligning a distorted image

Apparatus and method for property joint interpolation and prediction

Large scale computational lithography using machine learning models

Universal metrology file, protocol, and process for maskless lithog...

Determining hot spot ranking based on wafer measurement

Apparatus for and method of optical component alignment

Method of manufacturing a semiconductor device and apparatus for ma...

Process window qualification modulation layouts

System and method for dynamically controlling temperature of thermo...

Patents Applicationslast 30 patents

METHOD FOR DETERMINING ABERRATION SENSITIVITY OF PATTERNS

OPTICAL APPARATUS AND CONTROL METHOD OF OPTICAL APPARATUS

EUV LIGHT SOURCE CONTAMINATION MONITORING SYSTEM

APPARATUS AND METHOD FOR PROCESS-WINDOW CHARACTERIZATION

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MA...

INSPECTION APPARATUS, MOTORIZED APERTURES, AND METHOD BACKGROUND

SYSTEM AND METHOD FOR SUBMICRON ADDITIVE MANUFACTURING

ILLUMINATING APPARATUS, MOLDING APPARATUS, AND METHOD FOR MANUFACTU...

ABERRATION IMPACT SYSTEMS, MODELS, AND MANUFACTURING PROCESSES

METHOD OF CONFIGURING EXTREME ULTRA-VIOLET (EUV) LIGHT SOURCE AND E...

METHOD OF CONFIGURING EXTREME ULTRA-VIOLET (EUV) ILLUMINATION SYSTE...

METROLOGY METHOD OF CALIBRATING AND MONITORING RADIATION IN EUV LIT...

DEVICE FOR REPLICATING A MASTER HOLOGRAPHIC OPTICAL ELEMENT WITH VA...

VIBRATION CONTROL OF STRUCTURAL ELEMENTS OF EXPOSURE APPARATUS

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, LITHOG...

USE OF ALTERNATING LAYER PATTERNS APPROACH FOR EFFECTIVE OVERLAY ME...

METHOD FOR HEATING AN OPTICAL ELEMENT, AND OPTICAL SYSTEM

TREATMENT SOLUTION SUPPLY APPARATUS, REPORTING METHOD, AND STORAGE...

STRUCTURE AND TECHNIQUE OF PHOTO-DEFINED SEMICONDUCTOR DEVICE WITH...

METHOD FOR CONTROLLING A PRODUCTION SYSTEM AND METHOD FOR THERMALLY...

SYSTEMS AND METHODS THAT USE INFRARED (IR) SPECTROSCOPY TO MONITOR...

ASSEMBLY FOR A LITHOGRAPHIC APPARATUS

METHOD OF GENERATING DRAWING DATA, DRAWING DATA GENERATION DEVICE,...

APPARATUS AND METHOD FOR ASSESSING PHOTORESIST RINSE SOLUTION

EDGE PLACEMENT WITH SPATIAL LIGHT MODULATOR WRITING

TEMPERATURE MEASUREMENT OF OPTICAL ELEMENTS IN AN OPTICAL APPARATUS

CALIBRATION SYSTEM FOR AN EXTREME ULTRAVIOLET LIGHT SOURCE

RESIST PATTERN PREDICTION DEVICE AND RESIST PATTERN PREDICTION DEVI...

UTILIZE MACHINE LEARNING IN SELECTING HIGH QUALITY AVERAGED SEM IMA...

Method for Monitoring Ghost Image of Illumination Unit of Lithograp...