Modelling and simulation from physical phenomena up to complete wafer process or whole workflow in wafer fabrication

Industry

CPC
G03F7/705

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/705Modelling and simulation from physical phenomena up to complete wafer process or whole workflow in wafer fabrication

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Selection of measurement locations for patterning processes
- Patent number 12,228,862
- Issue date Feb 18, 2025
- ASML Netherlands B.V.
- Hans Van Der Laan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
EUV light source contamination monitoring system
- Patent number 12,228,863
- Issue date Feb 18, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng Hung Tsai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining aberration sensitivity of patterns
- Patent number 12,222,656
- Issue date Feb 11, 2025
- ASML Netherlands B.V.
- Jingjing Liu
- G05 - CONTROLLING REGULATING
Information Patent Grant
Stage apparatus and electron beam lithography system
- Patent number 12,222,658
- Issue date Feb 11, 2025
- Jeol Ltd.
- Hirofumi Miyao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Predictive apparatus in a gas discharge light source
- Patent number 12,216,411
- Issue date Feb 4, 2025
- Cymer, LLC
- Matthew Minakais
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor manufacturing system, method of manufacturing a semic...
- Patent number 12,217,962
- Issue date Feb 4, 2025
- Kioxia Corporation
- Shingo Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Treatment solution supply apparatus, reporting method, and storage...
- Patent number 12,210,292
- Issue date Jan 28, 2025
- Tokyo Electron Limited
- Yoshinori Utsunomiya
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method for submicron additive manufacturing
- Patent number 12,208,569
- Issue date Jan 28, 2025
- Lawrence Livermore National Security, LLC
- Sourabh Kumar Saha
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Aberration impact systems, models, and manufacturing processes
- Patent number 12,210,291
- Issue date Jan 28, 2025
- ASML Netherlands B.V.
- Xingyue Peng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and apparatuses for aligning and diagnosing a laser beam
- Patent number 12,204,161
- Issue date Jan 21, 2025
- Cymer, LLC
- Donald Harrison Barnhart
- G01 - MEASURING TESTING
Information Patent Grant
Training methods for machine learning assisted optical proximity error
- Patent number 12,204,250
- Issue date Jan 21, 2025
- ASML Netherlands B.V.
- Jing Su
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for inspection and metrology
- Patent number 12,204,826
- Issue date Jan 21, 2025
- ASML Netherlands B.V.
- Lotte Marloes Willems
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optical mode optimization for wafer inspection
- Patent number 12,204,842
- Issue date Jan 21, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Bing-Siang Chao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Tag coordinate determination method and apparatus, computer-readabl...
- Patent number 12,204,837
- Issue date Jan 21, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Jing Li
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Pattern generation method, template, and method for manufacturing t...
- Patent number 12,204,251
- Issue date Jan 21, 2025
- Kioxia Corporation
- Kazuhiro Takahata
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for decision making in a semiconductor manufacturing process
- Patent number 12,204,252
- Issue date Jan 21, 2025
- ASML Netherlands B.V.
- Arnaud Hubaux
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Apparatus and method for process-window characterization
- Patent number 12,197,134
- Issue date Jan 14, 2025
- ASML Netherlands B.V.
- Te-Sheng Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device and method for setting relative laser intensities
- Patent number 12,197,135
- Issue date Jan 14, 2025
- Mycronic AB
- Fredric Ihren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Tool control using multistage LSTM for predicting on-wafer measurem...
- Patent number 12,197,133
- Issue date Jan 14, 2025
- International Business Machines Corporation
- Dung Tien Phan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Exposure system and method for manufacturing electronic devices
- Patent number 12,197,132
- Issue date Jan 14, 2025
- Gigaphoton Inc.
- Koichi Fujii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for diagnosing unobserved operational parameters
- Patent number 12,189,303
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- David Evert Song Kook Sigtermans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polarizer nanoimprint lithography
- Patent number 12,189,161
- Issue date Jan 7, 2025
- Moxtek, Inc.
- Bradley R. Williams
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Digital lithography scan sequencing
- Patent number 12,189,299
- Issue date Jan 7, 2025
- Applied Materials, Inc.
- Ying-Chiao Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Computational metrology
- Patent number 12,189,302
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Utilize machine learning in selecting high quality averaged SEM ima...
- Patent number 12,182,983
- Issue date Dec 31, 2024
- ASML Netherlands B.V.
- Chen Zhang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Calibration system for an extreme ultraviolet light source
- Patent number 12,174,550
- Issue date Dec 24, 2024
- ASML Netherlands B.V.
- Daniel Jason Riggs
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
System and method for performing extreme ultraviolet photolithograp...
- Patent number 12,174,545
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tai-Yu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation source testing
- Patent number 12,169,363
- Issue date Dec 17, 2024
- Cymer, LLC
- Russell Allen Burdt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
IC fabrication flow with dynamic sampling for measurement
- Patent number 12,169,178
- Issue date Dec 17, 2024
- Texas Instruments Incorporated
- Jonas Hoehenberger
- G01 - MEASURING TESTING
Information Patent Grant
Method for generating a mathematical model for positioning individu...
- Patent number 12,164,102
- Issue date Dec 10, 2024
- Carl Zeiss SMT GmbH
- Norman Kretzschmar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PHOTOSENSITIVE SUBSTRATE DEVELOPING METHOD, PHOTOMASK CREATING METH...
- Publication number 20250060683
- Publication date Feb 20, 2025
- Gigaphoton Inc.
- Koichi FUJII
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVELOPMENT STRATEGY FOR HIGH-ABSORBING METAL-CONTAINING PHOTORESISTS
- Publication number 20250060673
- Publication date Feb 20, 2025
- LAM RESEARCH CORPORATION
- Chenghao Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS WINDOW OPTIMIZER
- Publication number 20250053702
- Publication date Feb 13, 2025
- ASML NETHERLANDS B.V.
- Stefan HUNSCHE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OVERLAY METROLOGY TARGET FOR DIE-TO-WAFER OVERLAY METROLOGY
- Publication number 20250054872
- Publication date Feb 13, 2025
- KLA Corporation
- Shlomo Eisenbach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF REDUCING CYCLIC ERROR EFFECTS IN A LITHOGRAPHIC PROCESS,...
- Publication number 20250053102
- Publication date Feb 13, 2025
- ASML NETHERLANDS B.V.
- Hans BUTLER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC PERFORMANCE QUALIFICATION AND ASSOCIATED APPARATUSES
- Publication number 20250044707
- Publication date Feb 6, 2025
- ASML NETHERLANDS B.V.
- Alina Nicoleta TARAU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES
- Publication number 20250044708
- Publication date Feb 6, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ru-Gun LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PREDICTING EUV DOSE, METHOD OF DESIGNING PAG USING THE SA...
- Publication number 20250044706
- Publication date Feb 6, 2025
- Samsung Electronics Co., Ltd.
- Ji Young PARK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD, COMPUTER RECORDING MEDIUM, SUBSTRATE P...
- Publication number 20250044704
- Publication date Feb 6, 2025
- TOKYO ELECTRON LIMITED
- Yuichi ASAHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METROLOGY TARGET DESIGN FOR TILTED DEVICE DESIGNS
- Publication number 20250035489
- Publication date Jan 30, 2025
- KLA Corporation
- Myungjun Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ARRANGEMENT, METHOD AND COMPUTER PROGRAM PRODUCT FOR CALIBRATING FA...
- Publication number 20250028250
- Publication date Jan 23, 2025
- Carl Zeiss SMT GMBH
- Florian Baumer
- G01 - MEASURING TESTING
Information Patent Application
SYSTEMS AND METHODS FOR OPTIMIZING LITHOGRAPHIC DESIGN VARIABLES US...
- Publication number 20250028255
- Publication date Jan 23, 2025
- ASML NETHERLANDS B.V.
- Chenxi LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR IMAGING A MASK LAYER AND ASSOCIATED IMAGING SYSTEM
- Publication number 20250028252
- Publication date Jan 23, 2025
- XSYS PREPRESS N.V.
- Frederik DEFOUR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETERMINING AN ETCH EFFECT BASED ON AN ETCH BIAS DIRECTION
- Publication number 20250021015
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Jin CHENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR REDUCING PATTERN SHIFT IN A LITHOGRAPHIC AP...
- Publication number 20250021018
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Joost Cyrillus Lambert HAGEMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGE STABILIZATION FOR DIGITAL LITHOGRAPHY
- Publication number 20250021016
- Publication date Jan 16, 2025
- Applied Materials, Inc.
- Thomas L. LAIDIG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND SYSTEMS TO CALIBRATE RETICLE THERMAL EFFECTS
- Publication number 20250021017
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Raaja Ganapathy SUBRAMANIAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR LITHOGRAPHIC TOOLS WITH INCREASED TOLERANCES
- Publication number 20250021012
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Jasper WINTERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EDGE EXPOSURE APPARATUS AND EDGE EXPOSURE METHOD
- Publication number 20250021027
- Publication date Jan 16, 2025
- TOKYO ELECTRON LIMITED
- Keisaku KAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SPECTRAL FEATURE CONTROL APPARATUS
- Publication number 20250013066
- Publication date Jan 9, 2025
- CYMER, LLC
- Eric Anders Mason
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY IN THE PRESENCE OF CMOS UNDER ARRAY (CUA) STRUCTURES UTIL...
- Publication number 20250004384
- Publication date Jan 2, 2025
- KLA Corporation
- Zhaxylyk Kudyshev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SOURCE SEPARATION FROM METROLOGY DATA
- Publication number 20250004385
- Publication date Jan 2, 2025
- ASML NETHERLANDS B.V.
- Marc Johannes NOOT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXPOSURE APPARATUS, CONTROL METHOD, AND METHOD OF MANUFACTURING ART...
- Publication number 20250004388
- Publication date Jan 2, 2025
- Canon Kabushiki Kaisha
- HIRONOBU FUJISHIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR OPTIMIZING LAYOUT PATTERN AND SEMICONDUCTOR WAFER
- Publication number 20250006562
- Publication date Jan 2, 2025
- WINBOND ELECTRONICS CORP.
- Chun-Hung Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PRODUCING MASK DATA FOR SEMICONDUCTOR DEVICE MANUFACTURING
- Publication number 20250004383
- Publication date Jan 2, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Kenji YAMAZOE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL DEVICE, METHOD FOR MEASURING AN ACTUAL TILT OF AN OPTICAL S...
- Publication number 20240426603
- Publication date Dec 26, 2024
- Carl Zeiss SMT GMBH
- Heiner ZWICKEL
- G01 - MEASURING TESTING
Information Patent Application
INSPECTION APPARATUS, POLARIZATION-MAINTAINING ROTATABLE BEAM DISPL...
- Publication number 20240427251
- Publication date Dec 26, 2024
- ASML NETHERLANDS B.V.
- Douglas C. CAPPELLI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Determination of Imaging Transfer Function of a Charged-Particle Ex...
- Publication number 20240427254
- Publication date Dec 26, 2024
- IMS Nanofabrication GmbH
- Christoph Spengler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN SHAPE MEASUREMENT METHOD, PATTERN SHAPE MEASUREMENT APPARAT...
- Publication number 20240426605
- Publication date Dec 26, 2024
- KIOXIA Corporation
- Taiki ITO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
LASER APPARATUS AND METHOD FOR MANUFACTURING ELECTRONIC DEVICES
- Publication number 20240429672
- Publication date Dec 26, 2024
- Gigaphoton Inc.
- Seiji NOGIWA
- H01 - BASIC ELECTRIC ELEMENTS

Modelling and simulation from physical phenomena up to complete wafer process or whole workflow in wafer fabrication

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Selection of measurement locations for patterning processes

EUV light source contamination monitoring system

Method for determining aberration sensitivity of patterns

Stage apparatus and electron beam lithography system

Predictive apparatus in a gas discharge light source

Semiconductor manufacturing system, method of manufacturing a semic...

Treatment solution supply apparatus, reporting method, and storage...

System and method for submicron additive manufacturing

Aberration impact systems, models, and manufacturing processes

Methods and apparatuses for aligning and diagnosing a laser beam

Training methods for machine learning assisted optical proximity error

Method and apparatus for inspection and metrology

Optical mode optimization for wafer inspection

Tag coordinate determination method and apparatus, computer-readabl...

Pattern generation method, template, and method for manufacturing t...

Method for decision making in a semiconductor manufacturing process

Apparatus and method for process-window characterization

Device and method for setting relative laser intensities

Tool control using multistage LSTM for predicting on-wafer measurem...

Exposure system and method for manufacturing electronic devices

Methods and apparatus for diagnosing unobserved operational parameters

Polarizer nanoimprint lithography

Digital lithography scan sequencing

Computational metrology

Utilize machine learning in selecting high quality averaged SEM ima...

Calibration system for an extreme ultraviolet light source

System and method for performing extreme ultraviolet photolithograp...

Radiation source testing

IC fabrication flow with dynamic sampling for measurement

Method for generating a mathematical model for positioning individu...

Patents Applicationslast 30 patents

PHOTOSENSITIVE SUBSTRATE DEVELOPING METHOD, PHOTOMASK CREATING METH...

DEVELOPMENT STRATEGY FOR HIGH-ABSORBING METAL-CONTAINING PHOTORESISTS

PROCESS WINDOW OPTIMIZER

OVERLAY METROLOGY TARGET FOR DIE-TO-WAFER OVERLAY METROLOGY

METHOD OF REDUCING CYCLIC ERROR EFFECTS IN A LITHOGRAPHIC PROCESS,...

LITHOGRAPHIC PERFORMANCE QUALIFICATION AND ASSOCIATED APPARATUSES

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES

METHOD OF PREDICTING EUV DOSE, METHOD OF DESIGNING PAG USING THE SA...

SUBSTRATE PROCESSING METHOD, COMPUTER RECORDING MEDIUM, SUBSTRATE P...

METROLOGY TARGET DESIGN FOR TILTED DEVICE DESIGNS

ARRANGEMENT, METHOD AND COMPUTER PROGRAM PRODUCT FOR CALIBRATING FA...

SYSTEMS AND METHODS FOR OPTIMIZING LITHOGRAPHIC DESIGN VARIABLES US...

METHOD FOR IMAGING A MASK LAYER AND ASSOCIATED IMAGING SYSTEM

DETERMINING AN ETCH EFFECT BASED ON AN ETCH BIAS DIRECTION

SYSTEMS AND METHODS FOR REDUCING PATTERN SHIFT IN A LITHOGRAPHIC AP...

IMAGE STABILIZATION FOR DIGITAL LITHOGRAPHY

METHODS AND SYSTEMS TO CALIBRATE RETICLE THERMAL EFFECTS

SYSTEMS AND METHODS FOR LITHOGRAPHIC TOOLS WITH INCREASED TOLERANCES

EDGE EXPOSURE APPARATUS AND EDGE EXPOSURE METHOD

SPECTRAL FEATURE CONTROL APPARATUS

METROLOGY IN THE PRESENCE OF CMOS UNDER ARRAY (CUA) STRUCTURES UTIL...

SOURCE SEPARATION FROM METROLOGY DATA

EXPOSURE APPARATUS, CONTROL METHOD, AND METHOD OF MANUFACTURING ART...

METHOD FOR OPTIMIZING LAYOUT PATTERN AND SEMICONDUCTOR WAFER

METHOD OF PRODUCING MASK DATA FOR SEMICONDUCTOR DEVICE MANUFACTURING

OPTICAL DEVICE, METHOD FOR MEASURING AN ACTUAL TILT OF AN OPTICAL S...

INSPECTION APPARATUS, POLARIZATION-MAINTAINING ROTATABLE BEAM DISPL...

Determination of Imaging Transfer Function of a Charged-Particle Ex...

PATTERN SHAPE MEASUREMENT METHOD, PATTERN SHAPE MEASUREMENT APPARAT...

LASER APPARATUS AND METHOD FOR MANUFACTURING ELECTRONIC DEVICES