Claims
- 1. A method of producing P.sub.4 gas as a controlled source for use in a vacuum deposition process including the steps of heating MP.sub.15, where M is a alkali metal, to a temperature between 300.degree. C-550.degree. C. at a pressure less than 10.sup.-3 Torr, to produce P.sub.4 gas having a substantially constant vapor pressure, and supplying said P.sub.4 gas as a controlled vapor source in a vacuum deposition process.
- 2. The process of claim 1 wherein said alkali metal is potassium.
- 3. The process of claim 1 wherein said MP.sub.15 is produced by a liquid phase growth process.
- 4. The process of claim 1 wherein said vacuum is greater than 10.sup.-4 Torr.
- 5. The process of claim 1, 2, or 3 wherein said process is a molecular beam deposition process.
- 6. The process of claim 5 wherein said heating step is carried out at a temperature within the range of 300.degree. C. to 400.degree. C., inclusive.
- 7. The process of claim 1 wherein said heating step is carried out at a temperature within the range of 350.degree. C. to 550.degree. C., inclusive.
- 8. The process of claim 1, 2, or 3 wherein said heating step is accomplished by thermally heating said MP.sub.15.
- 9. The process of claim 1 wherein said MP.sub.15 is produced by a condensed phase process.
- 10. A process of using MP.sub.15 as a controlled source of P.sub.4 gas comprising the step of heating MP.sub.15 where M is an alkali metal, to a temperature between 300.degree. C.-550.degree. C. at a pressure less than 10.sup.-3 Torr, to release P.sub.4 gas having a substantially constant vapor pressure to provide a controlled source of said released P.sub.4 gas.
RELATED APPLICATIONS
This application is a continuation-in-part of the below-identified co-pending U.S. patent applications, Ser. Nos. 335,706, 419,537, 442,208, 509,159, 581,139, 509,157, 509,210, 509,158, 581,115, 581,102, 581,105, 581,101, 581,104.
This application is related to the following co-pending applications, assigned to the same assignee as this application. These applications are incorporated herein by reference. U.S. patent application entitled CATENATED PHOSPHORUS MATERIALS, THEIR PREPARATION AND USES, AND SEMICONDUCTOR AND OTHER DEVICES EMPLOYING THEM, Ser. No. 442,208, filed Nov. 16, 1982, now U.S. Pat. No. 4,508,931 which was a continuation-in-part of our co-pending applications entitled CATENATED SEMICONDUCTOR MATERIALS OF PHOSPHORUS, METHODS AND APPARATUS FOR PREPARING AND DEVICES USING THEM, Ser. No. 335,706, filed Dec. 30, 1981, now abandoned; and MONOCLINIC PHOSPHORUS FORMED FROM VAPOR IN THE PRESENCE OF AN ALKALI METAL, Ser. No. 419,537, filed Sept. 17, 1982, now U.S. Pat. No. 4,620,968 which was a continuation-in-part of Ser. No. 335,706, now abandoned; VACUUM EVAPORATED FILMS OF CATENATED PHOSPHORUS MATERIAL, Ser. No. 509,159, filed June 29, 1983 now U.S. Pat. No. 4,596,721; THERMAL CRACKERS FOR FORMING PNICTIDE FILMS IN HIGH VACUUM PROCESSES, Ser. No. 581,139, filed Feb. 17, 1984, which is a continuation-in-part of Ser. No. 509,159 now U.S. Pat. No. 4,596,721; GRAPHITE INTERCALATED ALKALI METAL VAPOR SOURCES, Ser. No. 509,157, filed June 29, 1983, now abandoned; SPUTTERED SEMICONDUCTOR FILMS OF CATENATED PHOSPHORUS MATERIAL AND DEVICES FORMED THEREFROM, Ser. No. 509,175, filed June 29, 1983, now U.S. Pat. No. 4,509,066; MIS DEVICES EMPLOYING ELEMENTAL PNICTIDE OR POLYPHOSPHIDE INSULATING LAYERS, Ser. No. 509,210, filed June 29, 1983, now U.S. Pat. No. 4,567,503; LIQUID PHASE GROWTH OF CRYSTALLINE POLYPHOSPHIDE, Ser. No. 509,158, filed June 29, 1983; now U.S. Pat. No. 4,591,408 PASSIVATION AND INSULATION OF III-V DEVICES WITH PNICTIDES, PARTICULARLY AMORPHOUS PNICTIDES HAVING A LAYER-LIKE STRUCTURE; Ser. No. 581,115, filed Feb. 17, 1984; THIN FILM FIELD EFFECT TRANSISTORS UTILIZING A POLYPNICTIDE SEMICONDUCTOR, Ser. No. 619,053, filed June 11, 1984, now U.S. Pat. No. 4,558,340; PNCTIDE BARRIERS IN QUANTUM WELL DEVICES, Ser. No. 581,140, filed Feb. 17, 1984, now abandoned; PHOSPHORUS AND HIGH PHOSPHORUS POLYPHOSPHIDE BARRIERS IN QUANTUM WELL DEVICES, Ser. No. 695,268, filed Jan. 28, 1985, which is a Continuation-in-Part of Ser. No. 581,140, now abandoned; USE OF PNICTIDE FILMS FOR WAVE-GUIDING IN OPTO-ELECTRONIC DEVICES, Ser. No. 581,171, filed Feb. 17, 1984, now abandoned; PNICTIDE FILMS FOR WAVE-GUIDING IN OPTO-ELECTRONIC DEVICES, Ser. No. 695,255, filed Jan. 28, 1985, which is a continuation-in-part of Ser. No. 581,171, now abandoned; VACUUM DEPOSITION PROCESSES EMPLOYING A CONTINUOUS PNICTIDE DELIVERY SYSTEM, PARTICULARLY SPUTTERING, Ser. No. 581,103, filed Feb. 17, 1984; CONTINUOUS PNICTIDE SOURCE AND DELIVERY SYSTEM FOR FILM DEPOSITION, PARTICULARLY BY CHEMICAL VAPOR DEPOSITION, Ser. No. 581,102, filed Feb. 17, 1984; METHOD OF PREPARING HIGH PURITY WHITE PHOSPHORUS, Ser. No. 581,105, filed Feb. 17, 1984 now U.S. Pat. No. 4,618,345 PNICTIDE TRAP FOR VACUUM SYSTEMS, Ser. No. 581,101, filed Feb. 17, 1984; now U.S. Pat. No. 4,613,485 and HIGH VACUUM DEPOSITION PROCESSES EMPLOYING A CONTINUOUS PNICTIDE DELIVERY SYSTEM, Ser. No. 581,104, filed Feb. 17, 1984.
US Referenced Citations (3)
Related Publications (12)
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Date |
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419537 |
Sep 1982 |
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442208 |
Nov 1982 |
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509159 |
Jun 1983 |
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581139 |
Feb 1984 |
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509157 |
Jun 1983 |
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509158 |
Jun 1983 |
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509210 |
Jun 1983 |
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581115 |
Feb 1984 |
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581102 |
Feb 1984 |
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581105 |
Feb 1984 |
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581104 |
Feb 1984 |
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419537 |
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Divisions (1)
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Number |
Date |
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Parent |
581101 |
Feb 1984 |
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Continuation in Parts (4)
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Number |
Date |
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Parent |
335706 |
Dec 1981 |
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Parent |
335706 |
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Parent |
335706 |
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Parent |
509159 |
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