Number | Date | Country | Kind |
---|---|---|---|
4-321023 | Nov 1992 | JPX |
This application is a continuation of application(s) Ser. No. 08/157,938 filed on Nov. 24, 1993 now abandoned.
Number | Name | Date | Kind |
---|---|---|---|
T101302 | Forget et al. | Dec 1981 | |
4383885 | Maydau et al. | May 1983 | |
4436581 | Okudaira et al. | Mar 1984 | |
4490209 | Hartman | Dec 1984 | |
4789426 | Pipkin | Dec 1988 | |
4799991 | Dockrey | Jan 1989 | |
4992134 | Gupta et al. | Feb 1991 | |
5384009 | Mak et al. | Jan 1995 | |
5650342 | Satoh et al. | Jul 1997 |
Number | Date | Country |
---|---|---|
3-270223 | Dec 1991 | JPX |
WO 9206505 | Apr 1992 | WOX |
Entry |
---|
Wolf, Silicon Processing for the VLSI Era, vol. 1, Lattice Press, (1986) pp. 546-549, 556, 557. |
Baldi et al., Journal of Applied Physics, No. 6, "Effects of doping on polysilicon etch rate in a fluorine-containing plasma", pp. 2221-2225 (1985). |
Haller et al., Journal of the Electrochemical Society, No. 8, "Selective Wet and Dry Etching of Hydrogenated Amorphous Silicon and Related Materials", pp. 2042-2045 (1988). |
Mogab et al., Americal Vacuum Society, 17:3, "Anisotropic plasma etching of polysilicon", pp. 721-730 (1980). |
Number | Date | Country | |
---|---|---|---|
Parent | 157938 | Nov 1993 |