Number | Name | Date | Kind |
---|---|---|---|
4354896 | Hunter et al. | Oct 1982 | |
4656732 | Teng et al. | Apr 1987 | |
4792534 | Tsuji et al. | Dec 1988 | |
4801350 | Mattox et al. | Jan 1989 | |
4912061 | Nasr | Mar 1990 | |
4962414 | Liou et al. | Oct 1990 | |
5117273 | Stark et al. | May 1992 | |
5175127 | Manning | Dec 1992 | |
5206187 | Doan et al. | Apr 1993 | |
5229326 | Dennison et al. | Jul 1993 | |
5252517 | Blalock et al. | Oct 1993 | |
5292677 | Dennison | Mar 1994 | |
5300807 | Nelson | Apr 1994 | |
5362666 | Dennison | Nov 1994 | |
5411909 | Manning et al. | May 1995 | |
5439846 | Nguyen et al. | Aug 1995 | |
5488011 | Figura et al. | Jan 1996 | |
5498570 | Becker | Mar 1996 | |
5605864 | Prall | Feb 1997 | |
5688720 | Hayashi | Nov 1997 | |
5724282 | Loughmiller, D. R., et al. | Mar 1998 | |
5863837 | Sudo | Jan 1999 | |
5872740 | Loughmiller, D.R., et al. | Feb 1999 | |
5914279 | Yang et al. | Jun 1999 |
Number | Date | Country |
---|---|---|
0111706 | Mar 1987 | EPX |
0265638 | May 1988 | EPX |
0491408 | Jun 1992 | EPX |
Entry |
---|
"Method to Produce Sizesin Openings in Photo Images Smaller than Lithographic Minimum Size", IBM Technical Disclosure Bulletin, 29, 1328, (Aug. 1986). |
"Methods of Forming Small Contact Holes", IBM Technical Disclosure Bulletin, 30, 252, (Jan. 1988). |
Fukase, T., et al., "A Margin-Free Contact Process Using An Al.sub.2 O.sub.3 Etch-Stop Layer for High Density Devices", International Electron Devices Meeting: Technical Digest, 837-840, (1992). |
Lau, C., et al., "A Super Self-Aligned Source/Drain MOSFET", International Electron Devices Meeting: Technical Digest, 358-361, (1987). |
Singer, P., "A New Technology for Oxide Contact and Via Etch", Semiconductor International, 36, (Aug. 1993). |