Claims
- 1. A semiconductor assembly comprising,
- a substrate, a semiconductor chip having first and second surfaces, said chip having solder terminals on said first surface bonded to said substrate, a heat transfer element disposed closely adjacent to said second surface of said chip, a means to urge said transfer element into contact with said second surface, and a thin layer of heat conductive, non-eutectic metal alloy having a solidus temperature that is only slightly above the operating temperature range of said chip disposed between said heat transfer element and said chip, said material providing a highly thermally conductive heat transfer path between said chip and said heat transfer element, and having the ability to re-establish a low thermal resistance heat conductive path in the event that intimate contact between said material and said chip and/or said heat transfer element is disrupted by the reforming of the material when increased thermal resistance causes the chip temperature to exceed the solidus temperature of the material, and having the ability to remain in position between said chip and said heat transfer element.
- 2. A semiconductor assembly as in claim 1, wherein said heat transfer element is a spring type piston for providing a load force to said layer of conductive, non-eutectic metal alloy to increase the contact between said piston and said chip.
- 3. A semiconductor assembly as in claim 1, including solder ball connections for bonding said chip to said substrate.
- 4. A semiconductor assembly as in claim 2, including a hat for providing a cover for said assembly and for diffusing heat.
- 5. A semiconductor assembly as in claim 4, including a diagonal spring type piston for providing a load force to said heat transfer element to increase the contact between said element and said transfer chip and said hat.
- 6. A semiconductor assembly as in claim 5, wherein the piston is of a high thermal conductivity material.
- 7. A semiconductor assembly as in claim 4, wherein the thermal resistance between said hat and said heat transfer element is in the range of 0.01.degree.-0.02.degree. C. per watt for a contact load of 100 grams.
- 8. A semiconductor assembly as in claim 1, wherein the thermal resistance between said chip and said heat transfer element is in the range of 0.1.degree.-0.2.degree. C. per watt for a contact load of 100 grams.
- 9. A semiconductor assembly as in claim 1, wherein said noneutectic alloy is formed with bismuth.
- 10. A semiconductor assembly as in claim 1, wherein said alloy is made of 51.45% bismuth; 31.35% lead; 15.20% tin and 2.0% indium by weight.
- 11. A semiconductor assembly as in claim 1, wherein said alloy is made of 48.35% bismuth; 28.15% lead; 14.50% tin and 9.0% antimony by weight.
- 12. A semiconductor assembly as in claim 1, wherein the thickness of said alloy layer is about 2 mils.
Parent Case Info
This application is a continuation of Ser. No. 364,722 filed 3/16/82.
US Referenced Citations (3)
Foreign Referenced Citations (1)
Number |
Date |
Country |
52-28270 |
Mar 1977 |
JPX |
Continuations (2)
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Number |
Date |
Country |
Parent |
364722 |
Mar 1982 |
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Parent |
364722 |
Mar 1982 |
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