Claims
- 1. A semiconductor manufacturing apparatus comprising:
a processing apparatus main body which continuously executes a plurality of processes related to manufacturing of a semiconductor device in a single chamber; an apparatus controller unit which selects a type of process in the processing apparatus main body and supplies a start signal to start a process and a stop signal to stop the process to the processing apparatus main body; a first terminal to output internal information of the processing apparatus main body to an outside; a second terminal to output the start signal from the apparatus controller section to the outside; and a third terminal to receive the start signal from the second terminal and input to the apparatus controller unit the stop signal based on a result obtained by calculating the process state for the current process on the basis of the internal information of the apparatus, wherein the apparatus controller unit sends the stop signal to the processing apparatus main body upon receiving the stop signal through the third terminal, stops the current process in the processing apparatus main body, and switches to the next process.
- 2. A semiconductor manufacturing apparatus according to claim 1, wherein an external computer is connected to the apparatus controller unit, the external computer having a function of calculating process states for said plurality of processes on the basis of the internal information of the apparatus through the first terminal, starting calculating the process state for the current process in accordance with the start signal through the second terminal, and sending the stop signal to the third terminal when the process state for the current process reaches a specified state.
- 3. A semiconductor manufacturing apparatus according to claim 2, wherein the external computer has a function to judge using the internal information of the apparatus which process state should be calculated.
- 4. A semiconductor manufacturing apparatus according to claim 2, wherein the external computer receives external information of the apparatus together with the internal information of the apparatus and calculates the process state using the pieces of information.
- 5. A semiconductor manufacturing apparatus according to claim 4, wherein the internal information of the apparatus received by the external computer contains a temperature, pressure, and gas flow rate, and the external information of the apparatus received by the external computer contains an atmospheric pressure.
- 6. A semiconductor manufacturing apparatus according to claim 1, wherein the processing apparatus main body has a heating mechanism.
- 7. A semiconductor manufacturing apparatus according to claim 1, wherein the processing apparatus main body continuously executes at least two processes of oxidation, CVD, and diffusion.
- 8. A semiconductor manufacturing apparatus comprising:
a processing apparatus main body which continuously executes a plurality of processes related to manufacturing of a semiconductor device in a single chamber; an apparatus controller unit which selects a type of process in the processing apparatus main body and supplies a start signal to start a process and a stop signal to stop the process to the processing apparatus main body; and a process controller unit which has a function of calculating process states for said plurality of processes on the basis of internal information of the processing apparatus main body, starts calculating the process state for the current process at a timing when the start signal is sent from the apparatus controller unit, and sends the stop signal to the apparatus controller unit when the process state reaches a specified state, wherein the apparatus controller unit sends the stop signal to the processing apparatus main body upon receiving the stop signal from the process controller unit, stops the current process by the processing apparatus main body, and switches to the next process.
- 9. A semiconductor manufacturing apparatus according to claim 8, wherein the process controller unit has a function to judge using the internal information of the apparatus which process state should be calculated.
- 10. A semiconductor manufacturing apparatus according to claim 8, wherein the process controller unit receives external information of the apparatus together with the internal information of the apparatus and calculates the process state using the pieces of information.
- 11. A semiconductor manufacturing apparatus according to claim 10, wherein the internal information of the apparatus received by the process controller unit contains a temperature, pressure, gas flow rate, and the external information of the apparatus received by the process controller unit contains an atmospheric pressure.
- 12. A semiconductor manufacturing apparatus according to claim 8, wherein the processing apparatus main body has a heating mechanism.
- 13. A semiconductor manufacturing apparatus according to claim 8, wherein the processing apparatus main body continuously executes at least two processes of oxidation, CVD, and diffusion.
- 14. A semiconductor device manufacturing method of executing a predetermined process for a substrate to be processed using a semiconductor manufacturing apparatus comprising a processing apparatus main body which continuously executes a plurality of processes related to manufacturing of a semiconductor device in a single chamber, an apparatus controller unit which selects a type of process in the processing apparatus main body and controls a start and stop of the process, and a process controller unit which has a function of calculating process states for said plurality of processes on the basis of internal information of the processing apparatus main body, said method comprising:
while the substrate to be processed is set in the processing apparatus main body, causing the apparatus controller unit to start the predetermined process, causing the process controller unit to start calculating a process state for the current process, and when it is judged on the basis of a calculation result that the process state reaches a specified state, causing the apparatus controller unit to stop the current process and switch to the next process.
- 15. A semiconductor device manufacturing method according to claim 14, wherein the process controller unit has a function of determining using the internal information of the apparatus which process state should be calculated.
- 16. A semiconductor device manufacturing method according to claim 14, wherein the process controller unit receives external information of the apparatus together with the internal information of the apparatus and calculates the process state using the pieces of information.
- 17. A semiconductor device manufacturing method according to claim 16, wherein the internal information of the apparatus received by the external computer contains a temperature, pressure, and gas flow rate, and the external information of the apparatus received by the external computer contains an atmospheric pressure.
- 18. A semiconductor device manufacturing method according to claim 14, wherein the processing apparatus main body has a heating mechanism.
- 19. A semiconductor manufacturing apparatus according to claim 14, wherein the processing apparatus main body continuously executes at least two processes of oxidation, CVD, and diffusion.
Priority Claims (1)
Number |
Date |
Country |
Kind |
2001-313918 |
Oct 2001 |
JP |
|
CROSS-REFERENCE TO RELATED APPLICATIONS
[0001] This is a Continuation Application of PCT Application No. PCT/JP02/10436, filed Oct. 8, 2002, which was not published under PCT Article 21(2) in English.
[0002] This application is based upon and claims the benefit of priority from the prior Japanese Patent Application No. 2001-313918, filed Oct. 11, 2001, the entire contents of which are incorporated herein by reference.
Continuations (1)
|
Number |
Date |
Country |
Parent |
PCT/JP02/10436 |
Oct 2002 |
US |
Child |
10457353 |
Jun 2003 |
US |