Claims
- 1. An absorbing spin-on-glass composition comprising a siloxane polymer and an incorporatable organic absorbing compound that strongly absorbs light over at least an approximately 10 nm wide wavelength range, the range at wavelengths less than about 375 nm.
- 2. The composition of claim 1 wherein the range is at wavelengths less than about 260 nm.
- 3. The composition of claim 1 wherein the organic absorbing compound comprises from one to three benzene rings and a reactive group selected from the group consisting of hydroxyl groups, amine groups, carboxylic acid groups, and substituted silyl groups with silicon bonded to at least one substituent selected from the group consisting of alkoxy groups and halogen atoms.
- 4. The composition of claim 3 wherein the organic absorbing compound comprises a reactive group selected from the group consisting of siliconethoxy, silicondiethoxy, silicontriethoxy, siliconmethoxy, silicondimethoxy, silicontrimethoxy, chlorosilyl, dichlorosilyl, and trichlorosilyl groups.
- 5. The composition of claim 3 wherein the organic absorbing compound comprises a silicontriethoxy reactive group.
- 6. The composition of claim 3 wherein the reactive group is directly bonded to a benzene ring.
- 7. The composition of claim 3 wherein the reactive group is attached to a benzene ring through a hydrocarbon bridge.
- 8. The composition of claim 3 wherein the organic absorbing compound further comprises an azo group.
- 9. The composition of claim 8 wherein the organic absorbing compound comprises an absorbing compound selected from the group consisting of anthraflavic acid, 9-anthracene carboxylic acid, 9-anthracene methanol, alizarin, quinizarin, primuline, 2-hydroxy-4(3-triethoxysilylpropoxy-diphenylketone, rosolic acid, triethoxysilylpropyl-1,8-naphthalimide, 9-anthracene carboxy-methyl triethoxysilane, phenyltriethoxysilane, 4-phenylazophenol, and mixtures thereof.
- 10. The composition of claim 3 wherein the organic absorbing compound comprises an absorbing compound selected from the group consisting of 9-anthracene methanol, alizarin, quinizarin, 2-hydroxy-4(3-triethoxysilylpropoxy)-diphenylketone, rosolic acid, 9-anthracene carboxy-methyl triethoxysilane, phenyltriethoxysilane, and mixtures thereof.
- 11. The composition of claim 10 wherein the organic absorbing compound comprises 9-anthracene carboxy-methyl triethoxysilane.
- 12. The composition of claim 10 wherein the organic absorbing compound comprises phenyltriethoxysilane.
- 13. The composition of claim 1 wherein the siloxane polymer is a polymer selected from the group consisting of methylsiloxane, methylsilsesquioxane, phenylsiloxane, phenylsilsesquioxane, methylphenylsiloxane, methylphenylsilsesquioxane, and silicate polymers.
- 14. The composition of claim 11 wherein the siloxane polymer is a polymer selected from the group consisting of methylsiloxane, methylsilsesquioxane, phenylsiloxane, phenylsilsesquioxane, methylphenylsiloxane, methylphenylsilsesquioxane, and silicate polymers.
- 15. The composition of claim 1 wherein the siloxane polymer is a polymer selected from the group consisting of hydrogensiloxane, hydrogensilsesquioxane, organohydridosiloxane, and organhydridosilsesquioxane polymers; and copolymers of hydrogensilsesquioxane and an alkoxyhydridosiloxane or hydroxyhydridosiloxane.
- 16. The composition of claim 15 wherein the siloxane polymer is a polymer of a general formula selected from the group consisting of (H0-1.0SiO1.5-2.0)x, where x is greater than about 8, and (H0-1.0SiO1.5-2.0)n(R0-1.0SiO1.5-2.0)m, where m is greater than 0, the sum of n and m is from about 8 to about 5000 and R is a C1-C20 alkyl group or a C6-C12 aryl group.
- 17. A coating solution comprising the absorbing spin-on-glass composition of claim 1 and a solvent or a solvent mixture.
- 18. The coating solution of claim 17 wherein the solution is between about 0.5% and about 20% by weight absorbing spin-on-glass composition.
- 19. The coating solution of claim 18 wherein the solvent is selected from the group consisting of ethyl lactate and propylene glycol propyl ether.
- 20. A film comprising an absorbing spin-on-glass composition, the composition comprising a siloxane polymer and an incorporatable organic absorbing compound that strongly absorbs light over at least an approximately 10 nm wide wavelength range, the range at wavelengths less than about 375 nm.
- 21. The film of claim 20 wherein the range is at wavelengths less than about 260 nm.
- 22. The film of claim 20 wherein the organic absorbing compound comprises from one to three benzene rings and a reactive group selected from the group consisting of hydroxyl groups, amine groups, carboxylic acid groups, and substituted silyl groups with silicon bonded to at least one substituent selected from the group consisting of alkoxy groups and halogen atoms.
- 23. An integrated circuit device comprising an absorbing spin-on-glass composition, the composition comprising a siloxane polymer and an incorporatable organic absorbing compound that strongly absorbs light over at least an approximately 10 nm wide wavelength range, the range at wavelengths less than about 375 nm.
- 24. The device of claim 23 wherein the range is at wavelengths less than about 260 nm.
- 25. The device of claim 23 wherein the organic absorbing compound comprises from one to three benzene rings and a reactive group selected from the group consisting of hydroxyl groups, amine groups, carboxylic acid groups, and substituted silyl groups with silicon bonded to at least one substituent selected from the group consisting of alkoxy groups and halogen atoms.
- 26. A method of making an absorbing spin-on-glass composition comprising:
combining one or more silane reactants selected from the group consisting of alkoxysilanes and halosilanes, one or more incorporatable organic absorbing compounds, an acid/water mixture, and one or more solvents to form a reaction mixture; and refluxing the reaction mixture to form the absorbing spin-on-glass composition.
- 27. The method of claim 26 wherein the one or more organic absorbing compound comprises from one to three benzene rings and a reactive group selected from the group consisting of hydroxyl groups, amine groups, carboxylic acid groups, and substituted silyl groups with silicon bonded to at least one substituent selected from the group consisting of alkoxy groups and halogen atoms.
- 28. The method of claim 27 wherein the one or more organic absorbing compound further comprises an azo group.
- 29. The method of claim 28 wherein the one or more organic absorbing compound comprises an absorbing compound selected from the group consisting of anthraflavic acid, 9-anthracene carboxylic acid, 9-anthracene methanol, alizarin, quinizarin, primuline, 2-hydroxy-4(3-triethoxysilylpropoxy)diphenylketone, rosolic acid, triethoxysilylpropyl-1,8-naphthalimide, 9-anthracene carboxy-methyl triethoxysilane, phenyltriethoxysilane, 4-phenylazophenol, and mixtures thereof.
- 30. The method of claim 26 wherein the one or more silane reactants are selected from the group consisting of triethoxysilane, tetraethoxysilane, methyltriethoxysilane, dimethyldiethoxysilane, tetramethoxysilane, methyltrimethoxysilane, trimethoxysilane, dimethyldimethoxysilane, phenyltriethoxysilane, phenyltrimethoxysilane, diphenyldiethoxysilane, and diphenyldimethoxysilane, trichlorosilane, methyltrichlorosilane, ethyltrichlorosilane, phenyltrichlorosilane, tetrachlorosilane, chlorotriethoxysilane, chlorotrimethoxysilane, chloromethyltriethoxysilane, chloroethyltriethoxysilane, chlorophenyltriethoxysilane, chloromethyltrimethoxysilane, chloroethyltrimethoxysilane, and chlorophenyltrimethoxysilane.
- 31. The method of claim 30 wherein the one or more silane reactants are tetraethoxysilane and methyltriethoxysilane.
- 32. The method of claim 26 wherein the acid/water mixture is a nitric acid/water mixture.
- 33. A method of making an absorbing spin-on-glass composition comprising:
combining one or more alkoxysilanes, or, one or more halosilanes; one or more incorporatable organic absorbing compounds; and one or more solvents to form a first reaction mixture; refluxing the first reaction mixture; adding an acid/water mixture to the first reaction mixture to form a second reaction mixture. refluxing the second reaction mixture to form the absorbing spin-on-glass composition.
- 34. A method of making a coating solution containing an absorbing spin-on-glass polymer comprising:
combining one or more alkoxysilanes, or, one or more halosilanes; one or more incorporatable organic absorbing compounds; an acid/water mixture; and one or more solvents to form a reaction mixture; and refluxing the reaction mixture to form an absorbing spin-on-glass polymer;
- 35. The method of claim 34 further comprising adding one or more dilutant solvents to the absorbing spin-on-glass composition to produce a coating solution.
- 36. The method of claim 35 wherein the coating solution is between about 0.5% and about 20% absorbing spin-on-glass polymer.
- 37. A method of making an absorbing spin-on-glass composition comprising:
combining a polar solvent, a non-polar solvent and a phase transfer catalyst to form a first reaction mixture; adding an organotrihalosilane, a hydridohalosilane, and one or more incorporatable organic absorbing compounds to the first reaction mixture to form a second reaction mixture; and allowing the second reaction mixture to react to form the absorbing spin-on-glass composition.
- 38. An organic absorbing compound comprising the chemical composition 9-anthracene carboxy-methyl triethoxysilane.
- 39. A process of making 9-anthracene carboxy-methyl triethoxysilane comprising:
combining 9-anthracene carboxylic acid, chloromethyltriethoxysilane, triethylamine, and a solvent to form a reaction mixture; refluxing the reaction mixture; cooling the refluxed reaction mixture to form a precipitate and a remaining solution; and filtering the remaining solution to produce liquid 9-anthracene carboxy-methyl triethoxysilane.
- 40. The process of claim 39 wherein filtering the remaining solution comprises:
roto-evaporating the remaining solution; passing the roto-evaporated solution through a silica gel column; and roto-evaporating the solution passed through the silica gel column.
CROSS REFERENCE TO RELATED APPLICATION
[0001] This application is a continuation-in-part of U.S. patent application Ser. No. 09/330,248, filed Jun. 10, 1999.
Divisions (1)
|
Number |
Date |
Country |
Parent |
09491166 |
Jan 2000 |
US |
Child |
10300357 |
Nov 2002 |
US |
Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
09330248 |
Jun 1999 |
US |
Child |
09491166 |
Jan 2000 |
US |