The invention relates to the processing of integrated circuit (IC) units and in particular methods and apparatus to assist in the sputtering of ball grid array (BGA) IC units.
Sputtering to deposit thin films of materials on IC units is an efficient method of applying materials having very high melting points. Thus, sputtering has become widely used given its flexibility for the materials to be applied.
Typically, an array of IC units are placed upon a substrate and passed through a sputtering chamber to receive the thin material layer.
In so doing, the IC units are supported by a stencil adhesively bonded to a ring with double-sided tape. The double-sided tape is laser cut, with the IC units fitting within apertures created by said laser cut. The stencil with the IC units is then offloaded and sent for sputtering. The units are subsequently ejected and offloaded from the system.
The use of stencils, however, is uneconomic in that they are expensive to manufacture and difficult to recycle following the sputtering step. Consequently, some prior art systems omit the stencil with the IC units placed directly on the tape. The difficulty in using tape without a stencil support is the flexibility of the tape tending to misalign the units as well as lacking sufficient support during transport.
In a first aspect the invention provides a process for sputtering a plurality of IC units, the process comprising the steps of: applying a layer to a holding ring; cutting an array of apertures in the layer; transferring the holding ring to a template positioned within a sputtering station; aligning said array of apertures with an array of recesses in said template; delivering IC units to said holding ring, each IC unit corresponding to an aligned aperture and recess, and then; applying a sputtering process to said IC units engaged with said holding ring.
In a second aspect the invention provides a placement station comprising: a template having an array of recesses; said template arranged to receive a holding ring having an array of apertures; said apertures and recesses arranged to align so as to receive a plurality of IC units for sputtering.
Therefore with the invention providing a template mounted or unitarily positioned within the sputtering table, structural support for the IC units during sputtering is maintained without the additional cost of manufacturing single use stencils.
The IC units may be engaged with a layer bonded to a holding ring, and sputtered whilst on said layer.
It will be convenient to further describe the present invention with respect to the accompanying drawings that illustrate possible arrangements of the invention. Other arrangements of the invention are possible and consequently, the particularity of the accompanying drawings is not to be understood as superseding the generality of the preceding description of the invention.
The invention therefore provides a reusable template having an array of apertures corresponding to IC units. The process begins with the units being inspected, flipped, aligned and oriented. The inspection, alignment and orientation step include conducting a top vision inspection then moving the units to a flipper and subsequently a picker for aligning the units. By having the template fixed to the sputtering table, IC units are delivered directly to the sputtering table to position on a laser cut tape, bonded to a holding ring, which in turn is placed on the template. Following the sputtering process, the units are ejected, aligned and further inspected before being offloaded.
It will be appreciated that a layer having a peripheral adhesive portion sufficient to stick to the holding ring 10 may also be used such that the sub-tape 20 is not required. A peripheral section 17 as shown in
Number | Date | Country | Kind |
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10201901908X | Mar 2019 | SG | national |
Number | Name | Date | Kind |
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20170162412 | Baek | Jun 2017 | A1 |
Number | Date | Country |
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WO-2016013981 | Jan 2016 | WO |
Number | Date | Country | |
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20200286771 A1 | Sep 2020 | US |