Claims
- 1. A surface treatment method for enhancing hydrophobicity of a surface of a film support, the method comprising subjecting at least one side of the surface of said film support to a gas-discharge plasma treatment in a gas phase atmosphere comprising (a) an insert gas comprising argon or helium and (b) a reactive gas comprising a hydrocarbon gas or fluorinated hydrocarbon gas, and wherein the gas phase atmosphere contains not more than 750 ppm of oxygen.
- 2. The method of claim 1, wherein the oxygen is not more than 600 ppm.
- 3. The method of claim 2, wherein the oxygen is not more than 200 ppm.
- 4. A surface treatment method for enhancing hydrophobicity of a surface of a film support, the method comprising subjecting at least one side of the surface of said film support to a gas-discharge plasma treatment in a gas phase atmosphere comprising (a) an inert gas comprising argon or helium and (b) a reactive gas comprising a hydrocarbon gas or fluorinated hydrocarbon gas, and wherein the hydrocarbon is at least one of the group consisting of a saturated hydrocarbon represented by formula CnH2n+2 and unsaturated hydrocarbon represented by formula CnH2n or CnH2n−2, in which n is an integer of 1 to 12.
- 5. A surface treatment method for enhancing hydrophobicity of a surface of a film support, the method comprising subjecting at least one side of the surface of said film support to a gas-discharge plasma treatment in a gas phase atmosphere comprising (a) an inert gas comprising argon or helium and (b) a reactive gas comprising a hydrocarbon gas or fluorinated hydrocarbon gas, and wherein the fluorinated hydrocarbon is at least one of the group consisting of CH3F, C2H5F, C3H7F, C4H9F, C5H11F, and C6H13F.
- 6. A method for forming a silver halide photothermographic material having at least an image forming layer on a film support comprising the steps of:(i) subjecting at least one side of a surface of the film support to a gas-discharge plasma treatment in a gas phase atmosphere comprising (a) an inert gas comprising argon or helium and (b) a reactive gas comprising a hydrocarbon gas or fluorinated hydrocarbon gas and (ii) coating at least said image forming therein a layer on the side subjected to the gas-discharge plasma treatment.
- 7. The method of claim 6, wherein the inert gas is accounted for by argon of not less than 50% by pressure or by helium of less than 40% by pressure.
- 8. The method of claim 6, wherein the inert gas comprises argon.
- 9. The method of claim 6, wherein the gas phase atmosphere is in the vicinity of atmospheric pressure.
- 10. The method of claim 6, wherein the film support is subjected to the plasma treatment, while the film support is continuously transported.
- 11. The method of claim 6, wherein the gas phase atmosphere contains not more than 750 ppm of oxygen.
- 12. The method of claim 11, wherein the oxygen is not more than 600 ppm.
- 13. The method of claim 12, wherein the oxygen is not more than 200 ppm.
- 14. The method of claim 6, wherein the hydrocarbon is at least one of the group consisting of a saturated hydrocarbon represented by formula CnH2n+2 and unsaturated hydrocarbon represented by formula CnH2n or CnH2n−2, in which n is an integer of 1 to 12.
- 15. The method of claim 6, wherein the fluorinated hydrocarbon is at least one of the group consisting of CH3F, C2H5F, C3H7F, C4H9F, C5H11F, and C6H13F.
Priority Claims (1)
Number |
Date |
Country |
Kind |
2000/066778 |
Mar 2000 |
JP |
|
Parent Case Info
This Application is a Divisional Application of U.S. patent application Ser. No. 09/800,376 filed Mar. 6, 2001, now U.S. Pat. No. 6,455,239.
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