U.S. patent application Ser. No. 09/442,061, Weverka et al., filed Nov. 16, 1999. |
T. Akiyama, et al.; “Controlled Stepwise Motion in Polysilicon Microstructures,” Journal of Microelectromechanical Systems, vol. 2, No. 3, Sep. 1993; pp. 106-110. |
C.M.A. Ashruf, et al., “Galvanic porous silicon formation without external contacts,” Sensors and Actuators 74 (1999) pp. 118-122. |
Kenneth Bean, et al., “Anisotropic Etching of Silicon,” IEEE Transactions on Electron Devices, vol. Ed-25, No. 10, Oct. 1978. |
Dino R. Ciarlo, “A latching accelerometer fabricated by the anisotropic etching of (110) oriented silicon wafers,” Lawrence Livermore Nat'l Laboratory, Mar. 1, 1992. |
A.S. Dewa, et al., “Development of a Silicon Two-Axis Micromirror for an Optical CrossConnect,” Solid State Sensors and Actuators Workshop, Hilton Head, South Carolina, pp. 93-96. |
Joseph Ford et al., “Wavelength Add Drop Switching Using Tilting Micromirrors,” Journal of Lightwave Technology, vol. 17, No. 5, May 1999. |
J. Grade et al., A Large-Deflection Electrostatic Actuator for Optical Switching Applications, Solid-State Sensor and Actuator Workshop, Hilton Head Island, South Carolina, Jun. 4-8, 2000; pp. 97-100. |
V. Kaajakari et al.; “Ultrasonic Actuation for MEMS Dormancy-Related Stiction Reduction,” In MEMS Reliability for Critical Applications, Proceedings of SAPIE vol. 4180 (2000); pp. 60-65. |
T.L. Koch et al., “Anisotropically etched deep gratings for InP/InGaAsP optical devices,” J.App. Phys. 62 (8), Oct. 15, 1987. |
I. Nishi et al., “Broad-Passband-Width Optical Filter for Multi-Demultiplexer Using a Diffraction Grating and a Retroreflector Prism,” Electronics Letters, vol. 21, No. 10, May 9th, 1985. |
P. Phillippe et al., “Wavelength demultiplexer: using echelette gratings on silicon substrate,” Applied Optics, vol. 24, No. 7, Apr. 1, 1985. |
M. Schilling et al., “Deformation-free overgrowth of reactive ion beam etched submicron structures in InP by liquid phase epitaxy,” Appl. Phys. Lett. 49 (12), Sep. 22, 1986. |
Z.J. Sun et al., Demultiplexer with 120 channels and 0.29-nm Channel Spacing, IEEE Photonics Technology Letters, vol. 10, No. 1, Jan. 1998. |
W. Tang, et al., “Electrostatically Balanced Comb Drive for Controlled Levitation,” Reprinted from Technical Digest IEEE Solid-State Sensor and Actuator Workshop, Jun. 1990; pp. 198-202. |
L. Torcheux et al., “Electrochemical Coupling Effects on the Corrosion of Silicon Samples in HF Solutions,” J. Electrochem.Soc., vol. 142, No. 6, Jun. 1995. |
P. VanKessel et al., “A MEMS-Based Projection Display,” Proceedings of the IEEE, vol. 86, No. 8, Aug. 1998; pp. 1687-1704. |
Microfabricated Silicon High Aspect Ratio Flexures for In-Plane Motion; dissertation by C. Keller, Fall 1998. |
Gimballed Electrostatic Microactuators with Embedded Interconnects; dissertation by L. Muller; Spring 2000. |
U.S. patent application Ser. No. 09/615,300, Fabiny et al., Jul. 13, 2000. |
U. U. Graf et al., Fabrication and Evaluation Of An Etched Infrared Diffraction Grating, Applied Optics, Jan. 1, 1994, vol. 33, No. 1, pp. 96-102. |
Robert E. Hopkins, Some Thoughts On Lens Mounting, Optical Engineering, Sep.-Oct. 1976, vol. 15, No. 5, pp. 428-430. |
Types and Characteristics of SDH Network Projection Architectures, International Telecommunication Union (ITU-T), Recommendation G.941 Oct., 1998, pp. 1-132. |
Luke D. Keller et al., Fabrication And Testing Of Chemically Micromachined Silicon Echelle Gratings, Applied Optics, Mar. 1, 2000, vol. 39, No. 7, pp. 1094-1105. |
Erwin G. Loewen et al., Diffraction Gratings and Applications, Marcel Dekker, Inc., New York—Basel, Chapter 4, pp. 132-136 and Chapter 8 pp. 300-301. |
Transducer Elements, Piezo Systems, Inc., Cambridge MA, Catalog #3, 1998, pp. 30-45. |
R. D. Rallison, White Paper on: Dense Wavelength Division Multiplexing (DWDM) and the Dickson Grating, Jan. 6, 2001, 9 pages. |
Mohammad Kazem Shams et al., Preferential Chemical Etching Of Blazed Gratings In (110)-Oriented GaAs, Optics Letters, Mar. 1979, vol. 4, No. 3, pges. 96-98. |
M. S. D. Smith et al., Diffraction Gratings Utilizing Total Internal Reflection Facets in Littrow Configuration, IEEE Photonics Technology Letters, Jan. 1, 1999, vol. 11, No. 1, pp. 84-86. |