Claims
- 1. A method of molding a semiconductor assembly comprising:
providing a transfer mold having an inner surface defining at least one mold cavity; providing an assembly including at least one semiconductor device attached face down to a carrier substrate with conductive structures providing an assembly gap therebetween; positioning said assembly in said at least one mold cavity of said transfer mold so that said carrier substrate abuts with a first inner surface of said transfer mold to provide an outer gap between a back surface of said at least one semiconductor device and an opposing second inner surface of said transfer mold; and introducing a flowable material onto at least one surface of said assembly to flow through said assembly gap and said outer gap in an upward, substantially vertical direction in said at least one mold cavity.
- 2. The method according to claim 1, wherein said providing said transfer mold comprises configuring said transfer mold so that said at least one cavity is substantially vertically oriented with at least one gate at a lower portion of the transfer mold and at least one vent at an upper portion of the transfer mold.
- 3. The method according to claim 2, wherein said introducing said flowable material comprises:
substantially filling said at least one cavity in said upward, substantially vertical direction.
- 4. The method according to claim 3, wherein said substantially filling said at least one cavity comprises:
introducing said flowable material through said at least one gate until a single flow front of said flowable material contacts said at least one vent at said upper portion of said at least one cavity.
- 5. The method according to claim 2, wherein said positioning said assembly further comprises:
positioning said assembly substantially vertically.
- 6. The method according to claim 5, wherein said introducing said flowable material comprises:
filling said at least one cavity until a single flow front of said flowable material contacts said at least one vent.
- 7. The method according to claim 6, wherein said filling said at least one cavity with said flowable material comprises:
encapsulating said assembly so that said flowable material fills said assembly gap and said outer gap.
- 8. The method according to claim 1, wherein said introducing said flowable material in said upward, substantially vertical direction comprises:
inducing a substantially uniform flow front.
- 9. The method according to claim 1, wherein said introducing said flowable material comprises said flowable material to flow substantially across said at least one surface of said assembly.
- 10. The method according to claim 1, wherein said introducing said flowable material onto said at least one surface of said assembly in said upward, substantially vertical direction comprises substantially preventing voids in said flowable material.
- 11. The method according to claim 1, wherein said providing said assembly comprises:
providing said assembly with said at least one semiconductor device connected to an interposer.
- 12. The method according to claim 1, wherein said introducing said flowable material comprises:
introducing said flowable material to flow between said at least one semiconductor device and said carrier substrate.
- 13. The method according to claim 1, wherein said providing said assembly comprises:
providing at least one individual semiconductor die.
- 14. The method according to claim 1, wherein said providing said assembly comprises:
providing a large-scale substrate including a plurality of semiconductor devices attached face down thereto.
- 15. The method according to claim 14, wherein said providing said large-scale substrate comprises:
providing said large-scale substrate having said conductive structures protruding from bond pads of said plurality of semiconductor devices.
- 16. The method according to claim 1, wherein said introducing said flowable material includes capillary action on said flowable material.
- 17. The method according to claim 1, wherein said introducing said flowable material includes positive pressure on said flowable material.
- 18. The method according to claim 1, wherein said introducing said flowable material includes negative pressure on said flowable material.
- 19. A method for transfer molding a semiconductor assembly comprising:
providing at least one transfer mold having an inner surface defining at least one cavity, said at least one transfer mold including at least one gate at a lower portion thereof and at least one vent at an upper portion thereof; providing an assembly including at least one semiconductor device attached face down to a carrier substrate with conductive structures providing an assembly gap therebetween; positioning said assembly in said at least one mold cavity of said transfer mold so that said carrier substrate abuts with a first inner surface of said transfer mold to provide an outer gap between a back surface of said at least one semiconductor device and an opposing second inner surface of said transfer mold; and introducing a resin material into said at least one cavity through said at least one gate so that said resin material moves upwardly over said assembly and through said assembly gap and said outer gap in a non-horizontal direction.
- 20. The method according to claim 19, comprising:
removing substantially all gas within said at least one cavity therefrom through said at least one vent during said introducing said resin material.
- 21. The method according to claim 19, wherein said introducing said resin material comprises:
at least partially encapsulating said assembly.
- 22. The method according to claim 19, wherein said providing said at least one transfer mold comprises:
providing said at least one transfer mold with said at least one cavity being oriented non-horizontally.
- 23. The method according to claim 19, wherein said providing said at least one transfer mold comprises:
providing said at least one transfer mold with said at least one cavity being substantially vertically oriented.
- 24. The method according to claim 19, wherein said introducing said resin material includes a single, substantially uniform flow front around said assembly.
- 25. The method according to claim 19, wherein said introducing said resin material includes introducing said resin material until a single, substantially uniform flow front of said resin material contacts said at least one vent at said upper portion of said at least one cavity.
- 26. The method according to claim 19, wherein said providing said assembly comprises:
providing a flip-chip type semiconductor device.
- 27. The method according to claim 19, wherein said introducing said resin material comprises:
introducing said resin material to flow between said semiconductor device and said carrier substrate.
- 28. The method according to claim 27, wherein said introducing said resin material further comprises:
at least partially encapsulating at least one of said semiconductor device and said carrier substrate.
CROSS-REFERENCE TO RELATED APPLICATION
[0001] This application is a divisional of application Ser. No. 09/652,503, filed Aug. 31, 2000, pending.
Divisions (1)
|
Number |
Date |
Country |
Parent |
09652503 |
Aug 2000 |
US |
Child |
10132353 |
Apr 2002 |
US |