Claims
- 1. A tuning fork gyroscope comprising:
a first substrate; a plurality of proof masses including at least first and second proof masses suspended with respect to the first substrate; means for oscillating the proof masses along a drive axis in the direction of the plane of the first substrate; at least first and second sense plates supported by the first substrate, the first sense plate disposed under the first proof mass defining a first nominal gap between the first proof mass and the first sense plate, the second sense plate disposed under the second proof mass defining a second nominal gap between the second proof mass and the second sense plate; a second substrate spaced from the first substrate; at least third and fourth sense plates supported by the second substrate, the third sense plate disposed over the first proof mass defining a third nominal gap between the first proof mass and the third sense plate, the fourth sense plate disposed over the second proof mass defining a fourth nominal gap between the second proof mass and the fourth sense plate; and means for sensing changes in the first, second, third and fourth nominal gaps between each sense plate and each proof mass and for outputting a signal indicative of the gyroscope angular rate about an axis parallel to the substrates.
- 2. The tuning fork gyroscope of claim 1 in which the means for sensing includes a first voltage, Vb, with +Vb applied to the first sense plate and −Vb applied to the second sense plate, and a second voltage, Vt, different from but approximately equal to the first voltage Vb, with −Vt applied to the third sense plate and +Vt applied to the fourth sense plate.
- 3. The tuning fork gyroscope of claim 2 in which the first and second nominal gaps are equal to gb and the third and fourth nominal gaps are equal to gt.
- 4. The tuning fork gyroscope of claim 3 in which the ratio of the second Vt and first Vb voltages is a function of the ratio of the nominal gap gt and the nominal gap gb.
- 5. The tuning fork gyroscope of claim 4 in which:
- 6. The tuning fork gyroscope of claim 1 in which the means for sensing includes a first voltage, Vbl, applied to the first sense plate, a second voltage, Vbr, applied to the second sense plate, a third voltage, Vtl, applied to the third sense plate, and a fourth voltage, Vtr, applied to the fourth sense plate.
- 7. The tuning fork gyroscope of claim 6 in which the first nominal gap is gbl, the second nominal gap is gbr, the third nominal gap is gtl and the fourth nominal gap is gtr.
- 8. The tuning fork gyroscope of claim 6 in which the ratio of the first and third voltages is a function of the ratio of the first and third nominal gaps and the ratio of the second and third voltages is the function of the ratio of the second and fourth nominal gaps.
- 9. The tuning fork gyroscope of claim 8 in which:
- 10. The tuning fork gyroscope of claim 9 in which the voltages Vtr and Vbl are of opposite sign than the voltages Vtl and Vbr.
- 11. The tuning fork gyroscope of claim 10 in which the voltages Vtr and Vbl are positive voltages and the voltages Vtl and Vbr are negative voltages.
- 12. The tuning fork gyroscope of claim 1 wherein the means for oscillating the proof masses includes motor combs.
- 13. The tuning fork gyroscope of claim 12 wherein the motor combs are vertically split.
- 14. The tuning fork gyroscope of claim 12 wherein the motor combs are horizontally split.
- 15. The tuning fork gyroscope of claim 12 further including guard bands for controlling out-of-plane sensitivities.
- 16. The tuning fork gyroscope of claim 1 wherein the sense plates are made of metal.
- 17. The tuning fork gyroscope of claim 1 wherein the sense plates are made of deposited silicon.
- 18. The tuning fork gyroscope of claim 1 including a torsion beam connecting an anchor to a base beam.
- 19. The tuning fork gyroscope of claim 18 wherein the torsion beam is a folded beam.
- 20. The tuning fork gyroscope of claim 18 wherein the torsion beam is a strain relief chevron beam.
- 21. The tuning fork gyroscope of claim 18 wherein the torsion beam is a crab leg.
- 22. The tuning fork gyroscope of claim 1 further including at least one torque plate.
- 23. The tuning fork gyroscope of claim 6 in which the ratio of the first and third voltages is a function of the ratio of the first and third nominal gaps and the ratio of the second and fourth voltages is the function of the second and fourth nominal gaps.
- 24. The tuning fork gyroscope of claim 1 in which the means for sensing includes applying a voltage to the proof masses and reading voltages that appear on the sense plates.
- 25. The tuning fork gyroscope of claim 1 in which the means for sensing includes applying a voltage to the proof masses and reading a weighted summation of output currents on each of the sense plates for eliminating gyroscope sensitivity to vertical displacement.
- 26. The tuning fork gyroscope of claim 25 in which Ibl is the output current that appears on the first sense plate, Ibr is the output current that appears on the second sense plate, Itl is the output current that appears on the third sense plate, and Itr is the output current that appears on the fourth sense plate.
- 27. The tuning fork gyroscope of claim 26 in which the first nominal gap is gbl, the second nominal gap is gbr, the third nominal gap is gtl, the fourth nominal gap is gtr.
- 28. The tuning fork gyroscope of claim 27 in which the weighted summation of output currents on each of the sense plates is Isum.
- 29. The tuning fork gyroscope of claim 28 where
- 30. The tuning fork gyroscope of claim 29 where Isum is proportional to input angular rate.
- 31. A method for reducing errors in a tuning fork gyroscope comprising:
determining a first distance, gt, between an upper sense plate and a proof mass and a second distance, gb, between a lower sense plate and the proof mass; and applying a first voltage, Vt, to the upper sense plate and a second voltage, Vb, to the lower sense plate, wherein the ratio of the first voltage and the second voltage, is a function of the first distance and the second distance.
- 32. The method for reducing errors of claim 31, wherein Vt/Vb=gt3/gb3.
- 33. The method for reducing errors of claim 31, wherein said first and second voltages are DC voltages.
- 34. The method for reducing errors of claim 31, wherein said first and second voltages are AC carrier excitation voltages.
- 35. The method for reducing errors of claim 31, wherein said step of determining said first distance is carried out by measuring the capacitance between the upper sense plate and the proof mass.
- 36. The method for reducing errors of claim 31, wherein said step of determining said second distance is carried out by measuring the capacitance between the lower sense plate and the proof mass.
- 37. A method for reducing errors in a tuning fork gyroscope including first and second proof masses, a left upper sense plate disposed over the first proof mass, a right upper sense plate disposed over the second proof mass, a left lower sense plate disposed under the first proof mass and a right lower sense plate disposed under the second proof mass, the method comprising:
measuring a first distance, gtl, between the left upper sense plate and the first proof mass, measuring a second distance, gtr, between the right upper sense plate and the second proof mass, measuring a third distance, gbl, between the left lower sense plate and the first proof mass, and measuring a fourth distance, gbr, between the right lower sense plate and the second proof mass; and applying a first voltage, Vtl, to the left upper sense plate, a second voltage, Vtr, to the right upper sense plate, a third voltage, Vbl, to the left lower sense plate, and a fourth voltage, Vbr, to the lower right sense plate, wherein the ratio of Vtl and Vbl is a function of gtl and gbl and the ratio of Vtr and Vbr is a function of gtr and gbr.
- 38. The method of claim 37 wherein Vtl is not equal to Vtr and Vbl is not equal to Vbr, and wherein
- 39. The method of claim 38 in which the voltages Vtr and Vbl are of opposite sign than the voltages Vtl and Vbr.
- 40. A tuning fork gyroscope comprising:
a first substrate; at least a first proof mass suspended with respect to the first substrate; means for oscillating the first proof mass along a drive axis in the direction of the plane of the first substrate; at least a first sense plate supported by the first substrate, the first sense plate disposed under the first proof mass defining a first nominal gap between the first proof mass and the first sense plate, a second substrate spaced from the first substrate; at least a second sense plate supported by the second substrate, the second sense plate disposed over the first proof mass defining a second nominal gap between the first proof mass and the second sense plate; and means for sensing changes in the first and second nominal gaps between each sense plate and the first proof mass and for outputting a signal indicative of angular displacement of the gyroscope.
- 41. The tuning fork gyroscope of claim 40 in which the means for sensing includes a first voltage, Vb, applied to the first sense plate and a second voltage, Vt, different from the first voltage, applied to the second sense plate.
- 42. The tuning fork gyroscope of claim 40 in which the first nominal gap is equal to gb and the second nominal gap is equal to gt.
- 43. The tuning fork gyroscope of claim 40 in which the ratio of the second voltage Vt and first voltage Vb is a function of the ratio of the second nominal gap gt and the first nominal gap gb.
- 44. The tuning fork gyroscope of claim 40 in which
- 45. A method for fabricating a tuning fork gyroscope with upper and lower sense plates, the method comprising:
providing a silicon substrate; etching the silicon substrate to provide at least one recess in the silicon substrate; producing a structure layer having a predetermined thickness; etching the structure layer to provide at least one proof mass; applying a metal coating to the silicon substrate beneath a portion of each proof mass; providing a glass substrate; etching the glass substrate to provide at least one recess in the glass substrate; depositing a multimetal layer to the at least one recess; electrostatically bonding the silicon substrate to the glass substrate; and etching the silicon substrate down to the structure layer.
- 46. The method of claim 45 wherein the proof masses have a thickness in the range of 5 to 100 μm.
- 47. The method of claim 45 wherein the multimetal layer is chosen from the group consisting of Ti/Pt/Au and Ti/Pt.
- 48. The method of claim 45 in which producing a structure layer includes diffusing boron onto a surface of the silicon substrate.
- 49. The method of claim 48 in which diffusing boron onto a surface of the silicon substrate includes diffusing boron-geranium silicon to define structural thickness.
- 50. The method of claim 45 in which producing a structure layer includes growing epitaxial silicon with boron onto a surface of the silicon substrate to define structural thickness.
- 51. The method of claim 48 in which boron is diffused into a silicon substrate to define structural thickness.
- 52. The method of claim 48 including the further step of applying KOH thinning prior to etching the silicon substrate.
- 53. The method of claim 48 in which diffusing boron onto a surface of the silicon substrate includes diffusing silicon-on-insulator to define structural thickness.
- 54. The method of claim 45 wherein the silicon substrate includes a lightly doped layer and a highly doped epitaxial layer.
- 55. The method of claim 54 wherein the thickness of said highly doped epitaxial layer is between 5 and 100 μm thick.
- 56. The method of claim 45 wherein the etching of the silicon subtrate is plasma enhanced ion etching.
- 57. The method of claim 45 wherein the structure layer is 5 to 100 μm thick.
- 58. The method of claim 45 wherein the structure layer is 5 to 20 μm thick.
- 59. The method of claim 45 wherein connecting posts between the silicon substrate and the glass substrate are defined by reactive ion etching.
- 60. The method of claim 45 wherein the recesses in the glass substrate are approximately 1700 Å deep.
- 61. The method of claim 45 further including:
providing a second glass substrate; etching said second glass substrate to provide at least one indentation in the second glass substrate; depositing at least one metal run in said at least one indentation in the second glass substrate; cutting a gap between said at least one proof mass and said second glass substrate; exposing at least one bonding pad; and bonding said second glass substrate to said structure layer.
- 62. The method of claim 45 wherein exposing at least one bonding pad includes water drilling.
- 63. A tuning fork gyroscope comprising:
a first substrate; a plurality of proof masses including at least first and second proof masses suspended with respect to the first substrate; means for oscillating the proof masses along a drive axis in the direction of the plane of the first substrate; at least first and second sense plates supported by the first substrate, the first sense plate disposed adjacent the first proof mass defining a first nominal gap between the first proof mass and the first sense plate, the second sense plate disposed adjacent the second proof mass defining a second nominal gap between the second proof mass and the second sense plate; a second substrate spaced from the first substrate; at least third and fourth sense plates supported by the second substrate, the third sense plate disposed adjacent the first proof mass but opposite the first sense plate, defining a third nominal gap between the first proof mass and the third sense plate, the fourth sense plate disposed adjacent the second proof mass but opposite the second sense plate, defining a fourth nominal gap between the second proof mass and the fourth sense plate; and means for sensing changes in the first, second, third and fourth nominal gaps between each sense plate and each proof mass and for outputting a signal indicative of the gyroscope angular rate about an axis perpendicular to the substrates.
- 64. The tuning fork gyroscope of claim 63 in which the means for sensing includes a first voltage, Vb, with +Vb applied to the first sense plate and −Vb applied to the second sense plate, and a second voltage, Vt, different from but approximately equal to the first voltage Vg, with −Vt applied to the third sense plate and +Vt applied to the fourth sense plate.
- 65. The tuning fork gyroscope of claim 64 in which the first and second nominal gaps are equal to gb and the third and fourth nominal gaps are equal to gt.
- 66. The tuning fork gyroscope of claim 65 in which the ratio of the second voltage Vt and the first voltage Vb is a function of the ratio of the nominal gap gt and the nominal gap gb.
- 67. The tuning fork gyroscope of claim 66 in which:
- 68. The tuning fork gyroscope of claim 63 in which the means for sensing includes a first voltage, Vbl, applied to the first sense plate, a second voltage, Vbr, applied to the second sense plate, a third voltage, Vtl, applied to the third sense plate, and a fourth voltage, Vtr, applied to the fourth sense plate.
- 69. The tuning fork gyroscope of claim 68 in which the first nominal gap is gbl, the second nominal gap is gbr, the third nominal gap is gtl and the fourth nominal gap is gtr.
- 70. The tuning fork gyroscope of claim 68 in which the ratio of the first and third voltages is a function of the ratio of the first and third nominal gaps and the ratio of the second and third voltages is a function of the ratio of the second and fourth nominal gaps.
- 71. The tuning fork gyroscope of claim 70 in which:
- 72. The tuning fork gyroscope of claim 71 in which the voltages Vtr and Vbl are of opposite sign than the voltages Vtl and Vbr.
- 73. The tuning fork gyroscope of claim 72 in which the voltages Vtr and Vbl are positive voltages and the voltages Vtl and Vbr are negative voltages.
- 74. The tuning fork gyroscope of claim 63 including additional sense plates arranged in a comb-like configuration.
RELATED APPLICATIONS
[0001] This application is a Continuation-in-Part of Ser. No. 10/004,145 filed Oct. 23, 2001 entitled METHOD OF ANODICALLY BONDING A MULTI-LAYER DEVICE WITH A FREE MASS and is incorporated herein by reference. This application also claims priority from Provisional Application Serial No. 60/327,450 filed Oct. 5, 2001, and Provisional Application Serial No. 60/327,434 filed on Oct. 5, 2001.
Provisional Applications (2)
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Number |
Date |
Country |
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60327450 |
Oct 2001 |
US |
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60327434 |
Oct 2001 |
US |
Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
10004145 |
Oct 2001 |
US |
Child |
10264887 |
Oct 2002 |
US |