UNIT FOR PREVENTING A SUBSTRATE FROM DRYING, SUBSTRATE CLEANING APPARATUS HAVING THE UNIT AND METHOD OF CLEANING THE SUBSTRATE USING THE UNIT

Abstract

A unit for preventing a substrate from drying includes a transfer arm for transferring a substrate from a first bath containing a first cleaning solution to a second bath containing a second cleaning solution, a spraying part connected to the transfer arm, wherein the spraying part sprays a drying prevention solution from an upper portion of the substrate to a lower portion of the substrate, and a drainage container connected to the transfer arm, wherein the drainage container receives the drying prevention solution.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

Example embodiments of the present invention can be understood in more detail from the following description taken in conjunction with the accompanying drawings, in which:

FIG. 1 is a perspective view illustrating a unit for preventing a substrate from drying in accordance with an example embodiment of the present invention;

FIG. 2 is a perspective view illustrating an interior of a driving part in FIG. 1 according to an example embodiment of the present invention;

FIG. 3 is a perspective view illustrating a movement of a drainage container in FIG. 1 according to an example embodiment of the present invention;

FIG. 4 is a cross-sectional view illustrating a substrate cleaning apparatus in accordance with an example embodiment of the present invention;

FIG. 5 is a cross-sectional view illustrating a substrate being loaded or unloaded into/from the bath in FIG. 4; and

FIG. 6 is a flow chart illustrating a method of cleaning a substrate in accordance with an example embodiment of the present invention.

Claims

1. A unit for preventing a substrate from drying, the unit comprising: a transfer arm for transferring a substrate from a first bath containing a first cleaning solution to a second bath containing a second cleaning solution;a spraying part connected to the transfer arm, wherein the spraying part sprays a drying prevention solution from an upper portion of the substrate to a lower portion of the substrate; anda drainage container connected to the transfer arm, wherein the drainage container receives the drying prevention solution.

2. The unit of claim 1 further comprising a driving part changing a position of the drainage container.

3. The unit of claim 1, wherein the transfer arm holds the substrate to be vertically positioned with respect to a floor.

4. The unit of claim 1 wherein a bottom surface of the drainage container is inclined toward a hole through which the drying prevention solution is drained.

5. The unit of claim 1 wherein the drying prevention solution includes de-ionized water.

6. The unit of claim 1, wherein the substrate includes a semiconductor substrate or a mask substrate.

7. A substrate cleaning apparatus comprising: at least two baths each of which contains a cleaning solution for cleaning a substrate; anda drying prevention unit positioned between the at least two baths, wherein the drying prevention unit sprays a drying prevention solution onto a surface of the substrate when the substrate is transferred from one bath to another.

8. The substrate cleaning apparatus of claim 7, wherein the drying prevention unit comprises: a transfer arm transferring the substrate;a spraying part for spraying the drying prevention solution toward an upper portion of the substrate while transferring the substrate; anda drainage container for receiving the drying prevention solution sprayed from the spraying part.

9. The substrate cleaning apparatus of claim 7, further comprising a driving unit for changing a position of the drainage container.

10. The substrate cleaning apparatus of claim 7, wherein the drying prevention solution includes de-ionized water.

11. A method of cleaning a substrate, the method comprising: dipping the substrate in a first bath including a first cleaning solution;transferring the substrate from the first bath to a second bath including a second cleaning solution;spraying a drying prevention solution onto the substrate; anddipping the substrate in the second bath.

12. The method of claim 11, further comprising transferring the substrate from the second bath to an Nth bath and dipping the substrate in the Nth bath, wherein N is an integer more than 2.

13. The method of claim 11, further comprising drying the substrate cleaned in the second bath.

14. The method of claim 11 further comprising collecting the sprayed drying prevention solution.

15. The method of claim 11, wherein the drying prevention solution includes de-ionized water.