Patent Application
20250210082
The present application is a non-provisional patent application claiming priority to European application no. 23219705.3, filed on Dec. 22, 2023, the contents of which are hereby incorporated by reference.
The present disclosure generally relates to a memory stack for a voltage-controlled magnetic anisotropy (VCMA) magnetic random access memory (MRAM) device and to a method for programming a VCMA MRAM device.
Magnetic random access memory (MRAM) is a promising memory technology providing non-volatile data storage, high write and read speeds, and low power consumption. The non-volatile storage function of an MRAM device is provided by a magnetic tunnel junction (MTJ) device. A magnetic tunnel junction structure may include a free layer, a barrier layer (typically an oxide), a reference layer, and a hard magnetic layer. A magnetization state of the reference layer is fixed or pinned by the hard magnetic layer. The orientation of the magnetization of the free layer may be switched in relation to the (fixed) orientation of the magnetization of the reference layer between a first orientation where the magnetization orientation of the free layer is aligned with the magnetization orientation of the reference layer, and a second orientation where the magnetization orientation of the free layer is against the magnetization orientation of the reference layer. The first and second orientations may be referred to as the parallel magnetization orientation or state P and the anti-parallel magnetization orientation or state AP, respectively. The relative orientations of the magnetization of the reference layer and the free layer determines a resistance to current of the MTJ device, wherein the P orientation or P state may correspond to the lower resistance state (LRS) and the AP orientation or AP state corresponds to the higher resistance state (HRS). The tunnel magneto-resistance ratio (TMR) is a measure of the difference in the MTJ electrical resistance between the AP state and the P state. Accordingly, by measuring the resistance of the MTJ the magnetization state of the free layer may be sensed.
Current MRAM technology typically relies on spin-transfer-torque (STT) as the key switching mechanism of the free layer magnetization. However, STT writing may require a substantial amount of spin-polarized currents flowing through the oxide barrier of a magnetic tunnel junction (MTJ), which may limit the power efficiency of the writing operation. Intense tunneling current can also degrade the tunnel barrier of the MTJs and thus affect the reliability of the memory cells.
Voltage-controlled magnetic anisotropy (VCMA) is another method that enables ultra-low power writing operations. In contrast to STT-aided free layer switching, VCMA employs a bias voltage applied across the MTJ device to induce a voltage across the barrier layer. This creates an electric field within the tunnel layer which may modify the charge distribution of the local interface between the barrier layer and the free layer. The changed charge distribution results in an observable modulation of the magnetic anisotropy of the free layer, lowering the energy barrier between the P and AP states and thus enabling the initially stable device to be more easily switched by means of an external magnetic field. The amount of modulation depends on the quality of the MTJ materials and interfaces and is quantified by the VCMA coefficient (in units of fJ/V·m).
A VCMA-aided writing scheme, although clearly a low power solution, is however associated with a number of challenges.
Firstly, current proof-of-concept writing schemes are typically based on a precession of the free layer magnetization and hence allows switching of the MTJ between the AP and P states without any current flow through the device. The precession requires an external magnetic field orthogonal to the magnetization orientation of the free layer (e.g. in-plane in case of a free layer with perpendicular magnetic anisotropy (PMA)). The external magnetic field needs to be synchronized with the (pulsed) bias voltage.
Secondly, the precession-based writing scheme requires high frequency voltage pulses and very precise timing control to operate with sufficiently low write error rates. The voltage pulse should be short and within very tight tolerances for reliable switching, as the switching precession depends heavily on the pulse width. For example, a typical median duration of a voltage pulse may be 1 ns with a +/−0.2 ns tolerance. Any longer or shorter pulse duration can result in significant decrease in switching success, leading to large Write-Error Rate (WER).
Thirdly, the conventional VCMA write is a sequential read-write operation. Because both anti-parallel (AP) and parallel (P) states are equally stable, the AP-P and P-AP transitions share the same polarity write pulse. Hence to ensure a desired final state, a pre-read is required to decide if writing is needed. For example, to write LRS, the write pulse should only be applied to HRS MTJ devices. This is because an MTJ device already in the LRS will switch to HRS in response to the write pulse, and vice versa. Consequently, the entire write process of “read+evaluate+write” may reduce the time-efficiency and power-efficiency promised by VCMA writing.
It is a potential benefit of the present disclosure to provide a memory stack that allows a deterministic VCMA-aided free layer switching protocol mitigating the need for a pre-read, to thereby enable an VCMA-MRAM device with one or more of a reduced-complexity, improved power efficiency, or improved speed.
Hence, according to a first aspect, there is provided a memory stack for a voltage-controlled magnetic anisotropy (VCMA) magnetic random access memory (MRAM) device, the memory stack comprising:
According to a second aspect there is provided an MRAM device comprising a memory stack according to the first aspect, or any embodiments or variations thereof, and further comprising a program circuit configured to apply the first bias voltage to set the free layer to the second magnetization state, and to apply a second bias voltage between the first and second threshold voltages to set the free layer to the first magnetization state.
According to a third aspect there is provided a method for programming a memory stack of an MRAM device according to the second aspect or any embodiments or variations thereof, the method comprising:
Thus, the present disclosure is based on the realization that an auxiliary magnetic layer structure comprising a pinned auxiliary magnetic layer with VCMA can be used to modulate the (magnetostatic) offset field (interchangeably “stray field”) at the free layer such that the sign of the offset field may be varied. The orientation of the free layer magnetization may thus be coupled to the offset field, such that the offset field (whose orientation depends on the amplitude of the bias voltage across the memory stack) may act to orient the magnetization orientation of the free layer to align with the offset field during switching.
As a result, the conventionally used precession-inducing external field is no longer required because this function is now provided by the auxiliary magnetic layer structure and the modulation of the stray field direction.
Moreover, the pulse width dependence of the conventional VCMA write schemes is removed since the offset field may provide a precise tilting or biasing of the layer magnetization towards the first or second free layer directions and the corresponding free layer magnetization states. The tilting is determined by the intrinsic stray fields generated by the auxiliary magnetic layer structure (i.e. the second hard magnetic layer and the auxiliary magnetic layer) and its superposition with stray field generated by the other magnetic layer of the memory stack (e.g., the first hard magnetic layer and the reference layer). Therefore, regardless of the time during which the bias voltage is applied, as long as it is sufficient to enable the tilting of the free layer towards the intended final state, the free layer magnetization will predictably undergo precession in a direction determined in principle only by pulse amplitude. This may considerably facilitate memory circuit design and reduce variability factors.
Since the tilting of the free layer magnetization is determined mostly by voltage amplitude, deterministic switching of the free layer magnetization is enabled using a single polarity write voltage and without requiring a pre-read to determine the magnetization state of the free layer prior to writing. That is, regardless of the current state of the free layer, a bias voltage exceeding the second threshold voltage and being less than the first threshold voltage will deterministically set the free layer in the first magnetization state (with the magnetization oriented in the first direction), while a bias voltage exceeding the second threshold voltage will deterministically set the free layer in the second magnetization state (with the magnetization oriented in the second direction). That is, the free layer magnetization will either be tilted towards the opposite state or simply return to a tilting which favors the same state as before. In other words, the final magnetization state of the free layer will depend on whether the amplitude of the applied bias voltage is sufficient to bring the auxiliary magnetic layer to the destabilized magnetization state such that the sign of the offset field is flipped.
The VCMA in the auxiliary magnetic layer is enabled by the second barrier layer of the interposer layer structure. Meanwhile, the non-magnetic spacer layer interposing the second barrier layer and the free layer may counteract or prevent the second barrier layer from inducing VCMA in the free layer at the free layer interface opposite the interface toward the first barrier layer. The non-magnetic spacer layer may thus act as a VCMA-breaking layer between the free layer and the second barrier layer.
A first threshold voltage (for changing the auxiliary magnetic layer to the destabilized magnetization state) exceeding a second threshold voltage (for bringing the free layer from the second to first magnetization state) may be achieved for instance by configuring the memory stack such that the VCMA-coefficient of the auxiliary magnetic layer is smaller than the VCMA-coefficient of the free layer, and/or such that the auxiliary magnetic layer has a stronger magnetic anisotropy than the free layer.
As used herein, the term “magnetization” of a layer is can refer to the net magnetization of the layer, i.e. equivalent to the sum of the elementary magnetic moments of the layer.
The “orientation” of a magnetization of a layer (e.g., the free layer or the auxiliary magnetic layer) can refer to the orientation of the magnetization vector of the layer, or equivalently the orientation of the net magnetic moment of the layer. That a magnetization of a layer is oriented along a given direction (e.g., the first direction or the second direction) means that a component (typically a major component) of the magnetization (i.e., of the magnetization vector) is parallel to the given direction. Conversely, that a magnetization of a layer is oriented against or opposite a given direction (e.g., the first direction or the second direction) means that a component (typically a major component) of the magnetization (i.e., of the magnetization vector) is anti-parallel to the given direction.
The free layer is a layer having a magnetization which may be switched between first and second magnetization states. The first magnetization state corresponds to the free layer magnetization being oriented in the first direction. The second magnetization state corresponds to the free layer magnetization being oriented in the opposite second direction. The first magnetization state and the second magnetization state may correspond to an anti-parallel (AP) state and a parallel (P) state, respectively, of the MTJ layer structure, in implementations of the memory stack where the magnetization of the reference layer is oriented along the first direction. The first magnetization state and the second magnetization state may alternatively correspond to a P state and an AP state, respectively, of the MTJ layer structure, in implementations of the memory stack wherein the magnetization of the reference layer is oriented along the second direction.
The first hard magnetic layer, the reference layer, the free layer, the auxiliary magnetic layer, and the second hard magnetic layer may each be layers with perpendicular magnetic anisotropy (PMA). The first and second directions may accordingly be mutually opposite out-of-plane directions with respect to the free layer, i.e., transverse to the in-plane direction of the free layer.
The first hard magnetic layer, the reference layer, the free layer, the auxiliary magnetic layer, and the second hard magnetic layer may alternatively each be layers with in-plane magnetic anisotropy (IPMA). The first and second directions may accordingly be mutually opposite in-plane directions with respect to the free layer.
In some embodiments, the destabilized magnetization state of the auxiliary magnetic layer corresponds to a magnetization of the auxiliary magnetic layer being oriented transverse to the first direction. The VCMA-effect induced by the second barrier layer may hence, in response to the first bias voltage, module the magnetic anisotropy of the auxiliary magnetic layer such that the magnetization vector is rotated from an out-of-plane orientation to an in-plane orientation (in implementations where the auxiliary magnetic layer presents PMA), or from an in-plane orientation to an out-of-plane orientation (in implementations where the auxiliary magnetic layer presents PMA). The contribution from the auxiliary magnetic layer to the offset field along the first direction may thus be reduced, ideally to substantially zero, such that the sign of the offset fields at the free layer is flipped.
In some embodiments, the non-magnetic spacer layer is formed of Ta, Ir, Pt, Ru, CoFeX, CoX, FeX or CoFeBX, where X is a non-magnetic material such as W, Ta, or Mo. These materials may prevent the second tunnel barrier layer from modifying the charge distribution in the free layer, while allowing the desired magnetic anisotropy (e.g., PMA or IPMA) to be provided in the MTJ layer structure and the auxiliary magnetic layer structure.
In some embodiments, the auxiliary magnetic layer structure further comprises a spacer layer interposing the auxiliary magnetic layer and the second hard magnetic layer and configured to provide a parallel or antiparallel coupling of the magnetization of the auxiliary magnetic layer and the second hard magnetic layer. By coupling the magnetization of the auxiliary magnetic layer to the second hard magnetic layer, a pinned equilibrium magnetization state may be defined for the auxiliary magnetic layer. The auxiliary magnetic layer thus has a deterministic single final state regardless of whether the bias voltage is between the first and second threshold, or exceeds the first threshold.
The spacer layer may be configured to provide interlayer exchange coupling (IEC), also known as Ruderman-Kittel-Kasuya-Yosida (RKKY) exchange coupling. The coupling may thus be either parallel or antiparallel, as determined by the thickness of the spacer layer.
The program circuit of the MRAM device according to the second aspect may be configured to apply the first bias voltage and the second bias voltage as respective voltage pulses of substantially equal duration. As noted above, the final magnetization state of the free layer will in practice be determined by the amplitude of the applied voltage rather than the pulse duration. Hence, the durations of the first and second voltage pulses may be substantially equal. This may facilitate the writing protocol and enable the P and AP states to be programmed in approximately the same amount of time.
The above, as well as additional, features will be better understood through the following illustrative and non-limiting detailed description of example embodiments, with reference to the appended drawings.
All the figures are schematic, not necessarily to scale, and generally only show parts which are necessary to elucidate example embodiments, wherein other parts may be omitted or merely suggested.
Example embodiments will now be described more fully hereinafter with reference to the accompanying drawings. That which is encompassed by the claims may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein; rather, these embodiments are provided by way of example. Furthermore, like numbers refer to the same or similar elements or components throughout.
Example embodiments of memory stacks suitable for MRAM devices implementing VCMA-aided switching of the free layer magnetization will now be described with reference to the accompanying drawings. The memory stacks will be depicted in schematic cross-sections, wherein it is to be understood that the relative dimensions of some structures and layers may be exaggerated and not drawn to scale. Rather the dimensions may be adapted for illustrational clarity and to facilitate understanding. When present in the figures, the indicated axes X and Y consistently refer to a horizontal or in-plane direction, and a vertical direction transverse to X, respectively. As used herein, the terms “horizontal” and “in-plane” refer to directions parallel to a main plane of extension of the layers of the respective memory stacks, or equivalently (a main surface of) of a substrate supporting the memory stack of the MRAM device. Meanwhile, the term “vertical” refers to a normal direction to the plane of extension of the layers, or equivalently normal to (the main surface of) the substrate. The vertical direction Y accordingly corresponds to the direction along which the layers of the memory stacks are stacked. Furthermore, in the figures arrows are used to indicate magnetization states of relevant magnetic layers of the respective memory stacks. An arrow parallel or opposite to the Y direction signifies a perpendicular or out-of-plane magnetization state. An array parallel or opposite to the X direction signifies an in-plane magnetization state. Unless stated otherwise, a layer including a single arrow denotes a layer with a fixed or pinned magnetization. Meanwhile, a layer including two oppositely oriented arrows denotes a layer with a switchable magnetization state (typically a free layer).
The MTJ layer structure 4 comprises a first hard magnetic layer (HL) 41, a reference layer (RL) 43, a free layer (FL) 45, and a first tunnel barrier layer or first barrier layer (BL) 44 interposing the RL 43 and the FL 45. The first BL layer 44 is configured to induce a VCMA in the FL 45, to enable a VCMA-aided switching approach described in detail below. The MTJ layer structure 4 may as shown further comprise a spacer layer (SL) 42 interposing the first HL 41 and the RL 43.
The auxiliary magnetic layer structure 6 comprises an auxiliary magnetic layer (i.e., the variable driver layer 61) and a second hard magnetic layer (i.e., the fixed driver layer 63). The auxiliary magnetic layer structure 6 may as shown further comprise a spacer layer 62 interposing the second hard magnetic layer (i.e., the fixed driver layer 63) and the auxiliary magnetic layer (i.e., the variable driver layer 61). For conciseness, the term driver layer (DL) structure will in the following be used to refer to the auxiliary magnetic layer structure 6. Correspondingly, the auxiliary magnetic layer and the second hard magnetic layer will be referred to as the “variable” DL layer (VDL) 61 and the “fixed” layer (FDL) 63, respectively. The term “driver layer” is motivated by the fact that the DL structure functionally may be seen as configured to “drive” the VCMA-aided switching of the FL 45, as described in detail below.
The interposer layer structure 5 interposes the FL 45 and the VDL 61. The interposer layer structure 5 comprises a second BL 52. The second BL 52 is configured to induce a VCMA in the VDL 61. The interposer layer structure 5 further comprises a non-magnetic SL 51 interposing the second BL 52 and the FL 45. Accordingly, the interposer layer structure 5 is arranged with the second BL 52 facing the VDL 61 of the DL structure (i.e., the auxiliary magnetic layer structure 6), and the non-magnetic SL 51 facing the FL 45 of the MTJ layer structure 4.
The memory stack 1 is as indicated in
The RL 43 has a fixed or pinned magnetization state, pinned by the first HL 41. The first HL 41 is accordingly configured as a pinning layer of the MTJ layer structure 4. In the illustrated example, the first HL 41 and the RL 43 are configured as a synthetic anti-ferromagnetic (SAF) with oppositely oriented magnetization vectors coupled through the SL 42 providing an antiparallel coupling. However, this is merely an example and parallel coupling configurations are also possible. The type of coupling between the HL 41 and the RL 43 may be controlled via the thickness and composition of the SL 42.
The VDL 61 is configured to, in absence of any bias voltage across the memory stack 1, be maintained in a pinned magnetization state by the FDL 63 with a magnetization oriented along a first direction. The FDL 63 is accordingly configured as a pinning layer of the DL structure (i.e., the auxiliary magnetic layer structure 6). In the present disclosure, the first direction by convention corresponds to the orientation along which the magnetization vector of the FDL 63 is oriented when in the pinned magnetization state. In the illustrated example, the first direction corresponds to the vertical Y-direction. In the illustrated example, the VDL 61 and the FDL 63 are configured as a synthetic ferromagnetic (SFM) with substantially parallel magnetization vectors coupled through a SL 62 providing a parallel coupling. However, this is merely an example and anti-parallel coupling configurations are also possible where the VDL 61 and the FDL 63 are configured as a SAF. The type of coupling between the VDL 61 and the FDL 63 may be controlled via the thickness and composition of the SL 62.
The FL 45 has a variable magnetization switchable between a first magnetization state with a magnetization oriented along the first direction Y and a second magnetization state with a magnetization oriented along a second direction opposite the first direction, i.e. −Y (negative Y). Due to the PMA of the memory stack 1, the first and second directions Y and −Y define mutually opposite out-of-plane directions. For the depicted memory stack 1, the first magnetization state corresponds to an anti-parallel (AP) state of the MTJ layer structure 4 while the second magnetization state corresponds to a parallel (P) state of the MTJ layer structure 4. This follows from the opposite orientations of the respective pinned magnetization states of the RL 43 and the VDL 61.
Non-limiting examples of materials for the HL 41 and the FDL 63 include CoPt alloys of varying compositions, Co/Pt nano-laminates, CoPd alloys of varying compositions, Co/Pd nano-laminates, CoNi alloys of varying compositions, Co/Ni nano-laminates, FePt alloys of varying compositions, and Fe/Pt nano-laminates. The HL 41 and the FDL 63 may typically be formed with a thickness of about 10 nm or less.
Non-limiting examples of materials for the RL 43, the FL 45, and the VDL 61 include Fe-based and/or Co-based layers, for example, Fe, Co, FeB, CoB, CoFe, and CoFeB (of varying compositions of Co, Fe, and B). RL 43, the FL 45 and the VDL 61 may each typically be formed with a thickness of about 2 nm or less.
Non-limiting examples of materials for the first BL 44 and the second BL 52 include MgOx, AlOx, and MgAlOx. The BL 44 and the BL 52 may typically be formed with a thickness of 5-20 angstroms (Å).
The purpose of the SL 51 interposing the second BL 52 and the FL 45 is to counteract or prevent the second BL 52 from inducing VCMA in the FL 45 at the side of the FL 45 facing the interposer layer structure 5. That is, VCMA at the side of the FL 45 facing the first BL 44 is desired, while VCMA at the opposite side of the FL 45 is to be limited. The SL 51 may accordingly be of a composition such that the SL 51 may act as a VCMA-breaking layer between the free layer 45 and the second BL 52. Non-limiting examples of materials of the SL 51 include Ta, Ir, Pt, Ru, or an alloy of CoFeX, CoX, FeX, or CoFeBX, where X is a non-magnetic material such as W, Ta, or Mo, or another conventional non-magnetic Boron getter. The amount of the non-magnetic material X may be varied. As may be appreciated, a greater amount of X implies a lower amount of the other components. The SL 51 may typically be formed with a thickness of about 2 nm or less.
Non-limiting examples of materials for the spacer layer SL 42 and the SL 62 include typical RKKY spacer materials, such as Cr, Ir, Ru, Ag, or RuAl, with a thickness chosen to achieve the desired coupling type (e.g. parallel or antiparallel). The thickness may typically be less than about 2 nm.
The memory stack 1 may as shown be arranged above a substrate 2. The substrate 2 may be any conventional substrate or wafer, such as a semiconductor substrate. Examples of semiconductor substrates include a Si substrate, a Ge substrate, a SiGe substrate, a SiC substrate, a SOI substrate, a GeOI substrate, or a SiGeOI substrate to name a few. Although not expressly shown in
In contrast to MTJ devices relying on the conventional precession-based VCMA-aided free layer magnetization state switching, the memory stack 1 is configured to enable a deterministic VCMA-aided switching. The determining switching is enabled by the VDL 61 of the DL structure (i.e., the auxiliary magnetic layer structure 6), which is used to modulate the offset field acting on the FL 45. As mentioned above, the VDL 61 is configured to, in absence of any bias voltage across the memory stack 1, be maintained in the pinned magnetization state by the FDL 63 with the magnetization oriented along the first direction Y.
In practice, the VDL 61 will remain in the pinned equilibrium magnetization state with the orientation along the first direction Y provided the energies contributing to the pinning exceed the demagnetizing energies Edemag tending to bring the magnetization of the VDL 61 to an in-plane orientation.
Several magnetic energies contribute to the pinning of the magnetization state of the VDL 61, the main contributions being: Ecouple—the coupling energy provided by the FDL 63 (which in the illustrated example is given by the RKKY coupling via the SL 62); and Ek—the magnetic anisotropy energy (PMA in the illustrated example). Assuming for simplicity there are no other contributions, the VDL 61 will thus remain in the equilibrium state provided Ecouple+Ek>Edemag. By applying a voltage across the memory stack 1, an electric field will arise in the second BL 52 such that, in response, the magnetic anisotropy energy Ex may be modulated by the VCMA effect, where the modulation is given by:
This means that, by applying a voltage exceeding some threshold voltage, which herein is denoted “first threshold voltage Vth-1->2,” the VDL 61 may be destabilized from the pinned magnetization state (oriented along Y) and brought to a destabilized magnetization state corresponding to an in-plane magnetization state (oriented along X). The precise magnitude of the first threshold voltage will depend on among others Ecouple, Ek0, Edemag, and VCMACoeff which all are dependent on the design of the memory stack 1.
Bringing the VDL 61 to the destabilized in-plane magnetization state will further result in a modulation of the offset field acting on the FL 45. The offset field at the FL 45 is given by the net magnetostatic field produced by all magnetic layers of the memory stack 1 other than the FL 45, including the HL 41, the RL 43, the VDL 61, and the FDL 63. The VDL 61 may accordingly provide a first contribution to the offset field while remaining in the equilibrium magnetization state, and a second contribution to the offset field when brought to the destabilized magnetization state.
The memory stack 1, and in particular the VDL 61, are configured so that the first contribution, together with the contributions from the other magnetic layers of the memory stack 1, result in an offset field oriented along the first direction Y at the FL 45, while the second contribution, together with the contributions from the other magnetic layers of the memory stack 1 (which will remain substantially unchanged), result in an offset field oriented along the second direction at the FL 45. Accordingly, in summary, by applying a first bias voltage exceeding the first threshold voltage across the memory stack 1, the VDL 61 may be brought from the equilibrium magnetization state (out-of-plane, along the Y direction) to the destabilized magnetization state (in-plane, along the X direction), and thus cause a sign change of the Y-component of the offset field at the FL 45.
The memory stack 1 is further configured so that the first threshold voltage for bringing the VDL 61 to the destabilized magnetization state is greater than a threshold voltage for causing VCMA-inducted switching of the FL 45 from the second magnetization state (in the illustrated example P, wherein the FL magnetization is oriented along the −Y direction) to the first magnetization state (in the illustrated example AP, wherein the FL magnetization is oriented along the Y direction), herein termed “second threshold voltage, Vth-2->1.”
Accordingly, the memory stack 1 provides a first write window Vth-2->1<V<Vth-1->2 for setting the FL 45 to the first magnetization state (e.g. AP) and a second write window V>Vth-1->2 for setting the FL 45 to the second magnetization state (e.g. P).
A second threshold voltage Vth-2->1 smaller than a first threshold voltage Vth-2->1 may be achieved by different techniques. As a first example, the VDL 61 may be configured to present a stronger magnetic anisotropy (e.g. PMA) than the FL 45. As a second example, the VCMA coefficient for the VDL 61 may be smaller than the VCMA coefficient for the FL 45. Combinations of these techniques are also possible.
Since the second bias voltage V2 is within the first write window, and hence exceeds the second threshold voltage Vth-2->1 but is less than the first threshold voltage Vth-1->2, the VDL 61 remains in the pinned magnetization state and consequently the sign of the Y-component of the offset field is unchanged, and thus tilts the magnetization of the FL 45, modulated by the VCMA-effect, towards the first magnetization state AP which thus becomes the final state of the FL 45 after the second bias voltage V1 is removed.
The graph on the left-hand side of
Since the first bias voltage V1 exceeds Vth-1->2, (and hence also Vth-2->1), the VDL 61 is brought to the destabilized magnetization state with the in-plane orientation, the sign of the Y-component of the offset field is flipped, and thus the magnetization of the FL 45, modulated by the VCMA-effect, is tilted towards the second magnetization state P which thus becomes the final state of the FL 45 after the first bias voltage V1 is removed.
With reference again to
For the memory stack 1 and MRAM device 10 presented above, the first direction along which the magnetization vector of the FDL 63 is oriented when in the pinned magnetization state corresponds to the vertical Y-direction, i.e. away from the MTJ layer structure 4. As orientation of the magnetization vector of the RL 43 is opposite the first direction, it follows that the threshold voltage for switching the FL 45 from P to AP (i.e. the second threshold voltage Vth-2->1) is less than the threshold voltage for switching the FL 45 from AP to P (i.e. the first threshold voltage Vth-1->2).
The present disclosure by no means is limited to the embodiments described above. On the contrary, many modifications and variations are possible. For example, the memory stacks 1 and the memory stack 100 with PMA have been shown. The present disclosure may be applied also to a memory stack wherein the magnetic layers (the HL, the RL, the FL, the VDL, and the FDL) present IPMA. The above description applies correspondingly to such a configuration, with the difference that the VDL in the pinned equilibrium magnetization state has an in-plane magnetization and in the destabilized magnetization state has an out-of-plane magnetization. Accordingly, the VCMA-effect in the VDL will be used to modulate the offset field such that the in-plane component (e.g. the X-component) of the offset field at the FL changes sign.
While some embodiments have been illustrated and described in detail in the appended drawings and the foregoing description, such illustration and description are to be considered illustrative and not restrictive. Other variations to the disclosed embodiments can be understood and effected in practicing the claims, from a study of the drawings, the disclosure, and the appended claims. The mere fact that certain measures or features are recited in mutually different dependent claims does not indicate that a combination of these measures or features cannot be used. Any reference signs in the claims should not be construed as limiting the scope.
| Number | Date | Country | Kind |
|---|---|---|---|
| 23219705.3 | Dec 2023 | EP | regional |
