Claims
- 1. A cleaning apparatus comprising:a vibration transmitter including a portion configured to be positioned adjacent a surface of a semiconductor wafer; a housing; a transducer in said housing coupled to said transmitter and adapted to oscillate at a frequency for propagating megasonic energy to vibrate said transmitter portion so that when said portion is coupled to a surface of an article to be cleaned, particles on the article are loosened; and openings in said housing for flowing gas into and out of a space in said housing in contact with said transducer.
- 2. The apparatus of claim 1, wherein said gas is nitrogen.
- 3. The apparatus of claim 1, wherein said transmitter is supported in cantilever fashion.
- 4. The apparatus of claim 1, in which said transmitter portion is made of quartz, sapphire, silicon carbide, silicon nitride, quartz coated with silicon carbide or quartz coated with vitreous carbon.
- 5. The apparatus of claim 1, including a rotatable support for said article, and a conduit for applying cleaning fluid onto said article to form a meniscus between the transmitter portion and the article.
- 6. The apparatus of claim 5, wherein said article is thin and flat, and including conduits for applying cleaning fluid to both surfaces of the flat article to clean both surfaces at the same time.
- 7. The apparatus of claim 1 wherein said transducer includes a flat surface acoustically coupled to said transmitter.
RELATED APPLICATIONS
This application is a continuation of U.S. application Ser. No. 09/953,504, filed Sep. 13, 2001, now U.S. Pat. No. 6,463,938, issued Oct. 15, 2002, which is a continuation of U.S. application Ser. No. 09/643,328, filed Aug. 22, 2000, now U.S. Pat. No. 6,295,999, issued Oct. 2, 2001, which is a continuation of U.S. application Ser. No. 09/057,182, filed Apr. 8, 1998, now U.S. Pat. No. 6,140,744, issued Oct. 31, 2000, which is a continuation-in-part of U.S. application Ser. No. 08/724,518, filed Sep. 30, 1996, now U.S. Pat. No. 6,039,059, issued Mar. 21, 2000.
US Referenced Citations (95)
Foreign Referenced Citations (15)
Number |
Date |
Country |
3212-916 |
Oct 1983 |
DE |
319-806 |
Jun 1989 |
EP |
54-7874 |
Jan 1979 |
JP |
54-69260 |
Apr 1979 |
JP |
55-1114 |
Jan 1980 |
JP |
57-153638 |
Sep 1982 |
JP |
61-240157 |
Oct 1986 |
JP |
62-281431 |
Dec 1987 |
JP |
63-36534 |
Feb 1988 |
JP |
64-18229 |
Jan 1989 |
JP |
1-246935 |
Oct 1989 |
JP |
1-304733 |
Dec 1989 |
JP |
1-316935 |
Dec 1989 |
JP |
2-53185 |
Apr 1990 |
JP |
7-24414 |
Jan 1995 |
JP |
Non-Patent Literature Citations (8)
Entry |
Stuart A. Hoenig: Cleaning Surfaces With Dry Ice: Compressed Air Magazine: Aug. 1986: pp. 22-25. |
Va-Tran Systems, Inc.: Sno Gun™ Dry Ice Snow Cleaning System for Electronic, Semi-Conductor, Medical, Optical and Other Diverse Industries. |
IBM Technical Disclosure Bulletin, Direct Cooling Technique for Quartz Deposition Monitors, vol. 34, No. 7B. |
CO2 Snow/Pellet Cleaning/Super Critical Fluid Precision Cleaning: Dec. 1995: vol. III. No. 11, p. 48. |
Robert Sherman; John Grob and Walter Whitlock; Dry Surface Cleaning Using Co2 Snow: Journal Of Vacuum Science & Technology B. Second Series, vol. 9, No. 4, Jul./Aug. 1991; pp. 1970-1977. |
Wayne T. McDermott, Richard C. Ockovic, Jin Jwang Wu and Robert J. Miller; Removing Submicron Surface Particles Using A Cryogenic Argon-Aerosol Technique: Microcontamination: Oct. 1991; pp. 33-36 and 94-95. |
International Search Report for corresponding PCT Application No. PCT/US97/11812 dated Nov. 10, 1997. |
10 MHz Ultrasonic Silicon Cleaning Tool, IBM Technical Disclosure Bulletin, vol. 37, No. 6A, p. 585, Jun. 1, 1997. |
Continuations (3)
|
Number |
Date |
Country |
Parent |
09/953504 |
Sep 2001 |
US |
Child |
10/243486 |
|
US |
Parent |
09/643328 |
Aug 2000 |
US |
Child |
09/953504 |
|
US |
Parent |
09/057182 |
Apr 1998 |
US |
Child |
09/643328 |
|
US |
Continuation in Parts (1)
|
Number |
Date |
Country |
Parent |
08/724518 |
Sep 1996 |
US |
Child |
09/057182 |
|
US |