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4798467 | Wyeth et al. | Jan 1989 | |
4817101 | Wyeth et al. | Mar 1989 | |
4940331 | Wyeth et al. | Jul 1990 | |
5025445 | Anderson et al. | Jun 1991 | |
5095492 | Sandstrom | Mar 1992 | |
5128601 | Orbach et al. | Jul 1992 | |
5371587 | de Groot et al. | Dec 1994 | |
5420877 | Sandstrom | May 1995 | |
5450207 | Fomenkov | Sep 1995 | |
5524144 | Suzuki | Jun 1996 | |
5691989 | Rakuljik et al. | Nov 1997 | |
5706301 | Lagerstrom | Jan 1998 | |
5754571 | Endoh et al. | May 1998 |
Entry |
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Ishihara, T., Sandstrom, R., Reiser, C., Sengupta, U., "Advanced Kryton Fluoride Excimer Laser for Microlithography", SPIE vol. 1674, Optical/Laser Microlithography V (1992) pp. 473-485, No Month. |