This invention relates in general to x-ray optics, and in particular to an improved x-ray focusing crystal optic having multiple layers, each layer having a predetermined crystalline orientation.
In x-ray analysis systems, high x-ray beam intensity and small beam spot sizes are important to reduce sample exposure times, increase spatial resolution, and consequently, improve the signal-to-background ratio and overall quality of x-ray analysis measurements. In the past, expensive and powerful x-ray sources, such as rotating anode x-ray tubes or synchrotrons, were the only options available to produce high-intensity x-ray beams. Recently, the development of x-ray optic devices has made it possible to collect the diverging radiation from an x-ray source by focusing the x-rays. A combination of x-ray focusing optics and small, low-power x-ray sources can produce x-ray beams with intensities comparable to those achieved with more expensive devices. As a result, systems based on a combination of small, inexpensive x-ray sources, excitation optics, and collection optics have greatly expanded the availability and capabilities of x-ray analysis equipment in, for example, small laboratories and in the field.
Monochromatization of x-ray beams in the excitation and/or detection paths is also useful, as discussed above. One existing x-ray monochromatization technology is based on diffraction of x-rays on optical crystals, for example, germanium (Ge) or silicon (Si) crystals. Curved crystals can provide deflection of diverging radiation from an x-ray source onto a target, as well as providing monochromatization of photons reaching the target. Two common types of curved crystals are known as singly-curved crystals and doubly-curved crystals (DCCs). Using what is known in the art as Rowland circle geometry, singly-curved crystals provide focusing in two dimensions, leaving x-ray radiation unfocused in the third or orthogonal plane. Doubly-curved crystals provide focusing of x-rays from the source to a point target in all three dimensions. This three-dimensional focusing is referred to in the art as “point-to-point” focusing.
Commonly-assigned U.S. Pat. Nos. 6,285,506 and 7,035,374 disclose various configurations of curved x-ray optics for x-ray focusing and monochromatization. In general, these patents disclose a flexible layer of material (e.g., Si) formed into curved optic elements. The monochromating function, and the transmission efficiency of the optic are determined by the crystal structure of the optic. The present invention provides certain improvements in the formation of curved crystal optics, offering important performance advantages.
The shortcomings of the prior art are overcome and additional advantages are provided by the present invention, which in one aspect is an optic for accepting and redirecting x-rays, the optic having at least two layers, the layers having a similar or differing material composition and similar or differing crystalline orientation. Each of the layers exhibits a diffractive effect, and their collective effect provides a diffractive effect on the received x-rays. In one embodiment, the layers are silicon, and are bonded together using a silicon-on-insulator bonding technique. In another embodiment, an adhesive bonding technique may be used. The optic may be a curved, monochromating optic.
In another aspect, the present invention is a method for forming an x-ray optic, using a material-on-insulator bonding technique to bond at least two material layers together, each of the at least two layers having a pre-determined crystalline orientation. In one embodiment, the two layers may be formed into a curved, monochromating optic.
Further additional features and advantages are realized through the techniques of the present invention. Other embodiments and aspects of the invention are described in detail herein and are considered a part of the claimed invention.
The subject matter regarded as the invention is particularly pointed out and distinctly claimed in the claims at the conclusion of the specification. The foregoing and other objects, features, and advantages of the invention are apparent from the following detailed description taken in connection with the accompanying drawings in which:
a-i depict the formation of a layered optic structure in respective processing steps, in accordance with an aspect of the present invention;
An x-ray optic structure and exemplary technique for its formation are disclosed with reference to
Silicon-on-insulator (SOI) bonding techniques are known in the art, as described in Celler et al, “Frontiers of Silicon-on-Insulator,” Journal of Applied Physics, Volume 93, Number 9, 1 May 2003, the entirety of which is incorporated by reference. In general, SOI techniques involve molecular bonding at the atomic/molecular level using, e.g., Van der Walls forces, and possibly chemically assisted bonding. The term “material-on-insulator” is used broadly herein to connote this family of techniques, without limiting the material to silicon. The present invention leverages the maturity of the SOI process to fabricate, in one embodiment, a curved monochromating x-ray optic having multiple layers, each with a potentially different crystal orientation.
A first substrate 10 (e.g., silicon or germanium) is provided having a first crystalline orientation (represented by the direction of the hash pattern). An oxide layer 20 is formed over the substrate 10 using known processes such as thermal growth (see Celler). A second layer 30 (e.g., silicon), having a second crystalline orientation, is bonded to layer 10 using the above-described SOI bonding techniques. The second layer is then polished 100 (using a standard planar polishing process, e.g., chem-mech polishing), leaving layer 30′. In one embodiment the resultant layer thicknesses are 1-5 um for the silicon layers, and about 0.1-0.5 um for the intervening oxide layers.
This process is repeated using another oxide layer 40, and another layer 50 (again, having its own customized orientation). Layer 50 is then polished 100 leaving layer 50′.
This process can be repeated again, using another oxide layer 60, and another layer 70 (again, having its own customized orientation). Layer 70 is then polished 100 leaving layer 70′.
According to the present invention, each individual crystalline layer provides an individual diffractive effect. These diffractive effects can be separately modeled, and their collective effect in the final optic can then be predicted and implemented according to final design criteria. This stands in contrast to known “multi-layer” optics, having many layers of angstrom/nanometer thicknesses, each without an individual diffractive effect, but wherein the interactions between the layers result in an overall diffractive effect.
In another aspect of the present invention, layers of differing material composition can be employed in the same optic, with either the same or differing crystalline orientations between the layers (or mixes thereof); and layers of similar (or the same) material composition can be employed, again with either the same or differing crystalline orientations between the layers (or mixes thereof). In any of these aspects of the present invention, especially where the above-described methods of material-on-insulator may be unsuitable, adhesive (e.g., epoxy) layers can be used to bind adjacent crystalline layers in accordance with the sequence of steps discussed above for the material-on-insulator bonding technique.
Structure 110 can then be formed into a curved, monochromating optic, including a doubly-curved crystal (DCC) optic. One embodiment of such a doubly-curved optical device is depicted in
In the embodiment of
In this device, the epoxy layer 112 holds and constrains the flexible layer 110 to a selected geometry having a curvature. Preferably, the thickness of the epoxy layer is greater than 20 μm and the thickness of the flexible layer is greater than 5 μm. Further, the thickness of the epoxy layer is typically thicker than the thickness of the flexible layer. The flexible layer can be one of a large variety of materials, including: mica, Si, Ge, quartz, plastic, glass etc. The epoxy layer 112 can be a paste type with viscosity in the order of 103 to 104 poise and 30 to 60 minutes pot life. The backing plate 114 can be a solid object that bonds well with the epoxy. The surface 118 of the backing plate can be flat (
Surrounding the flexible layer may be a thin sheet of protection material 116, such as a thin plastic, which is used around the flexible layer edge (see
Doubly-curved optical devices, such as doubly-curved crystal (DCC) optics, are now used in material analysis to collect and focus x-rays from a large solid angle and increase the usable flux from an x-ray source. Three-dimensional focusing of characteristic x-rays can be achieved by diffraction from a toroidal crystal used with a small x-ray source. This point-to-point Johan geometry is illustrated in
As a further enhancement,
The layered optic structure of the present invention offers the following advantages:
The process steps depicted herein are just examples. There may be many variations to these diagrams or the steps (or operations) described therein without departing from the spirit of the invention. For instance, the steps may be performed in a differing order, or steps may be added, deleted or modified. All of these variations are considered a part of the claimed invention.
Although preferred embodiments have been depicted and described in detail herein, it will be apparent to those skilled in the relevant art that various modifications, additions, substitutions and the like can be made without departing from the spirit of the invention and these are therefore considered to be within the scope of the invention as defined in the following claims.
This application claims the benefit of U.S. Provisional Application No. 60/866,134, filed Nov. 16, 2006. This Provisional Application is hereby incorporated herein by reference in its entirety.
Number | Date | Country | |
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60866134 | Nov 2006 | US |