IMS Nanofabrication AG

Organization

Vienna, AT

Organizations

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Beam pattern device having beam absorber structure
- Patent number 12,154,756
- Issue date Nov 26, 2024
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern data processing for programmable direct-write apparatus
- Patent number 12,040,157
- Issue date Jul 16, 2024
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged-particle source
- Patent number 11,735,391
- Issue date Aug 22, 2023
- IMS Nanofabrication GmbH
- Stefan Gerhold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for irradiating a target using restricted placement grids
- Patent number 11,569,064
- Issue date Jan 31, 2023
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adapting the duration of exposure slots in multi-beam writers
- Patent number 11,099,482
- Issue date Aug 24, 2021
- IMS Nanofabrication GmbH
- Gottfried Hochleitner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged-particle source and method for cleaning a charged-particle...
- Patent number 10,840,054
- Issue date Nov 17, 2020
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Non-linear dose- and blur-dependent edge placement correction
- Patent number 10,651,010
- Issue date May 12, 2020
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dose-related feature reshaping in an exposure pattern to be exposed...
- Patent number 10,522,329
- Issue date Dec 31, 2019
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-beam writing using inclined exposure stripes
- Patent number 10,410,831
- Issue date Sep 10, 2019
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for compensating pattern placement errors caused by variatio...
- Patent number 10,325,756
- Issue date Jun 18, 2019
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Advanced dose-level quantization of multibeam-writers
- Patent number 10,325,757
- Issue date Jun 18, 2019
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bi-directional double-pass multi-beam writing
- Patent number 9,799,487
- Issue date Oct 24, 2017
- IMS Nanofabrication AG
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-beam writing of pattern areas of relaxed critical dimension
- Patent number 9,653,263
- Issue date May 16, 2017
- IMS Nanofabrication AG
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Correction of short-range dislocations in a multi-beam writer
- Patent number 9,568,907
- Issue date Feb 14, 2017
- IMS Nanofabrication AG
- Elmar Platzgummer
- G05 - CONTROLLING REGULATING
Information Patent Grant
Compensation of imaging deviations in a particle-beam writer using...
- Patent number 9,520,268
- Issue date Dec 13, 2016
- IMS Nanofabrication AG
- Elmar Platzgummer
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Compensation of dose inhomogeneity using overlapping exposure spots
- Patent number 9,495,499
- Issue date Nov 15, 2016
- IMS Nanofabrication AG
- Elmar Platzgummer
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Multi-beam tool for cutting patterns
- Patent number 9,443,699
- Issue date Sep 13, 2016
- IMS Nanofabrication AG
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compensation of dose inhomogeneity using overlapping exposure spots
- Patent number 9,443,052
- Issue date Sep 13, 2016
- IMS Nanofabrication AG
- Elmar Platzgummer
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Customizing a particle-beam writer using a convolution kernel
- Patent number 9,373,482
- Issue date Jun 21, 2016
- IMS Nanofabrication AG
- Elmar Platzgummer
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Compensation of defective beamlets in a charged-particle multi-beam...
- Patent number 9,269,543
- Issue date Feb 23, 2016
- IMS Nanofabrication AG
- Rafael Reiter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern definition device having multiple blanking arrays
- Patent number 9,099,277
- Issue date Aug 4, 2015
- IMS Nanofabrication AG
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-voltage insulation device for charged-particle optical apparatus
- Patent number 9,093,201
- Issue date Jul 28, 2015
- IMS Nanofabrication AG
- Elmar Platzgummer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for charged-particle multi-beam exposure
- Patent number 9,053,906
- Issue date Jun 9, 2015
- IMS Nanofabrication AG
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-beam deflector array means with bonded electrodes
- Patent number 8,563,942
- Issue date Oct 22, 2013
- IMS Nanofabrication AG
- Elmar Platzgummer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Pattern definition device with multiple multibeam array
- Patent number 8,546,767
- Issue date Oct 1, 2013
- IMS Nanofabrication AG
- Elmar Platzgummer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for multi-beam exposure on a target
- Patent number 8,378,320
- Issue date Feb 19, 2013
- IMS Nanofabrication AG
- Elmar Platzgummer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged-particle exposure apparatus with electrostatic zone plate
- Patent number 8,304,749
- Issue date Nov 6, 2012
- IMS Nanofabrication AG
- Elmar Platzgummer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Global point spreading function in multi-beam patterning
- Patent number 8,278,635
- Issue date Oct 2, 2012
- IMS Nanofabrication AG
- Elmar Platzgummer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Compensation of dose inhomogeneity and image distortion
- Patent number 8,258,488
- Issue date Sep 4, 2012
- IMS Nanofabrication AG
- Elmar Platzgummer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for maskless particle-beam exposure
- Patent number 8,222,621
- Issue date Jul 17, 2012
- IMS Nanofabrication AG
- Heinrich Fragner
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
Determination of Imaging Transfer Function of a Charged-Particle Ex...
- Publication number 20240427254
- Publication date Dec 26, 2024
- IMS Nanofabrication GmbH
- Christoph Spengler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optimizing Image Distortion in a Multi Beam Charged Particle Proces...
- Publication number 20240304413
- Publication date Sep 12, 2024
- IMS Nanofabrication GmbH
- Christoph Spengler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Device and Method for Calibrating a Charged-Particle Beam
- Publication number 20240304407
- Publication date Sep 12, 2024
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Determining Focal Properties in a Target Beam Field of a...
- Publication number 20240304415
- Publication date Sep 12, 2024
- IMS Nanofabrication GmbH
- Christoph Spengler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Adjustable Magnetic Lens Having Permanent-Magnetic and Electromagne...
- Publication number 20240212970
- Publication date Jun 27, 2024
- IMS Nanofabrication GmbH
- Christoph Spengler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM LITHOGRAPHY APPARATUS, ELECTRON BEAM LITHOGRAPHY METH...
- Publication number 20240145212
- Publication date May 2, 2024
- NIPPON CONTROL SYSTEM CORPORATION
- Masakazu HAMAJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Adjustable Permanent Magnetic Lens Having Thermal Control Device
- Publication number 20240021403
- Publication date Jan 18, 2024
- IMS Nanofabrication GmbH
- Dietmar Puchberger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-Beam Pattern Definition Device
- Publication number 20230360880
- Publication date Nov 9, 2023
- IMS Nanofabrication GmbH
- Stefan Eder-Kapl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Adjustable Permanent Magnetic Lens Having Shunting Device
- Publication number 20230360878
- Publication date Nov 9, 2023
- IMS Nanofabrication GmbH
- Dietmar Puchberger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Correction of Thermal Expansion in a Lithographic Device
- Publication number 20230296989
- Publication date Sep 21, 2023
- IMS Nanofabrication GmbH
- Matthias Liertzer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Beam Pattern Device Having Beam Absorber Structure
- Publication number 20230052445
- Publication date Feb 16, 2023
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electromagnetic Lens
- Publication number 20230015805
- Publication date Jan 19, 2023
- IMS Nanofabrication GmbH
- Christoph Spengler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pattern Data Processing For Programmable Direct-Write Apparatus
- Publication number 20220384143
- Publication date Dec 1, 2022
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged-Particle Source
- Publication number 20210335573
- Publication date Oct 28, 2021
- IMS Nanofabrication GmbH
- Stefan Gerhold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Correction of Blur Variation in a Multi-Beam Writer
- Publication number 20210240074
- Publication date Aug 5, 2021
- IMS Nanofabrication GmbH
- Christoph Spengler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Adapting the Duration of Exposure Slots in Multi-Beam Writers
- Publication number 20200348597
- Publication date Nov 5, 2020
- IMS Nanofabrication GmbH
- Gottfried Hochleitner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Charged-Particle Source and Method for Cleaning a Charged-Particle...
- Publication number 20190237288
- Publication date Aug 1, 2019
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Non-linear Dose- and Blur-Dependent Edge Placement Correction
- Publication number 20190214226
- Publication date Jul 11, 2019
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Irradiating a Target Using Restricted Placement Grids
- Publication number 20190088448
- Publication date Mar 21, 2019
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dose-Related Feature Reshaping in an Exposure Pattern to be Exposed...
- Publication number 20190066976
- Publication date Feb 28, 2019
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Advanced Dose-Level Quantization for Multibeam-Writers
- Publication number 20180218879
- Publication date Aug 2, 2018
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Compensating Pattern Placement Errors Caused by Variatio...
- Publication number 20170357153
- Publication date Dec 14, 2017
- IMS Nanofabrication AG
- Elmar Platzgummer
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Multi-Beam Writing Using Inclined Exposure Stripes
- Publication number 20160336147
- Publication date Nov 17, 2016
- IMS Nanofabrication AG
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-Beam Writing of Pattern Areas of Relaxed Critical Dimension
- Publication number 20160276132
- Publication date Sep 22, 2016
- IMS Nanofabrication AG
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Bi-Directional Double-Pass Multi-Beam Writing
- Publication number 20160276131
- Publication date Sep 22, 2016
- IMS Nanofabrication AG
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Correction of Short-Range Dislocations in a Multi-Beam Writer
- Publication number 20160071684
- Publication date Mar 10, 2016
- IMS Nanofabrication AG
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Compensation of Imaging Deviations in a Particle-Beam Writer Using...
- Publication number 20160013019
- Publication date Jan 14, 2016
- IMS Nanofabrication AG
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Customizing a Particle-Beam Writer Using a Convolution Kernel
- Publication number 20160012170
- Publication date Jan 14, 2016
- IMS Nanofabrication AG
- Elmar Platzgummer
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Compensation of Dose Inhomogeneity Using Overlapping Exposure Spots
- Publication number 20150347660
- Publication date Dec 3, 2015
- IMS Nanofabrication AG
- Elmar Platzgummer
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Multi-Beam Tool for Cutting Patterns
- Publication number 20150311030
- Publication date Oct 29, 2015
- IMS Nanofabrication AG
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS

Trademarklast 30 trademarks

Information Trademark
79378896 - MCMW
- Serial number 79378896
- Registration number 7510443
- Filing date Aug 16, 2023
- IMS Nanofabrication GmbH
- 7 - Machines and machine tools
Information Trademark
79253933 - IMS NANOFABRICATION WE WRITE THE FUTURE
- Serial number 79253933
- Registration number 6020996
- Filing date Jan 16, 2019
- IMS Nanofabrication GmbH
- 7 - Machines and machine tools
Information Trademark
79124045 - MESA
- Serial number 79124045
- Registration number 4356070
- Filing date Oct 25, 2012
- IMS Nanofabrication AG
- 7 - Machines and machine tools

IMS Nanofabrication AG

Organization

Patents Grantslast 30 patents

Beam pattern device having beam absorber structure

Pattern data processing for programmable direct-write apparatus

Charged-particle source

Method for irradiating a target using restricted placement grids

Adapting the duration of exposure slots in multi-beam writers

Charged-particle source and method for cleaning a charged-particle...

Non-linear dose- and blur-dependent edge placement correction

Dose-related feature reshaping in an exposure pattern to be exposed...

Multi-beam writing using inclined exposure stripes

Method for compensating pattern placement errors caused by variatio...

Advanced dose-level quantization of multibeam-writers

Bi-directional double-pass multi-beam writing

Multi-beam writing of pattern areas of relaxed critical dimension

Correction of short-range dislocations in a multi-beam writer

Compensation of imaging deviations in a particle-beam writer using...

Compensation of dose inhomogeneity using overlapping exposure spots

Multi-beam tool for cutting patterns

Compensation of dose inhomogeneity using overlapping exposure spots

Customizing a particle-beam writer using a convolution kernel

Compensation of defective beamlets in a charged-particle multi-beam...

Pattern definition device having multiple blanking arrays

High-voltage insulation device for charged-particle optical apparatus

Method for charged-particle multi-beam exposure

Multi-beam deflector array means with bonded electrodes

Pattern definition device with multiple multibeam array

Method for multi-beam exposure on a target

Charged-particle exposure apparatus with electrostatic zone plate

Global point spreading function in multi-beam patterning

Compensation of dose inhomogeneity and image distortion

Method for maskless particle-beam exposure

Patents Applicationslast 30 patents

Determination of Imaging Transfer Function of a Charged-Particle Ex...

Optimizing Image Distortion in a Multi Beam Charged Particle Proces...

Device and Method for Calibrating a Charged-Particle Beam

Method for Determining Focal Properties in a Target Beam Field of a...

Adjustable Magnetic Lens Having Permanent-Magnetic and Electromagne...

ELECTRON BEAM LITHOGRAPHY APPARATUS, ELECTRON BEAM LITHOGRAPHY METH...

Adjustable Permanent Magnetic Lens Having Thermal Control Device

Multi-Beam Pattern Definition Device

Adjustable Permanent Magnetic Lens Having Shunting Device

Correction of Thermal Expansion in a Lithographic Device

Beam Pattern Device Having Beam Absorber Structure

Electromagnetic Lens

Pattern Data Processing For Programmable Direct-Write Apparatus

Charged-Particle Source

Correction of Blur Variation in a Multi-Beam Writer

Adapting the Duration of Exposure Slots in Multi-Beam Writers

Charged-Particle Source and Method for Cleaning a Charged-Particle...

Non-linear Dose- and Blur-Dependent Edge Placement Correction

Method for Irradiating a Target Using Restricted Placement Grids

Dose-Related Feature Reshaping in an Exposure Pattern to be Exposed...

Advanced Dose-Level Quantization for Multibeam-Writers

Method for Compensating Pattern Placement Errors Caused by Variatio...

Multi-Beam Writing Using Inclined Exposure Stripes

Multi-Beam Writing of Pattern Areas of Relaxed Critical Dimension

Bi-Directional Double-Pass Multi-Beam Writing

Correction of Short-Range Dislocations in a Multi-Beam Writer

Compensation of Imaging Deviations in a Particle-Beam Writer Using...

Customizing a Particle-Beam Writer Using a Convolution Kernel

Compensation of Dose Inhomogeneity Using Overlapping Exposure Spots

Multi-Beam Tool for Cutting Patterns

Trademarklast 30 trademarks

79378896 - MCMW

79253933 - IMS NANOFABRICATION WE WRITE THE FUTURE

79124045 - MESA