Akiyuki Minami

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor substrate
- Patent number 10,680,068
- Issue date Jun 9, 2020
- SICOXS CORPORATION
- Ko Imaoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor substrate and method for manufacturing semiconductor...
- Patent number 9,773,678
- Issue date Sep 26, 2017
- Kabushiki Kaisha Toyota Jidoshokki
- Ko Imaoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method for semiconductor substrate
- Patent number 9,761,479
- Issue date Sep 12, 2017
- Kabushiki Kaisha Toyota Jidoshokki
- Ko Imaoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor non-volatile memory having semiconductor non-volatile...
- Patent number 7,804,127
- Issue date Sep 28, 2010
- Oki Electric Industry Co., Ltd.
- Koji Takaya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for exposure
- Patent number 6,757,049
- Issue date Jun 29, 2004
- Oki Electric Industry Co., Ltd.
- Akiyuki Minami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing alignment mark
- Patent number 6,601,314
- Issue date Aug 5, 2003
- Oki Electric Industry Co, Ltd.
- Satoshi Machida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist mask for measuring the accuracy of overlaid layers
- Patent number 6,589,385
- Issue date Jul 8, 2003
- Oki Electric Industry Co., Ltd.
- Akiyuki Minami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist mask for measuring the accuracy of overlaid layers
- Patent number 6,562,188
- Issue date May 13, 2003
- Oki Electric Industry Co., Ltd.
- Akiyuki Minami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor wafer having resist mask wit...
- Patent number 6,559,063
- Issue date May 6, 2003
- Oki Electric Industry Co., Ltd.
- Akiyuki Minami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist mask having measurement marks for measuring the accuracy of...
- Patent number 6,440,262
- Issue date Aug 27, 2002
- Oki Electric Industry Co., Ltd.
- Akiyuki Minami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist mark having measurement marks for measuring the accuracy of...
- Patent number 6,368,980
- Issue date Apr 9, 2002
- Oki Electric Industry Co., Ltd.
- Akiyuki Minami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment marks of semiconductor substrate and manufacturing method...
- Patent number 6,140,711
- Issue date Oct 31, 2000
- Oki Electric Industry Co., Ltd.
- Satoshi Machida
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR SUBSTRATE
- Publication number 20200006493
- Publication date Jan 2, 2020
- SICOXS CORPORATION
- Ko IMAOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR SUBSTRATE AND METHOD FOR MANUFACTURING SEMICONDUCTOR...
- Publication number 20170213735
- Publication date Jul 27, 2017
- Kabushiki Kaisha Toyota Jidoshokki
- Ko IMAOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD FOR SEMICONDUCTOR SUBSTRATE
- Publication number 20160204023
- Publication date Jul 14, 2016
- KABUSHIKI KAISHA TOYOTA JIDOSHOKKI
- Ko IMAOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor non-volatile memory cell, method of producing the sam...
- Publication number 20090045454
- Publication date Feb 19, 2009
- Oki Electric Industry Co., Ltd.
- Koji Takaya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for detecting alignment accuracy
- Publication number 20060109464
- Publication date May 25, 2006
- Akiyuki Minami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Apparatus and method for exposure
- Publication number 20030081189
- Publication date May 1, 2003
- Akiyuki Minami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist mask for measuring the accuracy of overlaid layers
- Publication number 20020182817
- Publication date Dec 5, 2002
- Akiyuki Minami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing alignment mark
- Publication number 20020178600
- Publication date Dec 5, 2002
- Satoshi Machida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Resist mask for measuring the accuracy of overlaid layers
- Publication number 20020177317
- Publication date Nov 28, 2002
- Akiyuki Minami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Resist mask having measurement marks for measuring the accuracy of...
- Publication number 20020086549
- Publication date Jul 4, 2002
- Akiyuki Minami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for manufacturing semiconductor wafer having resist mask wit...
- Publication number 20020081860
- Publication date Jun 27, 2002
- Akiyuki Minami
- H01 - BASIC ELECTRIC ELEMENTS

Akiyuki Minami

Person

Patents Grantslast 30 patents

Semiconductor substrate

Semiconductor substrate and method for manufacturing semiconductor...

Manufacturing method for semiconductor substrate

Semiconductor non-volatile memory having semiconductor non-volatile...

Apparatus and method for exposure

Method of manufacturing alignment mark

Resist mask for measuring the accuracy of overlaid layers

Resist mask for measuring the accuracy of overlaid layers

Method for manufacturing semiconductor wafer having resist mask wit...

Resist mask having measurement marks for measuring the accuracy of...

Resist mark having measurement marks for measuring the accuracy of...

Alignment marks of semiconductor substrate and manufacturing method...

Patents Applicationslast 30 patents

SEMICONDUCTOR SUBSTRATE

SEMICONDUCTOR SUBSTRATE AND METHOD FOR MANUFACTURING SEMICONDUCTOR...

MANUFACTURING METHOD FOR SEMICONDUCTOR SUBSTRATE

Semiconductor non-volatile memory cell, method of producing the sam...

Method for detecting alignment accuracy

Apparatus and method for exposure

Resist mask for measuring the accuracy of overlaid layers

Method of manufacturing alignment mark

Resist mask for measuring the accuracy of overlaid layers

Resist mask having measurement marks for measuring the accuracy of...

Method for manufacturing semiconductor wafer having resist mask wit...