Alan Jensen

Person

Mountain House, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Alternating etch and passivation process
- Patent number 11,848,212
- Issue date Dec 19, 2023
- Lam Research Corporation
- Seongjun Heo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alternating etch and passivation process
- Patent number 11,551,938
- Issue date Jan 10, 2023
- Lam Research Corporation
- Seongjun Heo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dielectric contact etch
- Patent number 10,134,600
- Issue date Nov 20, 2018
- Lam Research Corporation
- Leonid Romm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hydrogen activated atomic layer etching
- Patent number 9,779,956
- Issue date Oct 3, 2017
- Lam Research Corporation
- Xin Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulsed dielectric etch process for in-situ metal hard mask shape co...
- Patent number 8,906,810
- Issue date Dec 9, 2014
- Lam Research Corporation
- Ananth Indrakanti
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas mixture for removing photoresist and post etch residue from low...
- Patent number 7,479,457
- Issue date Jan 20, 2009
- Lam Research Corporation
- Cristian Paduraru
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for controlling CMP pad surface finish
- Patent number 6,939,207
- Issue date Sep 6, 2005
- Lam Research Corporation
- Alan J. Jensen
- B24 - GRINDING POLISHING
Information Patent Grant
Method and apparatus for conditioning a polishing pad with sonic en...
- Patent number 6,875,091
- Issue date Apr 5, 2005
- Lam Research Corporation
- Allan M. Radman
- B24 - GRINDING POLISHING
Information Patent Grant
Fluid venting platen for optimizing wafer polishing
- Patent number 6,769,970
- Issue date Aug 3, 2004
- Lam Research Corporation
- Travis Robert Taylor
- B24 - GRINDING POLISHING
Information Patent Grant
Method and apparatus for conditioning fixed-abrasive polishing pads
- Patent number 6,752,698
- Issue date Jun 22, 2004
- Lam Research Corporation
- Peter Renteln
- B24 - GRINDING POLISHING
Information Patent Grant
Method and apparatus for controlling CMP pad surface finish
- Patent number 6,645,052
- Issue date Nov 11, 2003
- Lam Research Corporation
- Alan J. Jensen
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical planarization or polishing pad with sections ha...
- Patent number 6,634,936
- Issue date Oct 21, 2003
- Lam Research Corporation
- Alan J. Jensen
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical planarization or polishing pad with sections ha...
- Patent number 6,585,579
- Issue date Jul 1, 2003
- Lam Research Corporation
- Alan J. Jensen
- B24 - GRINDING POLISHING
Information Patent Grant
Method of optimizing chemical mechanical planarization process
- Patent number 6,315,634
- Issue date Nov 13, 2001
- Lam Research Corporation
- Alan John Jensen
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical planarization or polishing pad with sections ha...
- Patent number 6,261,168
- Issue date Jul 17, 2001
- Lam Research Corporation
- Alan J. Jensen
- B24 - GRINDING POLISHING
Information Patent Grant
Method for processing a substrate using a system having a roller wi...
- Patent number 6,059,889
- Issue date May 9, 2000
- Ontrak Systems, Inc.
- Alan J. Jensen
- B08 - CLEANING
Information Patent Grant
Roller with treading and system including the same
- Patent number 5,862,560
- Issue date Jan 26, 1999
- Ontrak Systems, Inc.
- Alan J. Jensen
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS AND PROCESS FOR EUV DRY RESIST SENSITIZATION BY GAS PHASE...
- Publication number 20240192590
- Publication date Jun 13, 2024
- LAM RESEARCH CORPORATION
- Sivananda Krishnan Kanakasabapathy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALTERNATING ETCH AND PASSIVATION PROCESS
- Publication number 20240087904
- Publication date Mar 14, 2024
- LAM RESEARCH CORPORATION
- Seongjun Heo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL OF METALLIC CONTAMINATION FROM METAL-CONTAINING PHOTORESIST
- Publication number 20240036474
- Publication date Feb 1, 2024
- LAM RESEARCH CORPORATION
- Daniel PETER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SURFACE MODIFICATION FOR METAL-CONTAINING PHOTORESIST DEPOSITION
- Publication number 20230230811
- Publication date Jul 20, 2023
- LAM RESEARCH CORPORATION
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALTERNATING ETCH AND PASSIVATION PROCESS
- Publication number 20230197459
- Publication date Jun 22, 2023
- LAM RESEARCH CORPORATION
- Seongjun Heo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CORE REMOVAL
- Publication number 20230066676
- Publication date Mar 2, 2023
- LAM RESEARCH CORPORATION
- Sivananda Krishnan KANAKASABAPATHY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALTERNATING ETCH AND PASSIVATION PROCESS
- Publication number 20220208551
- Publication date Jun 30, 2022
- LAM RESEARCH CORPORATION
- Seongjun Heo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIELECTRIC CONTACT ETCH
- Publication number 20180226260
- Publication date Aug 9, 2018
- LAM RESEARCH CORPORATION
- Leonid ROMM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSED DIELECTRIC ETCH PROCESS FOR IN-SITU METAL HARD MASK SHAPE CO...
- Publication number 20140335697
- Publication date Nov 13, 2014
- LAM RESEARCH CORPORATION
- Ananth Indrakanti
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NITRIDE PLASMA ETCH WITH HIGHLY TUNABLE SELECTIVITY TO OXIDE
- Publication number 20110223770
- Publication date Sep 15, 2011
- LAM RESEARCH CORPORATION
- Alan Jensen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HELIUM DESCUMMING
- Publication number 20090291562
- Publication date Nov 26, 2009
- LAM RESEARCH CORPORATION
- Alan Jensen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gas mixture for removing photoresist and post etch residue from low...
- Publication number 20070054496
- Publication date Mar 8, 2007
- Cristian Paduraru
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for controlling CMP pad surface finish
- Publication number 20040127144
- Publication date Jul 1, 2004
- Lam Research Corporation
- Alan J. Jensen
- B24 - GRINDING POLISHING
Information Patent Application
Method and apparatus for controlling CMP pad surface finish
- Publication number 20030082997
- Publication date May 1, 2003
- Alan J. Jensen
- B24 - GRINDING POLISHING
Information Patent Application
Method and apparatus for conditioning a polishing pad with sonic en...
- Publication number 20020086622
- Publication date Jul 4, 2002
- Lam Research Corporation
- Allan M. Radman
- B24 - GRINDING POLISHING
Information Patent Application
Chemical mechanical planarization or polishing pad with sections ha...
- Publication number 20020028646
- Publication date Mar 7, 2002
- Lam Research Corporation
- Alan J. Jensen
- B24 - GRINDING POLISHING
Information Patent Application
Chemical mechanical planarization or polishing pad with sections ha...
- Publication number 20010031615
- Publication date Oct 18, 2001
- Lam Research Corporation
- Alan J. Jensen
- B24 - GRINDING POLISHING

Alan Jensen

Person

Patents Grantslast 30 patents

Alternating etch and passivation process

Alternating etch and passivation process

Dielectric contact etch

Hydrogen activated atomic layer etching

Pulsed dielectric etch process for in-situ metal hard mask shape co...

Gas mixture for removing photoresist and post etch residue from low...

Method and apparatus for controlling CMP pad surface finish

Method and apparatus for conditioning a polishing pad with sonic en...

Fluid venting platen for optimizing wafer polishing

Method and apparatus for conditioning fixed-abrasive polishing pads

Method and apparatus for controlling CMP pad surface finish

Chemical mechanical planarization or polishing pad with sections ha...

Chemical mechanical planarization or polishing pad with sections ha...

Method of optimizing chemical mechanical planarization process

Chemical mechanical planarization or polishing pad with sections ha...

Method for processing a substrate using a system having a roller wi...

Roller with treading and system including the same

Patents Applicationslast 30 patents

APPARATUS AND PROCESS FOR EUV DRY RESIST SENSITIZATION BY GAS PHASE...

ALTERNATING ETCH AND PASSIVATION PROCESS

CONTROL OF METALLIC CONTAMINATION FROM METAL-CONTAINING PHOTORESIST

SURFACE MODIFICATION FOR METAL-CONTAINING PHOTORESIST DEPOSITION

ALTERNATING ETCH AND PASSIVATION PROCESS

CORE REMOVAL

ALTERNATING ETCH AND PASSIVATION PROCESS

DIELECTRIC CONTACT ETCH

PULSED DIELECTRIC ETCH PROCESS FOR IN-SITU METAL HARD MASK SHAPE CO...

NITRIDE PLASMA ETCH WITH HIGHLY TUNABLE SELECTIVITY TO OXIDE

HELIUM DESCUMMING

Gas mixture for removing photoresist and post etch residue from low...

Method and apparatus for controlling CMP pad surface finish

Method and apparatus for controlling CMP pad surface finish

Method and apparatus for conditioning a polishing pad with sonic en...

Chemical mechanical planarization or polishing pad with sections ha...

Chemical mechanical planarization or polishing pad with sections ha...