Albert Sanghyup Lee

Person

Cupertino, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Atomic layer deposition of HfAlC as a metal gate workfunction mater...
- Patent number 9,607,904
- Issue date Mar 28, 2017
- Intermolecular, Inc.
- Albert Sanghyup Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reduction of native oxides by annealing in reducing gas or plasma
- Patent number 9,312,137
- Issue date Apr 12, 2016
- Intermolecular, Inc.
- Frank Greer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Combinatorial approach for screening of ALD film stacks
- Patent number 8,906,790
- Issue date Dec 9, 2014
- Intermolecular, Inc.
- Albert Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
ReRAM stacks preparation by using single ALD or PVD chamber
- Patent number 8,846,484
- Issue date Sep 30, 2014
- Intermolecular, Inc.
- Albert Sanghyup Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ nitride initiation layer for RRAM metal oxide switching mat...
- Patent number 8,741,772
- Issue date Jun 3, 2014
- Intermolecular, Inc.
- Albert Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer deposition of zirconium oxide for forming resistive-sw...
- Patent number 8,741,698
- Issue date Jun 3, 2014
- Intermolecular, Inc.
- Jinhong Tong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing of metal oxide films for resistive memory device...
- Patent number 8,679,988
- Issue date Mar 25, 2014
- Intermolecular, Inc.
- Albert Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Combinatorial approach for screening of ALD film stacks
- Patent number 8,609,519
- Issue date Dec 17, 2013
- Intermolecular, Inc.
- Albert Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Hermetic low dielectric constant layer for barrier applications
- Patent number 7,288,205
- Issue date Oct 30, 2007
- Applied Materials, Inc.
- Annamalai Lakshmanan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Adhesion improvement for low k dielectrics to conductive materials
- Patent number 7,229,911
- Issue date Jun 12, 2007
- Applied Materials, Inc.
- Nagarajan Rajagopalan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Bi-layer approach for a hermetic low dielectric constant layer for...
- Patent number 7,091,137
- Issue date Aug 15, 2006
- Applied Materials
- Albert Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of processing a substrate in a processing chamber
- Patent number 6,365,518
- Issue date Apr 2, 2002
- Applied Materials, Inc.
- Albert Lee
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Semiconductor Device Metal-Insulator-Semiconductor Contacts with In...
- Publication number 20160181380
- Publication date Jun 23, 2016
- INTERMOLECULAR INC.
- Amol Joshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Atomic Layer Deposition of HfAlC as a Metal Gate Workfunction Mater...
- Publication number 20160035631
- Publication date Feb 4, 2016
- GLOBALFOUNDRIES, Inc.
- Albert Sanghyup Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metal-insulator-semiconductor (MIS) contact with controlled defect...
- Publication number 20150380309
- Publication date Dec 31, 2015
- INTERMOLECULAR INC.
- Salil Mujumdar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reduction of native oxides by annealing in reducing gas or plasma
- Publication number 20150118828
- Publication date Apr 30, 2015
- INTERMOLECULAR INC.
- Frank Greer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR DEPOSITING AN ALUMINUM OXIDE LAYER OVER GERMANIUM SUSBT...
- Publication number 20150093914
- Publication date Apr 2, 2015
- Intermolecular
- Bin Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR REMOVING A NATIVE OXIDE LAYER FROM GERMANIUM SUSBTRATES...
- Publication number 20150093889
- Publication date Apr 2, 2015
- Intermolecular
- Bin Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR REMOVING A NATIVE OXIDE LAYER FROM GERMANIUM SUSBTRATES...
- Publication number 20150093887
- Publication date Apr 2, 2015
- GLOBALFOUNDRIES, Inc.
- Bin Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
In-Situ Nitride Initiation Layer For RRAM Metal Oxide Switching Mat...
- Publication number 20140284545
- Publication date Sep 25, 2014
- INTERMOLECULAR INC.
- Albert Sanghyup Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Combinatorial Approach for Screening of ALD Film Stacks
- Publication number 20140065788
- Publication date Mar 6, 2014
- Intermolecular, Inc.
- Albert Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ADHESION IMPROVEMENT FOR LOW K DIELECTRICS TO CONDUCTIVE MATERIALS
- Publication number 20130230986
- Publication date Sep 5, 2013
- Applied Materials, Inc.
- NAGARAJAN RAJAGOPALAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IN-SITU NITRIDE INITIATION LAYER FOR RRAM METAL OXIDE SWITCHING MAT...
- Publication number 20130214231
- Publication date Aug 22, 2013
- Intermolecular, Inc.
- Albert Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ReRAM STACKS PREPARATION BY USING SINGLE ALD OR PVD CHAMBER
- Publication number 20130210193
- Publication date Aug 15, 2013
- Intermolecular, Inc.
- Albert Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER DEPOSITION OF ZIRCONIUM OXIDE FOR FORMING RESISTIVE-SW...
- Publication number 20130134376
- Publication date May 30, 2013
- Intermolecular, Inc.
- Jinhong Tong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING OF METAL OXIDE FILMS FOR RESISTIVE MEMORY DEVICE...
- Publication number 20130130464
- Publication date May 23, 2013
- Intermolecular, Inc.
- Albert Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMBINATORIAL APPROACH FOR SCREENING OF ALD FILM STACKS
- Publication number 20130130490
- Publication date May 23, 2013
- Intermolecular, Inc.
- Albert Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Adhesion improvement for low k dielectrics to conductive materials
- Publication number 20060046479
- Publication date Mar 2, 2006
- APPLIED MATERIALS, INC.
- Nagarajan Rajagopalan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Hermetic low dielectric constant layer for barrier applications
- Publication number 20060006140
- Publication date Jan 12, 2006
- Annamalai Lakshmanan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Adhesion improvement for low k dielectrics to conductive materials
- Publication number 20050233555
- Publication date Oct 20, 2005
- Nagarajan Rajagopalan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Bi-layer approach for a hermetic low dielectric constant layer for...
- Publication number 20050042889
- Publication date Feb 24, 2005
- Albert Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Albert Sanghyup Lee

Person

Patents Grantslast 30 patents

Atomic layer deposition of HfAlC as a metal gate workfunction mater...

Reduction of native oxides by annealing in reducing gas or plasma

Combinatorial approach for screening of ALD film stacks

ReRAM stacks preparation by using single ALD or PVD chamber

In-situ nitride initiation layer for RRAM metal oxide switching mat...

Atomic layer deposition of zirconium oxide for forming resistive-sw...

Plasma processing of metal oxide films for resistive memory device...

Combinatorial approach for screening of ALD film stacks

Hermetic low dielectric constant layer for barrier applications

Adhesion improvement for low k dielectrics to conductive materials

Bi-layer approach for a hermetic low dielectric constant layer for...

Method of processing a substrate in a processing chamber

Patents Applicationslast 30 patents

Semiconductor Device Metal-Insulator-Semiconductor Contacts with In...

Atomic Layer Deposition of HfAlC as a Metal Gate Workfunction Mater...

Metal-insulator-semiconductor (MIS) contact with controlled defect...

Reduction of native oxides by annealing in reducing gas or plasma

METHODS FOR DEPOSITING AN ALUMINUM OXIDE LAYER OVER GERMANIUM SUSBT...

METHODS FOR REMOVING A NATIVE OXIDE LAYER FROM GERMANIUM SUSBTRATES...

METHODS FOR REMOVING A NATIVE OXIDE LAYER FROM GERMANIUM SUSBTRATES...

In-Situ Nitride Initiation Layer For RRAM Metal Oxide Switching Mat...

Combinatorial Approach for Screening of ALD Film Stacks

ADHESION IMPROVEMENT FOR LOW K DIELECTRICS TO CONDUCTIVE MATERIALS

IN-SITU NITRIDE INITIATION LAYER FOR RRAM METAL OXIDE SWITCHING MAT...

ReRAM STACKS PREPARATION BY USING SINGLE ALD OR PVD CHAMBER

ATOMIC LAYER DEPOSITION OF ZIRCONIUM OXIDE FOR FORMING RESISTIVE-SW...

PLASMA PROCESSING OF METAL OXIDE FILMS FOR RESISTIVE MEMORY DEVICE...

COMBINATORIAL APPROACH FOR SCREENING OF ALD FILM STACKS

Adhesion improvement for low k dielectrics to conductive materials

Hermetic low dielectric constant layer for barrier applications

Adhesion improvement for low k dielectrics to conductive materials

Bi-layer approach for a hermetic low dielectric constant layer for...