Alferd Cofer

Person

Petaluma, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma etch reactor and method
- Patent number 7,223,699
- Issue date May 29, 2007
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for using a hard mask for critical dimension growth containment
- Patent number 6,958,295
- Issue date Oct 25, 2005
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for using a hard mask for critical dimension growth containment
- Patent number 6,951,820
- Issue date Oct 4, 2005
- Silicon Valley Bank
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etch reactor and method
- Patent number 6,905,969
- Issue date Jun 14, 2005
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for minimizing the critical dimension growth of a feature on...
- Patent number 6,774,046
- Issue date Aug 10, 2004
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etch reactor and method
- Patent number 6,620,335
- Issue date Sep 16, 2003
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etch reactor and method
- Patent number 6,500,314
- Issue date Dec 31, 2002
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for etching a semiconductor wafer with feature...
- Patent number 6,492,280
- Issue date Dec 10, 2002
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etch reactor and method for emerging films
- Patent number 6,410,448
- Issue date Jun 25, 2002
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etch reactor having a plurality of magnets
- Patent number 6,354,240
- Issue date Mar 12, 2002
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for using a hard mask for critical dimension growth containment
- Patent number 6,287,975
- Issue date Sep 11, 2001
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etch reactor and method for emerging films
- Patent number 6,190,496
- Issue date Feb 20, 2001
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for etching a semiconductor wafer with feature...
- Patent number 6,127,277
- Issue date Oct 3, 2000
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etch reactor and method for emerging films
- Patent number 6,048,435
- Issue date Apr 11, 2000
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Plasma etch reactor and method
- Publication number 20050164513
- Publication date Jul 28, 2005
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etch reactor and method
- Publication number 20020139665
- Publication date Oct 3, 2002
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for using a hard mask for critical dimension growth containment
- Publication number 20020132485
- Publication date Sep 19, 2002
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for minimizing the critical dimension growth of a feature on...
- Publication number 20010031561
- Publication date Oct 18, 2001
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS

Alferd Cofer

Person

Patents Grantslast 30 patents

Plasma etch reactor and method

Method for using a hard mask for critical dimension growth containment

Method for using a hard mask for critical dimension growth containment

Plasma etch reactor and method

Method for minimizing the critical dimension growth of a feature on...

Plasma etch reactor and method

Plasma etch reactor and method

Method and apparatus for etching a semiconductor wafer with feature...

Plasma etch reactor and method for emerging films

Plasma etch reactor having a plurality of magnets

Method for using a hard mask for critical dimension growth containment

Plasma etch reactor and method for emerging films

Method and apparatus for etching a semiconductor wafer with feature...

Plasma etch reactor and method for emerging films

Patents Applicationslast 30 patents

Plasma etch reactor and method

Plasma etch reactor and method

Method for using a hard mask for critical dimension growth containment

Method for minimizing the critical dimension growth of a feature on...